A substrate holding apparatus is for holding a substrate such as a semiconductor wafer in a polishing apparatus for polishing the substrate to a flat finish. The substrate holding apparatus comprises a vertically movable member, and an elastic member for defining a chamber. The elastic member compr
A substrate holding apparatus is for holding a substrate such as a semiconductor wafer in a polishing apparatus for polishing the substrate to a flat finish. The substrate holding apparatus comprises a vertically movable member, and an elastic member for defining a chamber. The elastic member comprises a contact portion which is brought into contact with the substrate, and a circumferential wall extending upwardly from the contact portion and connected to the vertically movable member. The circumferential wall has a stretchable and contractible portion which is stretchable and contractible vertically.
대표청구항▼
The invention claimed is: 1. A substrate holding apparatus for holding and pressing a substrate to be polished against a polishing surface, said substrate holding apparatus comprising: a vertically movable member; an elastic member connected to said vertically movable member for defining a chamber,
The invention claimed is: 1. A substrate holding apparatus for holding and pressing a substrate to be polished against a polishing surface, said substrate holding apparatus comprising: a vertically movable member; an elastic member connected to said vertically movable member for defining a chamber, said elastic member including (i) a contact portion to be brought into contact with the substrate, and (ii) a circumferential part extending upwardly from said contact portion and connected to said vertically movable member, said circumferential part having an extendible and contractible portion which is more extendible and contractible vertically than are other portions of said circumferential part; and a pressing member to be brought into contact with an upper surface of said contact portion so as to press said contact portion against the substrate, wherein said pressing member has a plurality of radially extending grooves in a lower surface thereof. 2. A substrate holding apparatus for holding and pressing a substrate to be polished against a polishing surface, said substrate holding apparatus comprising: a vertically movable member; an elastic member connected to said vertically movable member for defining a chamber, said elastic member including (i) a contact portion to be brought into contact with the substrate, and (ii) a circumferential part extending upwardly from said contact portion and connected to said vertically movable member, said circumferential part having an extendible and contractible portion which is more extendible and contractible vertically than are other portions of said circumferential part; a pressing member to be brought into contact with an upper surface of said contact portion so as to press said contact portion against the substrate; and a reinforcement member embedded in said contact portion. 3. A substrate holding apparatus for holding and pressing a substrate to be polished against a polishing surface, said substrate holding apparatus comprising: a vertically movable member; and an elastic member connected to said vertically movable member for defining a chamber, said elastic member including (i) a contact portion to be brought into contact with the substrate, and (ii) a circumferential part extending upwardly from said contact portion and connected to said vertically movable member, said circumferential part having an extendible and contractible portion which is more extendible and contractible vertically than are other portions of said circumferential part, wherein said extendible and contractible portion is of a material softer than material of said contact portion. 4. A substrate holding apparatus for holding and pressing a substrate to be polished against a polishing surface, said substrate holding apparatus comprising: a vertically movable member; and an elastic member connected to said vertically movable member for defining a chamber, said elastic member including (i) a contact portion to be brought into contact with the substrate, and (ii) a circumferential part extending upwardly from said contact portion and connected to said vertically movable member, said circumferential part having an extendible and contractible portion which is more extendible and contractible vertically than are other portions of said circumferential part, wherein said circumferential part includes a portion thinner than said contact portion, with said portion defining said stretchable and contractible portion. 5. A substrate holding apparatus for holding and pressing a substrate to be polished against a polishing surface, said substrate holding apparatus comprising: a vertically movable member; and an elastic member connected to said vertically movable member for defining a chamber, said elastic member including (i) a contact portion to be brought into contact with the substrate, and (ii) a circumferential part extending upwardly from said contact portion and connected to said vertically movable member, said circumferential part having an extendible and contractible portion which is more extendible and contractible vertically than are other portions of said circumferential part, wherein said circumferential part includes a portion of a material harder than material of said contact portion and positioned below said extendible and contractible portion. 6. A substrate holding apparatus for holding and pressing a substrate to be polished against a polishing surface, said substrate holding apparatus comprising: a vertically movable member; an elastic member connected to said vertically movable member for defining a chamber, said elastic member including (i) a contact portion to be brought into contact with the substrate, and (ii) a circumferential part extending upwardly from said contact portion and connected to said vertically movable member, said circumferential part having an extendible and contractible portion which is more extendible and contractible vertically than are other portions of said circumferential part; and a hard member, harder than said elastic member, embedded in said circumferential part below said extendible and contractible portion. 7. A substrate holding apparatus for holding and pressing a substrate to be polished against a polishing surface, said substrate holding apparatus comprising: a vertically movable member; an elastic member connected to said vertically movable member for defining a chamber said elastic member including (i) a contact portion to be brought into contact with the substrate, and (ii) a circumferential part extending upwardly from said contact portion and connected to said vertically movable member, said circumferential part having an extendible and contractible portion which is more extendible and contractible vertically than are other portions of said circumferential part; and a hard member, harder than said elastic member, fixed to said circumferential part below said extendible and contractible portion. 8. A substrate holding apparatus for holding and pressing a substrate to be polished against a polishing surface, said substrate holding apparatus comprising: a vertically movable member; and an elastic member connected to said vertically movable member for defining a chamber, said elastic member including (i) a contact portion to be brought into contact with the substrate, and (ii) a circumferential part extending upwardly from said contact portion and connected to said vertically movable member, said circumferential part having an extendible and contractible portion which is more extendible and contractible vertically than are other portions of said circumferential part, wherein said circumferential part is coated with a material, harder than said elastic member, below said extendible and contractible portion. 9. A substrate holding apparatus for holding and pressing a substrate to be polished against a polishing surface, said substrate holding apparatus comprising: a vertically movable member; and an elastic member connected to said vertically movable member for defining a chamber, said elastic member including (i) a contact portion to be brought into contact with the substrate, and (ii) a circumferential part extending upwardly from said contact portion and connected to said vertically movable member, said circumferential part having an extendible and contractible portion which is more extendible and contractible vertically than are other portions of said circumferential part, wherein said contact portion has a plurality of convexities and concavities on an upper surface thereof. 10. A substrate holding apparatus for holding and pressing a substrate to be polished against a polishing surface, said substrate holding apparatus comprising: a vertically movable member; an elastic member connected to said vertically movable member for defining a chamber, said elastic member including (i) a contact portion to be brought into contact with the substrate, and (ii) a circumferential part extending upwardly from said contact portion and connected to said vertically movable member, said circumferential part including an outer circumferential wall and an inner circumferential wall disposed radially inwardly of said outer circumferential wall, with said contact portion being divided at a position between said outer circumferential wall and said inner circumferential wall; and a pressing member to be brought into contact with an upper surface of said contact portion so as to press said contact portion against the substrate, wherein said pressing member has a plurality of radially extending grooves in a lower surface thereof. 11. A substrate holding apparatus for holding and pressing a substrate to be polished against a polishing surface, said substrate holding apparatus comprising: a vertically movable member; an elastic member connected to said vertically movable member for defining a chamber, said elastic member including (i) a contact portion to be brought into contact with the substrate and (ii) a circumferential part extending upwardly from said contact portion and connected to said vertically movable member, said circumferential part including an outer circumferential wall and an inner circumferential wall disposed radially inwardly of said outer circumferential wall, with said contact portion being divided at a position between said outer circumferential wall and said inner circumferential wall; a pressing member to be brought into contact with an upper surface of said contact portion so as to press said contact portion against the substrate; and a reinforcement member embedded in said contact portion. 12. A substrate holding apparatus for holding and pressing a substrate to be polished against a polishing surface, said substrate holding apparatus comprising: a vertically movable member; and an elastic member connected to said vertically movable member for defining a chamber, said elastic member including (i) a contact portion to be brought into contact with the substrate, and (ii) a circumferential part extending upwardly from said contact portion and connected to said vertically movable member, said circumferential part including an outer circumferential wall and an inner circumferential wall disposed radially inwardly of said outer circumferential wall, with said contact portion being divided at a position between said outer circumferential wall and said inner circumferential wall, wherein said contact portion has a plurality of convexities and concavities on an upper surface thereof. 13. A substrate holding apparatus for holding and pressing a substrate to be polished against a polishing surface, said substrate holding apparatus comprising: a vertically movable member; and an elastic member for defining a chamber, said elastic member having a contact portion to be brought into contact with the substrate, said contact portion having a removal promoting portion for promoting removal of said contact portion from the substrate, wherein said contact portion has a region of a material exhibiting lower adhesiveness to the substrate than material of other regions of said elastic member. 14. A substrate holding apparatus for holding and pressing a substrate to be polished against a polishing surface, said substrate holding apparatus comprising: a vertically movable member; and an elastic member for defining a chamber, said elastic member having a contact portion to be brought into contact with the substrate, said contact portion having a removal promoting portion for promoting removal of said contact portion from the substrate, wherein a surface of said contact portion has a plurality of convexities and concavities. 15. A substrate holding apparatus for holding and pressing a substrate to be polished against a polishing surface, said substrate holding apparatus comprising: a vertically movable member; and an elastic member for defining a chamber, said elastic member having a contact portion to be brought into contact with the substrate, said contact portion having a removal promoting portion for promoting removal of said contact portion from the substrate, wherein said elastic member comprises another contact portion, and said removal promoting portion comprises a portion interconnecting said contact portion and said another contact portion. 16. A substrate holding apparatus for holding and pressing a substrate to be polished against a polishing surface, said substrate holding apparatus comprising: a vertically movable member; and an elastic member for defining a chamber, said elastic member having a contact portion to be brought into contact with the substrate said contact portion having a removal promoting portion for promoting removal of said contact portion from the substrate, wherein said removal promoting portion comprises an upwardly concave recess in said contact portion, with that part of said contact portion defining said recess to be brought into intimate contact with the substrate when a pressurized fluid is supplied to the chamber. 17. A substrate holding apparatus for holding and pressing a substrate to be polished against a polishing surface, said substrate holding apparatus comprising: a movable member which is movable perpendicularly to a polishing surface; and an elastic membrane connected to said movable member for defining chambers, said elastic membrane including (i) a contact portion to be brought into contact with the substrate, and (ii) circumferential walls for connecting said contact portion to said movable member, each of said circumferential walls having an extendible and contractible portion which is more extendible and contractible perpendicularly to the polishing surface than are other portions of said each of said circumferential walls, wherein said contact portion has an upwardly inclined portion on an outer edge thereof, and said upwardly inclined portion is thinner than said contact portion. 18. A polishing apparatus comprising: a substrate holding apparatus according to claim 1; and a polishing table having a polishing surface. 19. A polishing apparatus comprising: a substrate holding apparatus according to claim 2; and a polishing table having a polishing surface. 20. A polishing apparatus comprising: a substrate holding apparatus according to claim 3; and a polishing table having a polishing surface. 21. A polishing apparatus comprising: a substrate holding apparatus according to claim 4; and a polishing table having a polishing surface. 22. A polishing apparatus comprising: a substrate holding apparatus according to claim 5; and a polishing table having a polishing surface. 23. A polishing apparatus comprising: a substrate holding apparatus according to claim 6; and a polishing table having a polishing surface. 24. A polishing apparatus comprising: a substrate holding apparatus according to claim 7; and a polishing table having a polishing surface. 25. A polishing apparatus comprising: a substrate holding apparatus according to claim 8; and a polishing table having a polishing surface. 26. A polishing apparatus comprising: a substrate holding apparatus according to claim 9; and a polishing table having a polishing surface. 27. A polishing apparatus comprising: a substrate holding apparatus according to claim 10; and a polishing table having a polishing surface. 28. A polishing apparatus comprising: a substrate holding apparatus according to claim 12; and a polishing table having a polishing surface. 29. A polishing apparatus comprising: a substrate holding apparatus according to claim 12; and a polishing table having a polishing surface. 30. A polishing apparatus comprising: a substrate holding apparatus according to claim 13; and a polishing table having a polishing surface. 31. A polishing apparatus comprising: a substrate holding apparatus according to claim 14; and a polishing table having a polishing surface. 32. A polishing apparatus comprising: a substrate holding apparatus according to claim 15; and a polishing table having a polishing surface. 33. A polishing apparatus comprising: a substrate holding apparatus according to claim 16; and a polishing table having a polishing surface. 34. A polishing apparatus comprising: a substrate holding apparatus according to claim 17; and a polishing table having a polishing surface.
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이 특허에 인용된 특허 (21)
Hoshizaki Jon A. ; Williams Roger O. ; Buhler James D. ; Reichel Charles A. ; Hollywood William K. ; de Geus Richard ; Lee Lawrence L., Apparatus for chemical mechanical polishing.
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