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Method and system for flow measurement and validation of a mass flow controller

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • G01F-001/34
출원번호 US-0887591 (2004-07-09)
등록번호 US-7412986 (2008-08-19)
발명자 / 주소
  • Tison,Stuart A.
  • Sukumaran,Sandeep
  • Barker,James
출원인 / 주소
  • Celerity, Inc.
대리인 / 주소
    Lowrie, Lando & Anastasi, LLP
인용정보 피인용 횟수 : 12  인용 특허 : 24

초록

Systems and methods for flow verification and validation of mass flow controllers are disclosed. A mass flow controller may be commanded to a specified flow and flow measurement commenced. Gas is accumulated in a first volume and while measurements are taken within this volume. Gas may then flow int

대표청구항

What is claimed is: 1. A method of measuring a rate of flow through a flow controller that is operatively connected to a distribution system having a first region and a second region, the first region having a first internal volume and the second region having a second internal volume, wherein flui

이 특허에 인용된 특허 (24)

  1. Caron Richard W. (Canton MI), Air flow manifold system for providing two different mass air flow rates to a mass air flow sensor production calibratio.
  2. Shajii, Ali; Kottenstette, Nicholas; Ambrosina, Jesse, Apparatus and method for pressure fluctuation insensitive mass flow control.
  3. Fredericks George (Graz ATX), Apparatus for continuously measuring rates of flow of a liquid.
  4. Hinkle Luke D. (Townsend MA), Apparatus for mass flow measurement of a gas.
  5. Berrettini Bruce Joseph (Allentown PA), Apparatus for proving and calibrating cryogenic flow meters.
  6. Grosskreuz Gerhard (Volksdorfer Weg 174 2000 Hamburg 65 DEX) Kleinophorst Edith (Kronprinzenstr. 9 4130 Moers 1 DEX), Apparatus for simultaneously filling a plurality of containers with liquid, gaseous or solid substances.
  7. Bevers,William Daniel; Jones,Robert Francis; Ross,Bennett J.; Buckfeller,Joseph William; Flack,James L., Bypass loop gas flow calibration.
  8. Miller Charles E. ; Foster James ; Smith Thomas, Densitometer.
  9. Wilmer Michael E., Dynamic gas flow controller.
  10. Shajii,Ali; Smith,Daniel Alexander, External volume insensitive flow verification.
  11. Louis A. Ollivier, Flow control of process gas in semiconductor manufacturing.
  12. Sparks Brian E. (Weare Giffard GB2), Fluid flow control system.
  13. Tucker, Jeffrey C.; Andersen, Brian L.; Mittelstadt, Robert, Fluid flow control system, fluid delivery and control system for a fluid delivery line, and method for controlling pressure oscillations within fluid of a fluid delivery line.
  14. White, William W.; White, William H.; Davis, Christopher B.; Smith, Nelson D., Fluid flow controller and method of operation.
  15. Laragione Robert ; LeMay Dan B. ; Redemann Eric J. ; Upchurch Michael D., Method and apparatus for determining a rate of flow of gas by a rate of change of pressure.
  16. Kennedy Lyn R. (Dallas TX), Method and apparatus for measuring and controlling volumetric flow rate of gases in a line.
  17. Vander Heyden William H. (Mequon WI) Clingman ; Jr. William H. (Dallas TX), Method and apparatus for measuring mass flow and energy content using a linear flow meter.
  18. Brown Timothy R., Method for wide range gas flow system with real time flow measurement and correction.
  19. Bersin Richard L. (Norwalk CT) Clouser William H. (Norwalk CT), Molar gas-flow controller.
  20. Delajoud Pierre R. (109 Rue de Longchamp 92200 Neuilly sur Seine FRX), Precision gas mass flow measurement apparatus and method maintaining constant fluid temperature in thin elongated flow p.
  21. Zarkar, Kaveh; L'Bassi, Michael Frank; Quaratiello, Mark James, System and method for in-situ flow verification and calibration.
  22. Tison,Stuart A.; Lu,Shiliang, System and method for measuring flow.
  23. Ueki Kouichi (Nara JPX) Fujieda Hiroshi (Kashihara JPX), Temperature-adjustable water supply system.
  24. Brown Timothy R. ; Judd Daniel R., Wide range gas flow system with real time flow measurement and correction.

이 특허를 인용한 특허 (12)

  1. Yasuda, Tadahiro; Hayashi, Shigeyuki; Takahashi, Akito; Shimizu, Tetsuo, Flow rate control device, diagnostic device for use in flow rate measuring mechanism or for use in flow rate control device including the flow rate measuring mechanism and recording medium having diagnostic program recorded thereon for use in the same.
  2. Nakada, Akiko; Mori, Yoji; Shiroyama, Naoya; Ito, Minoru, Gas flow monitoring system.
  3. Ozawa, Yukio; Ito, Minoru; Doi, Hiroki; Nakada, Akiko, Gas flow rate verification unit.
  4. Ding, Junhua; Zarkar, Kaveh, High accuracy mass flow verifier with multiple inlets.
  5. Lacouture, Francois; Oblinger, Benjamin, Hybrid dosing unit.
  6. Monkowski, Adam J.; Chen, Jialing; Ding, Tao; Monkowski, Joseph R., Method and apparatus for gas flow control.
  7. Monkowski, Adam J.; Chen, Jialing; Ding, Tao; Monkowski, Joseph R., Method and apparatus for gas flow control.
  8. Monkowski, Adam J.; Chen, Jialing; Ding, Tao; Monkowski, Joseph R., Method and apparatus for gas flow control.
  9. Monkowski, Joseph R.; Chen, Jialing; Ding, Tao; MacAllen Chalmers, James, Method and apparatus for in situ testing of gas flow controllers.
  10. Spyropoulos, Evangelos; Shareef, Iqbal, Metrology method for transient gas flow.
  11. Horwitz, Christopher Max, Pressure-based gas flow controller with dynamic self-calibration.
  12. Monkowski, Joseph R.; Monkowski, Adam J.; Chen, Jialing; Ding, Tao, Transient measurements of mass flow controllers.
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