Non-corrosive cleaning composition for removing plasma etching residues
원문보기
IPC분류정보
국가/구분
United States(US) Patent
등록
국제특허분류(IPC7판)
H01L-021/461
H01L-021/02
출원번호
US-0305794
(2005-12-16)
등록번호
US-7402552
(2008-07-22)
발명자
/ 주소
Honda,Kenji
Elderkin,Michelle
Leon,Vincent
출원인 / 주소
Fujifilm Electronic Materials U.S.A., Inc.
대리인 / 주소
Fish & Richardson P.C.
인용정보
피인용 횟수 :
0인용 특허 :
73
초록▼
A non-corrosive cleaning composition for removing residues from a substrate. The composition comprises: (a) water; (b) at least one hydroxylammonium compound; (c) at least one basic compound, preferably selected from the group consisting of amines and quaternary ammonium hydroxides; (d) at least one
A non-corrosive cleaning composition for removing residues from a substrate. The composition comprises: (a) water; (b) at least one hydroxylammonium compound; (c) at least one basic compound, preferably selected from the group consisting of amines and quaternary ammonium hydroxides; (d) at least one organic carboxylic acid; and (e) optionally, a polyhydric compound. The pH of the composition is preferably between about 2 to about 6.
대표청구항▼
What is claimed is: 1. A method for cleaning residue from a substrate, which comprises the step of: applying a cleaning composition to said substrate, wherein said composition consists of: (a) water; (b) at least one hydroxylammonium compound; (c) at least one basic compound, and (d) at least one o
What is claimed is: 1. A method for cleaning residue from a substrate, which comprises the step of: applying a cleaning composition to said substrate, wherein said composition consists of: (a) water; (b) at least one hydroxylammonium compound; (c) at least one basic compound, and (d) at least one organic carboxylic acid selected from the group consisting of: lactic acid, citric acid, formic acid, oxalic acid, acetic acid, propionic acid, valeric acid, isovaleric acid, malonic acid, succinic acid, glutaric acid, maleic acid, fumaric acid, phthalic acid, 1,2,3-benzenetricarboxylic acid, glycolic acid, salicylic acid, tartaric acid, and gluconic acid, wherein said carboxylic acid is present in an amount between about 0.01 wt. % to 10 wt. % based on the total weight of the composition. 2. The method of claim 1, wherein said hydroxylammonium compound is selected from the group consisting of: hydroxylammonium sulfate, hydroxylammonium nitrate, hydroxylammonium phosphate, hydroxylammonium chloride, hydroxylammonium oxalate, hydroxylammonium citrate, hydroxylammonium lactate, and mixtures thereof. 3. The method of claim 1, wherein said hydroxylammonium compound is present in an amount between about 0.01 wt. % to 30 wt. % based on the total weight of said composition. 4. The method of claim 1, wherein said basic compound is selected from the group consisting of amines and quaternary ammonium hydroxides. 5. The method of claim 4, wherein said basic compound is a quaternary ammonium hydroxide selected from the group consisting of: tetramethylammonium hydroxide, tetraethylammonium hydroxide, and mixtures thereof. 6. The method of claim 1, wherein said basic compound is present in an amount between about 0.01 wt. % to 3 wt. % based on the total weight of said composition. 7. The method of claim 1, further comprising a polyhydric compound. 8. The method of claim 7, wherein said polyhydric compound is selected from the group consisting of ethylene glycol, propylene glycol, glycerol, and mixtures thereof. 9. The method of claim 1, wherein said composition has a pH of about 2 to 6. 10. The method of claim 1, wherein said composition has a pH of about 3 to 4.5. 11. The method of claim 1, wherein said substrate is a metal substrate.
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