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Electro-chemical deposition system and method of electroplating on substrates

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • C25D-005/00
출원번호 US-0622001 (2003-07-17)
등록번호 US-RE40218 (2008-04-08)
발명자 / 주소
  • Landau,Uziel
출원인 / 주소
  • Landau,Uziel
대리인 / 주소
    Patterson & Sheridan, LLP
인용정보 피인용 횟수 : 18  인용 특허 : 116

초록

The invention provides an apparatus and a method for achieving reliable, consistent metal electroplating or electrochemical deposition onto semiconductor substrates. More particularly, the invention provides uniform and void-free deposition of metal onto metal seeded semiconductor substrates having

대표청구항

What is claimed is: 1. An apparatus for electrochemical deposition of a metal onto a substrate having a substrate plating surface, comprising: a) a substrate holder adapted to hold the substrate in a position wherein the substrate plating surface is exposed to an electrolyte in an electrolyte conta

이 특허에 인용된 특허 (116)

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  1. Chandrasekhar, Prasanna, Complimentary polymer electrochromic device.
  2. Chandrasekhar, Prasanna, Complimentary polymer electrochromic device.
  3. Chandrasekhar, Prasanna, Complimentary polymer electrochromic device.
  4. Chandrasekhar, Prasanna; Zay, Brian J.; Laganis, Edward J.; Romanov, Vasily V.; LaRosa, Anthony J., Electrochromic eyewear.
  5. Deane, Geoffrey F.; Ferren, Bran; Gates, William; Hillis, W. Daniel; Hyde, Roderick A.; Ishikawa, Muriel Y.; Jung, Edward K. Y.; Kare, Jordin T.; Myhrvold, Nathan P.; Tegreene, Clarence T.; Tuckerman, David B.; Weaver, Thomas A.; Whitmer, Charles; Wood, Jr., Lowell L.; Wood, Victoria Y. H., Fluid-surfaced electrode.
  6. Deane, Geoffrey F.; Ferren, Bran; Gates, William; Hillis, W. Daniel; Hyde, Roderick A.; Ishikawa, Muriel Y.; Jung, Edward K. Y.; Kare, Jordin T.; Myhrvold, Nathan P.; Tegreene, Clarence T.; Tuckerman, David B.; Weaver, Thomas A.; Whitmer, Charles; Wood, Jr., Lowell L.; Wood, Victoria Y. H., Fluid-surfaced electrode.
  7. Deane, Geoffrey F.; Ferren, Bran; Gates, William; Hillis, W. Daniel; Hyde, Roderick A.; Ishikawa, Muriel Y.; Jung, Edward K.Y.; Kare, Jordin T.; Myhrvold, Nathan P.; Tegreene, Clarence T.; Tuckerman, David B.; Weaver, Thomas A.; Whitmer, Charles; Wood, Jr., Lowell L.; Wood, Victoria Y.H., Fluid-surfaced electrode.
  8. Deane, Geoffrey F.; Ferren, Bran; Gates, William; Hillis, W. Daniel; Hyde, Roderick A.; Ishikawa, Muriel Y.; Jung, Edward K. Y.; Kare, Jordin T.; Myhrvold, Nathan P.; Tegreene, Clarence T.; Tuckerman, David B.; Weaver, Thomas Allan; Whitmer, Charles; Wood, Lowell L.; Wood, Victoria Y. H., Instrumented fluid-surfaced electrode.
  9. Deane, Geoffrey F.; Ferren, Bran; Gates, William; Hillis, W. Daniel; Hyde, Roderick A.; Ishikawa, Muriel Y.; Jung, Edward K. Y.; Kare, Jordin T.; Myhrvold, Nathan P.; Tegreene, Clarence T.; Tuckerman, David B.; Weaver, Thomas Allan; Whitmer, Charles; Wood, Lowell L.; Wood, Victoria Y. H., Instrumented fluid-surfaced electrode.
  10. Deane, Geoffrey F.; Ferren, Bran; Gates, William; Hillis, W. Daniel; Hyde, Roderick A.; Ishikawa, Muriel Y.; Jung, Edward K. Y.; Kare, Jordin T.; Myhrvold, Nathan P.; Tegreene, Clarence T.; Tuckerman, David B.; Weaver, Thomas Allan; Whitmer, Charles; Wood, Lowell L.; Wood, Victoria Y. H., Instrumented fluid-surfaced electrode.
  11. Chen, Chen-An; Abas, Emmanuel Chua; Divino, Edmundo Anida; Ermita, Jake Randal G.; Capulong, Jose Francisco S.; Castillo, Arnold Villamor; Ma, Diana Xiaobing, Maintainable substrate carrier for electroplating.
  12. Chen, Chen-An; Abas, Emmanuel Chua; Divino, Edmundo Anida; Ermita, Jake Randal G.; Capulong, Jose Francisco S.; Castillo, Arnold Villamor; Ma, Diana Xiaobing, Maintainable substrate carrier for electroplating.
  13. Abas, Emmanuel Chua; Chen, Chen-An; Ma, Diana Xiaobing; Ganti, Kalyana Bhargava, Non-permeable substrate carrier for electroplating.
  14. Chandrasekhar, Prasanna; Chai, Yanjie, Potentiostat/galvanostat with digital interface.
  15. Ganti, Kalyana Bhargava, Sealed substrate carrier for electroplating.
  16. Chandrasekhar, Prasanna, Variable-emittance electrochromic devices and methods of preparing the same.
  17. Arvin, Charles L.; Bezama, Raschid J.; Biggs, Glen N.; Deligianni, Hariklia; Tong, Tracy A., Working electrode design for electrochemical processing of electronic components.
  18. Arvin, Charles L.; Bezama, Raschid J.; Biggs, Glen N.; Deligianni, Hariklia; Tong, Tracy A., Working electrode design for electrochemical processing of electronic components.
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