Pad assembly for electrochemical mechanical processing
IPC분류정보
국가/구분
United States(US) Patent
등록
국제특허분류(IPC7판)
B24D-011/02
C25D-017/00
C25F-003/00
C25C-007/04
C25C-007/00
출원번호
US-0458356
(2006-07-18)
등록번호
US-7344431
(2008-03-18)
발명자
/ 주소
Hu,Yongqi
Tsai,Stan D.
Wang,Yan
Liu,Feng Q.
Chang,Shou Sung
Chen,Liang Yuh
출원인 / 주소
Applied Materials, Inc.
대리인 / 주소
Patterson & Sheridan, LLP
인용정보
피인용 횟수 :
5인용 특허 :
149
초록▼
Embodiments of a processing pad assembly for processing a substrate are provided. The processing pad assembly includes an upper layer having a processing surface and an electrode having a top side coupled to the upper layer and a bottom side opposite the top side. A first set of holes is formed thro
Embodiments of a processing pad assembly for processing a substrate are provided. The processing pad assembly includes an upper layer having a processing surface and an electrode having a top side coupled to the upper layer and a bottom side opposite the top side. A first set of holes is formed through the upper layer for exposing the electrode to the processing surface. At least one aperture is formed through the upper layer and the electrode.
대표청구항▼
The invention claimed is: 1. A processing pad assembly, comprising: a conductive upper layer having a conductive processing surface; and an electrode having a top side coupled to the upper layer and a bottom side opposite the top side, wherein a first set of holes is formed through the upper layer
The invention claimed is: 1. A processing pad assembly, comprising: a conductive upper layer having a conductive processing surface; and an electrode having a top side coupled to the upper layer and a bottom side opposite the top side, wherein a first set of holes is formed through the upper layer for exposing the electrode to the processing surface. 2. The processing pad assembly of claim 1, wherein the electrode is fabricated from a corrosion resistant conductive metal. 3. The processing pad assembly of claim 2, wherein the corrosion resistant conductive metal is Sn, Ni, Ti, or Au. 4. The processing pad assembly of claim 1, wherein the electrode is fabricated from a conductive metal coated with a corrosion resistant conductive metal. 5. The processing pad assembly of claim 4, wherein the corrosion resistant conductive metal is Sn, Ni, Ti, or Au. 6. The processing pad assembly of claim 1, wherein the electrode is fabricated from a corrosion-resistant conductive alloy. 7. The processing pad assembly of claim 6, wherein the corrosion-resistant conductive alloy is bronze, brass, stainless steel, or a palladium-tin alloy. 8. The processing pad assembly of claim 1, wherein the electrode is fabricated from a metal-coated fabric. 9. The processing pad assembly of claim 1, wherein the electrode is fabricated from a polymer matrix with a conductive filler. 10. The processing pad assembly of claim 2, wherein the electrode is a solid sheet. 11. The processing pad assembly of claim 2, wherein the electrode is a metal screen. 12. The processing pad assembly of claim 2, wherein the electrode is a perforated sheet. 13. The processing pad assembly of claim 2, wherein the electrode is primed with an adhesion promoter on a side facing the upper layer. 14. The processing pad assembly of claim 13, wherein the adhesion promoter is conductive. 15. The processing pad assembly of claim 1, wherein the electrode is permeable. 16. The processing pad assembly of claim 1, wherein the electrode is coupled to the upper layer by an adhesive. 17. The processing pad assembly of claim 1, wherein the electrode further comprises a plurality of independently biasable electrical zones. 18. The processing pad assembly of claim 17, wherein the electrical zones further comprises concentric rings. 19. The processing pad assembly of claim 1, further comprising a subpad disposed between the electrode and the conductive upper layer. 20. The processing pad assembly of claim 1, wherein the electrode further comprises: a first conductive zone; and at least a second conductive zone. 21. The processing pad assembly of claim 20, wherein the electrode further comprises: a first conductive element comprising the first conductive zone; a second conductive element circumscribing the first conductive element comprising a second conductive zone; and a third conductive element circumscribing the second conductive element comprising a third conductive zone.
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이 특허에 인용된 특허 (149)
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