초록 ▼

In the case where a contact hole is formed by a conventional process of the semiconductor device fabrication, a resist is required to be formed almost entirely over a substrate in order to form the resist over the film where the contact hole is not formed. Accordingly, the throughput is considerably

In the case where a contact hole is formed by a conventional process of the semiconductor device fabrication, a resist is required to be formed almost entirely over a substrate in order to form the resist over the film where the contact hole is not formed. Accordingly, the throughput is considerably low. Further, when the resist spreads to the area of the contact hole when the amount of the resist to be applied and the surface state of the base are not fully controlled, contact defect would occur. Thus, improvements are required. According to the invention, in forming a semiconductor device, a part to be a contact hole of the semiconductor device may be covered with a first organic film that is liquid repellent. Subsequently, a second organic film serving as an insulating film is formed on the area where the first organic film is not formed, and the first organic film is removed thereafter to form a contact hole.

대표청구항 ▼

What is claimed is: 1. A fabrication method of a semiconductor device, comprising the steps of: selectively forming a first organic film which is liquid repellent on a film; forming a second organic film on a portion of the film where the first organic film is not formed; removing the first organic

What is claimed is: 1. A fabrication method of a semiconductor device, comprising the steps of: selectively forming a first organic film which is liquid repellent on a film; forming a second organic film on a portion of the film where the first organic film is not formed; removing the first organic film after forming the second organic film so that the second organic film has a contact hole; and forming a conductive film on the second organic film and in the contact hole, wherein the conductive film is in contact with the film. 2. The fabrication method of the semiconductor device according to claim 1, wherein the first organic film is formed of a material of a chemical formula Rn--Si--X4-n (n=1, 2, 3); in which R is an alkyl group, a vinyl group, an amino group, or an epoxy group; and X is halogen, a methoxy group, an ethoxy group, or an acetoxy group. 3. The fabrication method of the semiconductor device according to claim 1, wherein the first organic film is made of FAS (fluoroalkyl silane). 4. The fabrication method of the semiconductor device according to claim 1, wherein the second organic film contains one selected from the group consisting of acrylic resin, polyimide resin, and siloxane resin. 5. The fabrication method of the semiconductor device according to claim 1, wherein the semiconductor device is a top gate TFT. 6. The fabrication method of the semiconductor device according to claim 1, wherein the semiconductor device is an inverted staggered TFT. 7. The fabrication method of the semiconductor device according to claim 1, wherein the semiconductor device is used in a liquid crystal device. 8. The fabrication method of the semiconductor device according to claim 1, wherein the semiconductor device is used in an EL display device. 9. The fabrication method of the semiconductor device according to claim 1, wherein the semiconductor device is used in one selected from the group consisting of a television, a portable book, and a cellular phone. 10. The fabrication method of the semiconductor device according to claim 1, wherein the film is a semiconductor film. 11. The fabrication method of the semiconductor device according to claim 1, wherein the film is a conductive film. 12. The fabrication method of the semiconductor device according to claim 1, wherein the film is an insulating film. 13. The fabrication method of the semiconductor device comprising the steps of: selectively forming a first organic film which is liquid repellent on a film; forming a second organic film on a portion of the film where the first organic film is not formed; removing the first organic film after forming the second organic film so that the second organic film has a contact hole; and forming a conductive film on the second organic film and in the contact hole. 14. The fabrication method of the semiconductor device according to claim 13, wherein the first organic film is formed of a material of a chemical formula Rn--Si--X4-n (n=1, 2, 3); in which R is an alkyl group, a vinyl group, an amino group, or an epoxy group; and X is halogen, a methoxy group, an ethoxy group, or an acetoxy group. 15. The fabrication method of the semiconductor device according to claim 13, wherein the first organic film is made of FAS (fluoroalkyl silane). 16. The fabrication method of the semiconductor device according to claim 13, wherein the second organic film contains one selected from the group consisting of acrylic resin, polyimide resin, and siloxane resin. 17. The fabrication method of the semiconductor device according to claim 13, wherein the semiconductor device is a top gate TFT. 18. The fabrication method of the semiconductor device according to claim 13, wherein the semiconductor device is an inverted staggered TFT. 19. The fabrication method of the semiconductor device according to claim 13, wherein the semiconductor device is used in a liquid crystal device. 20. The fabrication method of the semiconductor device according to claim 13, wherein the semiconductor device is used in an EL display device. 21. The fabrication method of the semiconductor device according to claim 13, wherein the semiconductor device is used in one selected from the group consisting of a television, a portable book, and a cellular phone. 22. A fabrication method of a semiconductor device comprising of: selectively forming a first organic film which is liquid repellent by a droplet discharge method on a film; forming a second organic film on a portion of the film where the first organic film is not formed; removing the first organic film after forming the second organic film so that the second organic film has a contact hole; and selectively forming a conductive film on the second organic film and in the contact hole by a droplet discharge method. 23. The fabrication method of the semiconductor device according to claim 22, wherein the first organic film is formed of a material of a chemical formula Rn--Si--X4-n (n=1, 2, 3); in which R is an alkyl group, a vinyl group, an amino group, or an epoxy group; and X is halogen, a methoxy group, an ethoxy group, or an acetoxy group. 24. The fabrication method of the semiconductor device according to claim 22, wherein the first organic film is made of FAS (fluoroalkyl silane). 25. The fabrication method of the semiconductor device according to claim 22, wherein the second organic film contains one selected from the group consisting of acrylic resin, polyimide resin, and siloxane resin. 26. The fabrication method of the semiconductor device according to claim 22, wherein the semiconductor device is a top gate TFT. 27. The fabrication method of the semiconductor device according to claim 1, wherein the semiconductor device is an inverted staggered TFT. 28. The fabrication method of the semiconductor device according to claim 22, wherein the semiconductor device is used in a liquid crystal device. 29. The fabrication method of the semiconductor device according to claim 22, wherein the semiconductor device is used in an EL display device. 30. The fabrication method of the semiconductor device according to claim 22, wherein the semiconductor device is used in one selected from the group consisting of a television, a portable book, and a cellular phone. 31. A fabrication method of a semiconductor device comprising the steps of: selectively forming a first organic film on a film; performing a plasma treatment to the first organic film; forming a second organic film on a portion of the film where the first organic film is not formed; and removing the first organic film after forming the second organic film so that the second organic film has a contact hole. 32. The fabrication method of the semiconductor device according to claim 31, wherein the first organic film contains a water soluble resin. 33. The fabrication method of the semiconductor device according to claim 31, wherein the first organic film contains PVA (polyvinyl alcohol). 34. The fabrication method of the semiconductor device according to claim 31, wherein the plasma treatment is performed using a fluorine-based gas. 35. The fabrication method of the semiconductor device according to claim 31, wherein the plasma treatment is performed using CF4 gas. 36. The fabrication method of the semiconductor device according to claim 31, wherein the semiconductor device is a top gate TFT. 37. The fabrication method of the semiconductor device according to claim 31, wherein the semiconductor device is an inverted staggered TFT. 38. The fabrication method of the semiconductor device according to claim 31, wherein the semiconductor device is used in a liquid crystal device. 39. The fabrication method of the semiconductor device according to claim 31, wherein the semiconductor device is used in an EL display device. 40. The fabrication method of the semiconductor device according to claim 31, wherein the semiconductor device is used in one selected from the group consisting of a television, a portable book, and a cellular phone. 41. A fabrication method of a semiconductor Device, comprising the steps of: selectively forming a first organic film on a film; performing a plasma treatment to the first organic film; forming a second organic film on a portion of the film where the first organic film is not formed; removing the first organic film after forming the second organic film so that the second organic film has a contact hole; and forming a conductive film on the second organic film and in the contact hole. 42. The fabrication method of the semiconductor device according to claim 41, wherein the first organic film contains a water soluble resin. 43. The fabrication method of the semiconductor device according to claim 41, wherein the first organic film contains PVA (polyvinyl alcohol). 44. The fabrication method of the semiconductor device according to claim 41, wherein the plasma treatment is performed using a fluorine-based gas. 45. The fabrication method of the semiconductor device according to claim 41, wherein the plasma treatment is performed using CF4 gas. 46. The fabrication method of the semiconductor device according to claim 41, wherein the semiconductor device is a top gate TFT. 47. The fabrication method of the semiconductor device according to claim 41, wherein the semiconductor device is an inverted staggered TFT. 48. The fabrication method of the semiconductor device according to claim 41, wherein the semiconductor device is used in a liquid crystal device. 49. The fabrication method of the semiconductor device according to claim 41, wherein the semiconductor device is used in an EL display device. 50. The fabrication method of the semiconductor device according to claim 41, wherein the semiconductor device is used in one selected from the group consisting of a television, a portable book, and a cellular phone. 51. A fabrication method of a semiconductor device comprising the steps of: selectively forming a first organic film by a droplet discharge method on a film; performing a plasma treatment to the first organic film; forming a second organic film on a portion of the film where the first organic film is not formed; removing the first organic film after forming the second organic film so that the second organic film has a contact hole; and selectively forming a conductive film on the second organic film and in the contact hole by liquid discharge method. 52. The fabrication method of the semiconductor device according to claim 51, wherein the first organic film contains a water soluble resin. 53. The fabrication method of the semiconductor device according to claim 51, wherein the first organic film contains PVA (polyvinyl alcohol). 54. The fabrication method of the semiconductor device according to claim 51, wherein the plasma treatment is performed using a fluorine-based gas. 55. The fabrication method of the semiconductor device according to claim 51, wherein the plasma treatment is performed using CF4 gas. 56. The fabrication method of the semiconductor device according to claim 51, wherein the semiconductor device is a top gate TFT. 57. The fabrication method of the semiconductor device according to claim 51, wherein the semiconductor device is an inverted staggered TFT. 58. The fabrication method of the semiconductor device according to claim 51, wherein the semiconductor device is used in a liquid crystal device. 59. The fabrication method of the semiconductor device according to claim 51, wherein the semiconductor device is used in an EL display device. 60. The fabrication method of the semiconductor device according to claim 51, wherein the semiconductor device is used in one selected from the group consisting of a television, a portable book, and a cellular phone. 61. A fabrication method of an active matrix display device, comprising the steps of: selectively forming a first organic film which is liquid repellent on a film; forming a second organic film on a portion of the film where the first organic film is not formed; and removing the first organic film after forming the second organic film so that the second organic film has a contact hole. 62. The fabrication method of the active matrix display device according to claim 61, wherein the first organic film is formed of a material of a chemical formula Rn--Si--X4-n (n=1, 2, 3); in which R is an alkyl group, a vinyl group, an amino group, or an epoxy group; and X is halogen, a methoxy group, an ethoxy group, or an acetoxy group. 63. The fabrication method of the active matrix display device according to claim 61, wherein the first organic film is made of FAS (fluoroalkyl silane). 64. The fabrication method of the active matrix display device according to claim 61, wherein the second organic film contains one selected from the group consisting of acrylic resin, polyimide resin, and siloxane resin. 65. A fabrication method of an active matrix display device comprising the steps of: selectively forming a first organic film on a film; performing a plasma treatment to the first organic film; forming a second organic film on a portion of the film where the first organic film is not formed; and forming a contact hole at a part where the first organic film has been formed by removing the first organic film after forming the second organic film. 66. The fabrication method of the active matrix display device according to claim 65, wherein the first organic film contains a water soluble resin. 67. The fabrication method of the active matrix display device according to claim 65, wherein the first organic film contains PVA (polyvinyl alcohol). 68. The fabrication method of the active matrix display device according to claim 65, wherein the plasma treatment is performed using a fluorine-based gas. 69. The fabrication method of the active matrix display device according to claim 65, wherein the plasma treatment is performed using CF4 gas. 70. A fabrication method of a semiconductor device, comprising the steps of: selectively forming a first organic film which is liquid repellent on a film in a first region; forming a second organic film in a second region; removing the first organic film after forming the second organic film so that a contact hole is formed in the first region; and forming a conductive film on the second organic film and in the contact hole, wherein the conductive film is in contact with the film. 71. The fabrication method of the semiconductor device according to claim 70, wherein the first organic film is formed of a material of a chemical formula Rn--Si--X4-n (n=1, 2, 3); in which R is an alkyl group, a vinyl group, an amino group, or an epoxy group; and X is halogen, a methoxy group, an ethoxy group, or an acetoxy group. 72. The fabrication method of the semiconductor device according to claim 70, wherein the first organic film is made of FAS (fluoroalkyl silane). 73. The fabrication method of the semiconductor device according to claim 70, wherein the second organic film contains one selected from the group consisting of acrylic resin, polyimide resin, and siloxane resin. 74. The fabrication method of the semiconductor device according to claim 70, wherein the semiconductor device is a top gate TFT. 75. The fabrication method of the semiconductor device according to claim 70, wherein the semiconductor device is an inverted staggered TFT. 76. The fabrication method of the semiconductor device according to claim 70, wherein the semiconductor device is used in a liquid crystal device. 77. The fabrication method of the semiconductor device according to claim 70, wherein the semiconductor device is used in an EL display device. 78. The fabrication method of the semiconductor device according to claim 70, wherein the semiconductor device is used in one selected from the group consisting of a television, a portable book, and a cellular phone.