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Methods and systems for optical and non-optical measurements of a substrate

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • G01B-011/00
출원번호 US-0063228 (2005-02-22)
등록번호 US-7355709 (2008-04-08)
발명자 / 주소
  • Bevis,Christopher F.
  • Dickerson,Gary
출원인 / 주소
  • KLA Tencor Technologies Corp.
대리인 / 주소
    Baker & McKenzie LLP
인용정보 피인용 횟수 : 1  인용 특허 : 37

초록

Methods and systems for measurements of a substrate are provided. One system includes a non-optical subsystem configured to perform first measurements on a substrate. The system also includes an optical subsystem coupled to the non-optical subsystem. The optical subsystem is configured to perform s

대표청구항

What is claimed is: 1. A system configured for measurement of a substrate, comprising: a non-optical subsystem configured to perform first measurements on the substrate; an optical subsystem coupled to the non-optical subsystem, wherein the optical subsystem is configured to perform second measurem

이 특허에 인용된 특허 (37)

  1. Brandstetter Robert W. ; Fonneland Nils J., Angular alignment of structures using moire patterns.
  2. Weiner, Kurt H.; Verma, Gaurav; Lewis, Isabella T., Apparatus and methods for reliable and efficient detection of voltage contrast defects.
  3. Veneklasen, Lee; Adler, David L., Apparatus and methods for secondary electron emission microscope with dual beam.
  4. Veneklasen, Lee; Adler, David L.; Marcus, Matthew, Apparatus for inspection of semiconductor wafers and masks using a low energy electron microscope with two illuminating beams.
  5. Wang, David Y.; Aikens, David M., Broadband refractive objective for small spot optical metrology.
  6. Aspnes, David E.; Opsal, Jon, Broadband spectroscopic rotating compensator ellipsometer.
  7. Borden, Peter G.; Li, Jiping; Madsen, Jon, Calibration as well as measurement on the same workpiece during fabrication.
  8. Jason C. Yee ; Laurence S. Hordon ; Weidong Liu ; David M. Goodstein, Calibration of a scanning electron microscope.
  9. Opsal, Jon; Rosencwaig, Allan, Critical dimension analysis with simultaneous multiple angle of incidence measurements.
  10. Opsal, Jon, Detector configurations for optical metrology.
  11. Chuang, Yung-Ho; Shafer, David; Tsai, Bin-Ming B.; Armstrong, J. Joseph, High NA system for multiple mode imaging.
  12. Chernoff Donald A. ; Lohr Jason D., High precison calibration and feature measurement system for a scanning probe microscope.
  13. McCord, Mark A.; Lauber, Jan; Pei, Jun; Fernandez, Jorge P., In-situ probe for optimizing electron beam inspection and metrology based on surface potential.
  14. Desplats, Romain; Benteo, Bruno, Installation and method for microscopic observation of a semiconductor electronic circuit.
  15. Muckenhirm,Sylvain G., Integrated measuring instrument.
  16. Vaez-Iravani, Mehdi, Massively parallel inspection and imaging system.
  17. Norton Adam E. (Palo Alto CA) Pham Hung V. (San Jose CA), Method and apparatus for measuring reflectance in two wavelength bands to enable determination of thin film thickness.
  18. Brill, Boaz; Finarov, Moshe, Method and system for measuring in patterned structures.
  19. Johnson, Kenneth C.; Stanke, Fred E., Method of measuring meso-scale structures on wafers.
  20. Nasser-Ghodsi, Mehran; Cull, Michael, Methods and apparatus for electron beam inspection of samples.
  21. Nikoonahad, Mehrdad; Levy, Ady; Brown, Kyle A.; Bultman, Gary; Wack, Dan; Fielden, John, Methods and systems for determining at least four properties of a specimen.
  22. Bareket Noah, Overlay alignment measurement of wafers.
  23. Vaez-Iravani, Mehdi; Stokowski, Stanley; Zhao, Guoheng, Sample inspection system.
  24. Masnaghetti Douglas K. ; Concina Stefano E. ; Sun Stanley S. ; Ng Waiman ; Adler David L., Scanning electron beam microscope.
  25. Masnaghetti, Douglas K.; Concina, Stefano E.; Sun, Stanley S.; Ng, Waiman; Adler, David L., Scanning electron beam microscope.
  26. Rangarajan, Bharath; Singh, Bhanwar; Subramanian, Ramkumar, Scatterometry based active control of exposure conditions.
  27. Notte, IV, John A., Sectored magnetic lens and method of use.
  28. Nikitin, Arkady; Yeremin, Dmitriy, Simple method of precision calibration of magnification of a scanning microscopes with the use of test diffraction grating.
  29. Wei, Lanhua, Small spot ellipsometer.
  30. Wei, Lanhua; Chu, Hanyou; Opsal, Jon, Spatial averaging technique for ellipsometry and reflectometry.
  31. Xu, Yiping; Abdulhalim, Ibrahim, Spectroscopic scatterometer system.
  32. Yiping Xu ; Ibrahim Abdulhalim IL, Spectroscopic scatterometer system.
  33. Lee, Shing; Wang, Haiming; Norton, Adam; Nikoonahad, Mehrdad, System for measuring polarimetric spectrum and other properties of a sample.
  34. Lorusso, Gian Francesco; Grella, Luca, Undercut measurement using SEM.
  35. Lange, Steven R., Wafer inspection using optimized geometry.
  36. Peale, David; Duran, Carlos; Hess, Harald, Waveguide based parallel multi-phaseshift interferometry for high speed metrology, optical inspection, and non-contact sensing.
  37. Kelly Thomas F. (Madison WI), X-ray detector efficiency standard for electron microscopes.

이 특허를 인용한 특허 (1)

  1. Joyce, David Edward; Wright, Timothy Simon; Radley, Ian, Cross calibration of two energy dispersive X-ray baggage screening systems including transformation of the reference database.
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