|국가/구분||United States(US) Patent 등록|
|미국특허분류(USC)||137/630.22; 137/599.16; 137/601.01|
|발명자 / 주소|
|출원인 / 주소|
|대리인 / 주소||
|인용정보||피인용 횟수 : 1 인용 특허 : 4|
A high resolution flow valve may comprise a first stage valve for allowing a first flow through the flow valve and a second stage valve located concentrically within the first stage valve and also connected to the inlet for allowing an additional second flow through the flow valve.
The invention claimed is: 1. A flow valve for gases or liquids comprising: a first stage valve seat located on a flow aperture; a mount located radially inward from the first valve seat within the aperture, wherein the mount defines a single contiguous first passage connected in parallel with and concentric to a single contiguous second passage; a first stage pintel sized to interface with the first stage valve seat, wherein the first stage pintel is structured to adjustably increase, decrease or stop the flow of gasses or liquids through the first pass...