초록 ▼

A contamination control apparatus includes at least two pipes connected by a joint portion and configured to allow a processing fluid to flow therethrough, and a cover configured to enclose the joint portion and to provide an enclosed cavity between the cover and the joint portion. An inlet port is

A contamination control apparatus includes at least two pipes connected by a joint portion and configured to allow a processing fluid to flow therethrough, and a cover configured to enclose the joint portion and to provide an enclosed cavity between the cover and the joint portion. An inlet port is connected to the cover and configured to supply a gas to the cavity. An outlet port is connected to the cover and configured to exhaust the gas and a contaminant from the cavity.

대표청구항 ▼

What is claimed is: 1. A contamination control apparatus for use with a joint portion that connects at least two pipes configured to allow a processing fluid to flow therethrough, the contamination control apparatus comprising: a cover configured to enclose the joint portion and to provide an enclo

What is claimed is: 1. A contamination control apparatus for use with a joint portion that connects at least two pipes configured to allow a processing fluid to flow therethrough, the contamination control apparatus comprising: a cover configured to enclose the joint portion and to provide an enclosed cavity between the cover and the joint portion; an inlet port connected to the cover and configured to supply a gas to the cavity; and an outlet port connected to the cover and configured to exhaust the gas and a contaminant from the cavity. 2. The contamination control apparatus of claim 1, further comprising a plurality of ribs configured to support the cover. 3. The contamination control apparatus of claim 1, further comprising a filter connected to the inlet port and configured to filter the gas being supplied to the cavity. 4. The contamination control apparatus of claim 1, wherein the cover comprises a fluoropolymer. 5. The contamination control apparatus of claim 1, wherein the joint portion is installed between the pipes and includes at least one valve configured to control an amount and/or a pressure of the processing fluid flowing therethrough. 6. The contamination control apparatus of claim 1, wherein the cover comprises a slide zipper configured to open and/or close the cover. 7. The contamination control apparatus of claim 1, wherein the cover comprises a transparent window. 8. The contamination control apparatus of claim 1, further comprising a discharging duct connected to the outlet port and a connection pipe configured to connect the outlet port and the discharging duct. 9. A contamination control apparatus for use with a joint portion that connects at least two pipes configured to allow a processing fluid to flow therethrough, the contamination control apparatus comprising: a cover configured to enclose the joint portion and to provide an enclosed cavity between the cover and the joint portion; an inlet port connected to the cover and configured to supply a gas to the cavity; an outlet port connected to the cover and configured to exhaust the gas and a contaminant from the cavity; and a pair of sealing pads configured to seal the cover at end portions thereof. 10. The contamination control apparatus of claim 9, wherein the pads comprises a silicon-based material. 11. A contamination management system for use with a joint portion that connects at least two pipes configured to allow a processing fluid to flow therethrough, the contamination management system comprising: at least one control unit including: a cover configured to enclose the joint portion and providing an enclosed cavity between the cover and the joint portion; an inlet port connected to the cover and configured to supply a gas to the cavity; and an outlet port connected to the cover and configured to exhaust the gas and a contaminant from the cavity through a discharging duct; a plurality of sampling pipes connected to the outlet port and configured to sample the contaminant, the sampling pipes being connected to a connection pipe connecting the outlet port and the discharging duct; and an analyzing unit connected to the sampling pipes configured to analyze the sampled contaminant. 12. The contamination management system of claim 11, further comprising a monitor unit configured to monitor the contaminant from the joint portion using analysis data from the analyzing unit. 13. The contamination management system of claim 12, wherein the analysis data represents a concentration of the contaminant and/or components of the contaminant. 14. The contamination management system of claim 13, wherein the monitoring unit includes: a comparator configured to compare the analysis data of the contaminant with reference data; a signal generator configured to generate a warning signal based on a comparison between the analysis data of the contaminant and the reference data; and a display device for displaying the analysis data. 15. The contamination management system of claim 13, wherein the discharging duct is connected to a gas scrubber system configured to reduce the contaminant in a gas mixture discharged from the cover. 16. The contamination management system of claim 11, wherein the processing fluid includes a processing gas and/or a chemical for manufacturing a semiconductor device. 17. The contamination management system of claim 11, wherein the control unit comprises a plurality of ribs configured to support the cover. 18. The contamination management system of claim 11, wherein the control unit comprises a filter connected to the inlet port and configured to filter the gas being supplied to the cavity. 19. The contamination management system of claim 18, wherein the filter includes a high efficiency particulate air filter and/or an ultra low penetration air filter. 20. The contamination management system of claim 11, wherein the joint portion is installed between the pipes and includes at least one valve configured to control an amount and/or a pressure of the processing fluid. 21. The contamination management system of claim 11, further comprising a pair of sealing pads configured to seal the cover at end portions thereof. 22. The contamination management system of claim 11, wherein the cover comprises a slide zipper configured to open and/or close the cover. 23. A method for reducing contamination in a clean room, the method comprising: enclosing a joint portion connecting at least two pipes in a clean room with a cover that defines an enclosed cavity therebetween, wherein a contaminant from the joint portion is contained in the cavity; supplying a gas to the cavity through an inlet port; exhausting a gas mixture of the gas and the contaminant from the cavity through an outlet port. 24. The method of claim 23, further comprising analyzing the exhausted gas mixture. 25. A contamination control system comprising: at least two pipes connected by a joint portion and configured to allow a processing fluid to flow therethrough; a cover configured to enclose the joint portion and to provide an enclosed cavity between the cover and the joint portion; an inlet port connected to the cover and configured to supply a gas to the cavity; and an outlet port connected to the cover and configured to exhaust the gas and a contaminant from the cavity.