Surface plasmon enhanced illumination apparatus having non-periodic resonance configurations
원문보기
IPC분류정보
국가/구분
United States(US) Patent
등록
국제특허분류(IPC7판)
C12Q-001/68
G01N-021/00
G01N-015/06
G01N-033/00
G01N-033/48
출원번호
US-0457962
(2006-07-17)
등록번호
US-7351374
(2008-04-01)
발명자
/ 주소
Stark,Peter Randolph Hazard
출원인 / 주소
President and Fellows of Harvard College
대리인 / 주소
Wolf, Greenfield & Sacks, P.C.
인용정보
피인용 횟수 :
5인용 특허 :
7
초록▼
An apparatus configured to generate surface plasmon enhanced radiation comprises a metal film having first and second surfaces, and one or more resonance configurations formed in the metal film. An exemplary resonance configuration includes an aperture extending between the first and second surfaces
An apparatus configured to generate surface plasmon enhanced radiation comprises a metal film having first and second surfaces, and one or more resonance configurations formed in the metal film. An exemplary resonance configuration includes an aperture extending between the first and second surfaces of the metal film, and at least one feature that forms a non-periodic structure together with the aperture. The feature causes a variation in a dielectric function along the first surface of the metal film proximate to the aperture, and the aperture and the feature are configured so as to cooperatively facilitate a resonance condition for surface plasmon enhanced radiation generated by the apparatus, based on incident radiation that irradiates the first surface of the metal film. Exemplary features for a given resonance configuration include, but are not limited to, a single feature including one of another aperture, a protrusion that extends outwardly from the metal film, or a depression in the metal film, as well as one or more edges of the metal film.
대표청구항▼
The invention claimed is: 1. An apparatus, comprising: a metal film having a first surface and a second surface; and at least one resonance configuration formed in the metal film, the at least one resonance configuration comprising: an aperture extending between the first surface and the second sur
The invention claimed is: 1. An apparatus, comprising: a metal film having a first surface and a second surface; and at least one resonance configuration formed in the metal film, the at least one resonance configuration comprising: an aperture extending between the first surface and the second surface; and at least one feature, not including another aperture, that forms a non-periodic structure together with the aperture, the at least one feature causing a variation in a dielectric function along the first surface proximate to the aperture, wherein the aperture and the at least one feature are configured so as to cooperatively facilitate a resonance condition for surface plasmon enhanced radiation generated by the apparatus, based on incident radiation, when present, that irradiates the first surface of the metal film. 2. The apparatus of claim 1, wherein the at least one resonance configuration comprises a plurality of resonance configurations formed in the metal film. 3. The apparatus of claim 1, wherein the plurality of resonance configurations comprises a plurality of identical resonance configurations. 4. The apparatus of claim 1, wherein the at least one feature comprises a single feature. 5. The apparatus of claim 4, wherein the at least one resonance configuration comprises a plurality of resonance configurations formed in the metal film. 6. The apparatus of claim 5, wherein each resonance configuration of the plurality of resonance configurations comprises a single aperture and a single feature configured so as to cooperatively facilitate the resonance condition for the surface plasmon enhanced radiation. 7. The apparatus of claim 4, wherein the at least one feature comprises a single annular groove in the metal film, the single annular groove surrounding the aperture. 8. The apparatus of claim 7, wherein the aperture has a first diameter, and wherein a width of the single annular groove is equal to the first diameter. 9. The apparatus of claim 7, wherein a depth of the single annular groove in the metal film is greater than a skin depth of surface plasmons induced by the incident radiation. 10. The apparatus of claim 4, wherein the single feature comprises a single raised ring surrounding the aperture. 11. The apparatus of claim 10, wherein the aperture has a first diameter, and wherein a width of the single raised ring is equal to the first diameter. 12. The apparatus of claim 4, wherein the single feature comprises a protrusion that extends outwardly from the first surface of the metal film. 13. The apparatus of claim 4, wherein the single feature comprises a depression in the metal surface, wherein the depression does not completely extend between the first and second surfaces of the metal film. 14. The apparatus of claim 1, wherein the metal film has at least one edge, and wherein the at least one feature comprises the at least one edge of the metal film. 15. The apparatus of claim 14, wherein the metal film has a circular shape such that the at least one edge forms an annular edge around the aperture. 16. The apparatus of claim 14, wherein the metal film has a polygonal shape forming a plurality of edges including the at least one edge. 17. The apparatus of claim 14, wherein the metal film has an elongate shape. 18. The apparatus of claim 17, wherein the elongate shape has a short dimension and a long dimension orthogonal to the short dimension, wherein the long dimension has a first end and a second end, and wherein the aperture is disposed proximate to one of the first end and the second end. 19. The apparatus of claim 18, wherein the elongate shape is a rectangular shape. 20. The apparatus of claim 17, wherein the elongate shape is a rectangular shape, wherein the aperture is located equidistant from first and second opposing edges of the rectangular shape, and wherein at least one of the first and second opposing edges constitutes the at least one feature. 21. The apparatus of claim 1, further comprising a substrate having a first substrate surface substantially contiguous with the second surface of the metal film, the substrate further having a second substrate surface constituting a plane from which the surface plasmon enhanced radiation is emitted from the apparatus, wherein the substrate exhibits significant non-metallic behavior at frequencies corresponding to the incident radiation. 22. The apparatus of claim 21, wherein the at least one feature comprises a single feature. 23. The apparatus of claim 21, wherein the substrate comprises a dielectric material. 24. The apparatus of claim 21, wherein the substrate comprises a metallic material having a significantly low conductivity at the frequencies corresponding to the incident radiation. 25. The apparatus of claim 21, wherein the substrate is transparent with respect to the incident radiation. 26. The apparatus of claim 21, further comprising at least one second feature causing a variation in a second dielectric function along the second substrate surface of the substrate so as to reduce an emission profile of the surface plasmon enhanced radiation generated by the apparatus. 27. The apparatus of claim 26, wherein the aperture extends between the first substrate surface and the second substrate surface, and wherein the at least one second feature comprises an annular ring of conductive material proximate to the second substrate surface and surrounding the aperture. 28. The apparatus of claim 26, further comprising a second metal film substantially contiguous with the second substrate surface, wherein the aperture extends through the second metal film, and wherein the at least one second feature comprises a groove formed in the second metal film and surrounding the aperture. 29. An apparatus, comprising: a metal film having a first surface and a second surface; and at least one resonance configuration formed in the metal film, the at least one resonance configuration comprising: an aperture extending between the first surface and the second surface; and a single feature, not including another aperture, that causes a variation in a dielectric function along the first surface proximate to the aperture, wherein the aperture and the single feature are configured so as to cooperatively facilitate a resonance condition for surface plasmon enhanced radiation generated by the apparatus, based on incident radiation, when present, that irradiates the first surface of the metal film. 30. The apparatus of claim 29, wherein the single feature comprises a single topographic feature. 31. The apparatus of claim 30, wherein the single topographic feature comprises a single annular groove in the metal film, the single annular groove surrounding the aperture. 32. The apparatus of claim 30, wherein the single topographic feature comprises a single raised ring surrounding the aperture. 33. The apparatus of claim 30, wherein the single topographic feature comprises a second aperture. 34. The apparatus of claim 30, wherein the single topographic feature comprises a protrusion that extends outwardly from the first surface of the metal film. 35. The apparatus of claim 30, wherein the single topographic feature comprises a depression in the metal surface, wherein the depression does not completely extend between the first and second surfaces of the metal film. 36. The apparatus of claim 29, further comprising a substrate having a first substrate surface substantially contiguous with the second surface of the metal film, the substrate further having a second substrate surface constituting a plane from which the surface plasmon enhanced radiation is emitted from the apparatus, wherein the substrate exhibits significant non-metallic behavior at frequencies corresponding to the incident radiation. 37. The apparatus of claim 36, wherein the substrate comprises a dielectric material. 38. The apparatus of claim 36, wherein the substrate comprises a metal having a significantly low conductivity at frequencies corresponding to the incident radiation. 39. The apparatus of claim 36, wherein the substrate is transparent with respect to the incident radiation. 40. The apparatus of claim 36, further comprising at least one second feature causing a variation in a second dielectric function along the second substrate surface of the substrate so as to reduce an emission profile of the surface plasmon enhanced radiation generated by the apparatus. 41. The apparatus of claim 40, wherein the aperture extends between the first substrate surface and the second substrate surface, and wherein the at least one second feature comprises an annular ring of conductive material proximate to the second substrate surface and surrounding the aperture. 42. The apparatus of claim 40, further comprising a second metal film substantially contiguous with the second substrate surface, wherein the aperture extends through the second metal film, and wherein the at least one second feature comprises a groove formed in the second metal film and surrounding the aperture.
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