$\require{mediawiki-texvc}$

연합인증

연합인증 가입 기관의 연구자들은 소속기관의 인증정보(ID와 암호)를 이용해 다른 대학, 연구기관, 서비스 공급자의 다양한 온라인 자원과 연구 데이터를 이용할 수 있습니다.

이는 여행자가 자국에서 발행 받은 여권으로 세계 각국을 자유롭게 여행할 수 있는 것과 같습니다.

연합인증으로 이용이 가능한 서비스는 NTIS, DataON, Edison, Kafe, Webinar 등이 있습니다.

한번의 인증절차만으로 연합인증 가입 서비스에 추가 로그인 없이 이용이 가능합니다.

다만, 연합인증을 위해서는 최초 1회만 인증 절차가 필요합니다. (회원이 아닐 경우 회원 가입이 필요합니다.)

연합인증 절차는 다음과 같습니다.

최초이용시에는
ScienceON에 로그인 → 연합인증 서비스 접속 → 로그인 (본인 확인 또는 회원가입) → 서비스 이용

그 이후에는
ScienceON 로그인 → 연합인증 서비스 접속 → 서비스 이용

연합인증을 활용하시면 KISTI가 제공하는 다양한 서비스를 편리하게 이용하실 수 있습니다.

In situ optical surface temperature measuring techniques and devices

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • G01K-011/12
  • G01K-011/00
  • G01K-011/20
  • G01K-011/32
  • G01J-005/08
출원번호 US-0361543 (2006-02-24)
등록번호 US-7374335 (2008-05-20)
발명자 / 주소
  • Gotthold,John P.
  • Stapleton,Terry M.
  • Champetier,Robert
  • Dang,Hung
출원인 / 주소
  • Luxtron Corporation
대리인 / 주소
    Jones Day
인용정보 피인용 횟수 : 2  인용 특허 : 44

초록

A luminescent temperature sensor comprising (i) an object having a recess, (ii) a layer of luminescent material disposed in the recess, wherein the luminescent material emits electromagnetic radiation having a detectable optical characteristic that is functionally dependent on the temperature of the

대표청구항

The invention claimed is: 1. A temperature sensor in a chamber comprising: a test substrate removeably disposed in said chamber, said test substrate having a surface, said surface having a recess therein; a layer of luminescent material, disposed in the recess, that emits electromagnetic radiation

이 특허에 인용된 특허 (44)

  1. Takahashi Mitsukazu (Kyoto JPX) Chiba Takatoshi (Kyoto JPX) Nishii Kiyofumi (Kyoto JPX), Apparatus for heat-treating wafer by light-irradiation and device for measuring temperature of substrate used in such ap.
  2. Kadthala R. Narendrnath ; Liang-Guo Wang ; Shamouil Shamouilian ; Paul E. Luscher ; Hamid Noorbakhsh, Apparatus for measuring pedestal and substrate temperature in a semiconductor wafer processing system.
  3. Kumar Ajay ; Chinn Jeffrey ; Deshmukh Shashank C. ; Jiang Weinan ; Duda Brian ; Guenther Rolf ; Minaee Bruce ; Mombelli Marco ; Wiltse Mark, Apparatus for measuring pedestal temperature in a semiconductor wafer processing system.
  4. Pan Shaoher X., Apparatus for real-time, in situ measurement of temperature and a method of fabricating and using same.
  5. Adams Bruce ; Hunter Aaron ; Rubinchik Alex ; Yam Mark ; O'Brien Paul A., Apparatus for substrate temperature measurement using a reflecting cavity and detector.
  6. Rall Dieter L. (Los Gatos CA), Autocalibrating dual sensor non-contact temperature measuring device.
  7. Dunn Steven B., Bath sponge support for infants.
  8. El-Ibiary Yehia (Greenville SC), Bearing housing with embedded temperature measurement device.
  9. Dils Ray R. (Vancouver WA), Blackbody radiation sensing optical fiber thermometer system.
  10. Wooten David ; Krein Bruce ; Shi Jianou, Contact temperature probe with unrestrained orientation.
  11. Husain Anwar ; Noorbakhsh Hamid, Controlling the temperature of a wafer by varying the pressure of gas between the underside of the wafer and the chuck.
  12. Hamid Norrbakhsh ; Mike Welch ; Paul Luscher ; Siamak Salimian ; Brad Mays, Correction of wafer temperature drift in a plasma reactor based upon continuous wafer temperature measurements using and in-situ wafer temperature optical probe.
  13. Phillips Stephen R. (Walnut Creek CA), Fiber optic thermal anemometer.
  14. Sun Mei H. (Los Altos CA) Wickersheim Kenneth A. (Menlo Park CA) Heinemann Stanley O. (Irvine CA), Fiberoptic sensing of temperature and/or other physical parameters.
  15. Sun Mei H. (Los Altos CA) Wickersheim Kenneth A. (Menlo Park CA) Heinemann Stanley O. (Irvine CA), Fiberoptic sensing of temperature and/or other physical parameters.
  16. Villar Luis F. (Westbury NY), Heat sensing device.
  17. Ishikawa Tetsuya ; Lue Brian, In-situ substrate temperature measurement scheme in plasma reactor.
  18. Renken Wayne Glenn ; Sun Mei H. ; Miller Paul ; Gordon Roy ; Vandenabeele Peter Michael Noel,BEX, Integrated wafer temperature sensors.
  19. Tamura Naoyuki (Yamaguchi-ken JPX) Edamura Manabu (Ibaraki-ken JPX) Takahashi Kazue (Yamaguchi-ken JPX), Method and apparatus for detecting the temperature of a sample.
  20. Yam Mark, Method and apparatus for infrared pyrometer calibration in a thermal processing system.
  21. Peuse Bruce W. ; Miner Gary E. ; Yam Mark ; Hunter Aaron ; Knoot Peter ; Mershon Jason, Method and apparatus for measuring substrate temperatures.
  22. Jensen Earl M. (Sunnyvale CA) Sun Mei H. (Los Altos CA) Vecht David L. (San Jose CA) Melen Robert E. (Saratoga CA), Modular luminescence-based measuring system using fast digital signal processing.
  23. Schietinger Charles W. (Portland OR) Adams Bruce E. (Portland OR), Non-contact optical techniques for measuring surface conditions.
  24. Saaski Elric W. (Bothell WA) McCrae David A. (Seattle WA) Lawrence Dale M. (Lynnwood WA), Optical oxygen sensor.
  25. Brogardh Torgny (Vsters SEX) Hk Bertil (Vsters SEX) Ovren Christer (Vsters SEX), Optical sensor having atomically localized luminescence centers.
  26. Renken, Wayne; Sun, Mei H.; Ginwalla, Arwa, Optical techniques for measuring parameters such as temperature across a surface.
  27. Wickersheim ; Kenneth A., Optical temperature measurement technique utilizing phosphors.
  28. Wickersheim Kenneth A. (Palo Alto CA), Optical temperature measurement technique utilizing phosphors.
  29. Wickersheim Kenneth A. (Palo Alto CA), Optical temperature measurement technique utilizing phosphors.
  30. Wickersheim Kenneth A. (Menlo Park CA) Sun Mei H. (Los Altos CA) Heinemann Stanley O. (Irvine CA), Optical temperature measurement techniques.
  31. Wickersheim Kenneth A. (Menlo Park CA) Sun Mei H. (Los Altos CA) Heinemann Stanley O. (Irving CA) Hinemann Stanley O. (Irvine CA), Optical temperature measurement techniques.
  32. Wickersheim, Kenneth A., Optical temperature measurement techniques utilizing phosphors.
  33. Baldock Michael B.,CAX ; Provencal Louis R.,CAX, Retractable thermowell.
  34. Furuya Kunihiro,JPX ; Yonezawa Toshihiro,JPX ; Inoue Ken,JPX ; Nakagomi Yoichi,JPX, Semiconductor wafer holder with spring-mounted temperature measurement apparatus disposed therein.
  35. Wickersheim Kenneth A. (Menlo Park CA) Sun Mei H. (Los Altos CA), Technique for optically measuring the temperature of an ultrasonically heated object.
  36. Renken Wayne Glenn ; Vandenabeele Peter Michel Noel,BEX, Temperature calibration substrate.
  37. Spirg Ernst (P.O. Box 160 CH-8640 Rapperswil CHX), Temperature indicator.
  38. Wickersheim Kenneth A. (Menlo Park CA) Adams Bruce E. (Portland OR), Temperature measurement with combined photo-luminescent and black body sensing techniques.
  39. Takashi Shigeoka JP; Takeshi Sakuma JP, Temperature measuring method, temperature control method and processing apparatus.
  40. Suzuki, Tomohiro; Kasai, Shigeru; Shimizu, Masahiro; Yazawa, Minoru, Temperature measuring system.
  41. Penelon Joel ; Cardoso Andre, Temperature probe and measurement method for low pressure process.
  42. Hegedus Andreas G., Temperature probes for measuring substrate temperature.
  43. Sun Mei H. (Los Altos CA) Wickersheim Kenneth A. (Menlo Park CA), Three-parameter optical fiber sensor and system.
  44. Shufflebotham Paul Kevin ; Von Bunau Heinrich, Two-element plasma resistant lightpipe assembly.

이 특허를 인용한 특허 (2)

  1. Harty, Ryan Douglas Roy, Attaching in situ thermal management equipment to high pressure storage tanks for industrial gases.
  2. Gosis, Anatoly; Reading, Shannon B.; Fabin, Joseph E.; Otte, Frank, System and method for controlling temperature indicators.
섹션별 컨텐츠 바로가기

AI-Helper ※ AI-Helper는 오픈소스 모델을 사용합니다.

AI-Helper 아이콘
AI-Helper
안녕하세요, AI-Helper입니다. 좌측 "선택된 텍스트"에서 텍스트를 선택하여 요약, 번역, 용어설명을 실행하세요.
※ AI-Helper는 부적절한 답변을 할 수 있습니다.

선택된 텍스트