Retro-reflective target wafer for a position determination system
원문보기
IPC분류정보
국가/구분
United States(US) Patent
등록
국제특허분류(IPC7판)
G01B-011/275
출원번호
US-0588329
(2006-10-27)
등록번호
US-7373726
(2008-05-20)
발명자
/ 주소
Jackson,David A.
Harrell,Rodney
출원인 / 주소
Snap On Technologies, Inc.
대리인 / 주소
McDermott Will & Emery LLP
인용정보
피인용 횟수 :
1인용 특허 :
14
초록▼
A target that is usable in a position determination system such as, for example, a wheel alignment system, is structurally stable over wide temperature ranges, protected from humidity and chemical contamination, and not subject to breakage. A layered target structure includes a substrate board, a re
A target that is usable in a position determination system such as, for example, a wheel alignment system, is structurally stable over wide temperature ranges, protected from humidity and chemical contamination, and not subject to breakage. A layered target structure includes a substrate board, a retro-reflective layer formed on the substrate board, a transparent sheet overlaying the retro-reflective layer, and an opaque patterned layer between the a retro-reflective layer and the transparent sheet. The layered target structure may be secured a support assembly.
대표청구항▼
What is claimed is: 1. A method for creating a target usable in a position determination system, the method comprising the steps of: applying retro-reflective material to a board; depositing photosensitive material to the retro-reflective material; and photo-etching a pattern on the photosensitive
What is claimed is: 1. A method for creating a target usable in a position determination system, the method comprising the steps of: applying retro-reflective material to a board; depositing photosensitive material to the retro-reflective material; and photo-etching a pattern on the photosensitive material. 2. A method as recited in claim 1, wherein the step of photo-etching comprises: aligning a mask template on the photosensitive material; exposing the photosensitive material to light through the mask template; and developing portions of the photosensitive material that have been exposed. 3. A method as recited in claim 1, further comprising the step of applying a layer of glue to the patterned photosensitive material through a silk screen process. 4. A method as recited in claim 1, wherein the board comprises a thermally stable material. 5. A method as recited in claim 4, wherein the thermally stable material comprises printed circuit board. 6. A method as recited in claim 1, further comprising the step of attaching the board to a support housing. 7. A method for creating a target usable in a position determination system, the method comprising the steps of: applying a layer of opaque, photo sensitive material on an inner surface of a transparent sheet; forming a master mask template having a negative target pattern; overlaying the mask template on the photo sensitive material; exposing the photosensitive layer to light through the mask template; removing masked areas of the photo sensitive material to form a patterned configuration; attaching a retro-reflective structure to the patterned inner surface of the transparent sheet. 8. A method as recited in claim 7, wherein the photo sensitive material comprises epoxy glue. 9. A method as recited in claim 8, wherein the step of applying photo sensitive material comprises a silk screen process. 10. A method as recited in claim 7, wherein the step of forming a mask template is performed with an interferrometric plotter to obtain an accurate negative pattern. 11. A method as recited in claim 7, wherein the step of attaching a retro-reflective structure comprises: applying glue to masked areas of the inner surface of the patterned sheet; and bonding the glued inner surface of the sheet to a retro-reflective sheet. 12. A method as recited in claim 11, wherein the step of applying glue to the inner surface of the patterned sheet comprises forming a silk screen pattern that does not overlap masked areas of the sheet. 13. A method as recited in claim 7, wherein the step of attaching a retro-reflective structure comprises: forming an adhesive strip having a removable backing on one surface of a retro-reflective sheet; aligning the retro-reflective sheet with a thermally stable board; securing the aligned adhesive surface of the retro-reflective sheet to the board while removing the backing; and bonding an opposite surface of the retro-reflective sheet to the patterned sheet. 14. A method as recited in claim 7, further comprising the step of fixing the sheet and a retro-reflective structure to a support housing. 15. A target structure in an optical sensing, position determination system, the target structure comprising: a substrate board; an retro-reflective layer formed on the substrate board; a transparent sheet overlaying the retro-reflective layer; and an opaque patterned layer formed between the retro-reflective layer and the transparent sheet. 16. Target structure as recited in claim 15, wherein the opaque patterned layer comprises photosensitive material formed on the retro-reflective layer. 17. Target structure as recited in claim 15, wherein the opaque patterned layer comprises photosensitive material formed on the transparent sheet. 18. Target structure as recited in claim 15, wherein the opaque patterned layer comprises photosensitive epoxy glue, formed by exposure through a patterned mask. 19. Target structure as recited in claim 15, wherein the substrate comprises a printed circuit board. 20. Target structure as recited in claim 19, further comprising a support assembly to which the target layers and substrate are secured.
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이 특허에 인용된 특허 (14)
Dale, Jr.,James, Calibration certification for wheel alignment equipment.
Buckley Galen L. (40 Ashwood Irvine CA 92714) Martin Harold W. (1848 Port Sheffield Newport Beach CA 92660), Universally adjustable ranging target and retro-reflector housing bracket.
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