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Gas supply method in a CVD coating system for precursors with a low vapor pressure

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • C23C-016/00
출원번호 US-0014488 (2004-12-16)
등록번호 US-7413767 (2008-08-19)
우선권정보 DE-100 05 820(2000-02-10)
발명자 / 주소
  • Bauch,Hartmut
  • Bewig,Lars
  • Klippe,Lutz
  • K��pper,Thomas
출원인 / 주소
  • Schott AG
대리인 / 주소
    Baker & Daniels LLP
인용정보 피인용 횟수 : 10  인용 특허 : 27

초록

A method for producing optical functional coatings comprising niobium, tantalum, titanium or aluminum by supplying a precursor gas of low vapor pressure in a CVD coating system. A precursor selected from the group consisting of Nb, Ta, Ti, and Al compounds having a vapor pressure is maintained withi

대표청구항

The invention claimed is: 1. A method for producing optical functional coatings comprising niobium, tantalum, titanium or aluminum by supplying a precursor gas of low vapor pressure in a CVD coating system, comprising the steps of: maintaining a precursor selected from the group consisting of Nb, T

이 특허에 인용된 특허 (27)

  1. Choi Hyungsoo, Amidoalane precursors for chemical vapor deposition of aluminum.
  2. Barbee Steven G. (Dutchess County NY) Conti Richard A. (Westchester County NY) Kostenko Alexander (Dutchess County NY) Sarma Narayana V. (Dutchess County NY) Wilson Donald L. (Orange County NY) Wong , Apparatus for chemical vapor deposition of aluminum oxide.
  3. Bittner Hans J. (Ingelheim DEX) Klein Hans-Jrgen (Bad Gandersheim DEX) Kpper Thomas (Bad Gandersheim DEX) Mrsen Ewald (Mrfelden DEX), Apparatus for supplying CVD coating devices.
  4. Klinedinst Keith A. (Marlborough MA) Lester Joseph E. (Lincoln MA), Apparatus for the controlled delivery of vaporized chemical precursor to an LPCVD reactor.
  5. Hirai Yutaka (Tokyo JPX) Komatsu Toshiyuki (Kawasaki JPX) Nakagawa Katsumi (Tokyo JPX) Misumi Teruo (Toride JPX) Fukuda Tadaji (Kawasaki JPX), CVD method for forming a photoconductive hydrogenated a-Si layer.
  6. Wernberg Alex A. (Rochester NY) Gysling Henry J. (Rochester NY), Chemical vapor deposition of niobium and tantalum oxide films.
  7. Wilmer Michael E., Dynamic gas flow controller.
  8. Ohmi Tadahiro (1-17-301 ; Komegabukuro 2-chome Aoba-ku ; Sendai-shi ; Miyagi-ken 980 JPX) Fumio Nakahara (Sendai JPX) Satoh Tuyosi (Sendai JPX) Umeda Masaru (Tokyo JPX), Gas supply piping device for a process apparatus.
  9. Tsunenari Kinji (Tokyo JPX), Liquid delivery system at specified rate using ultrasonic vibrators.
  10. Nguyen Chau ; Sivaramakrishnan Visweswaren, Liquid phosphorous precursor delivery apparatus.
  11. Gauthier Scott, Liquid precursor delivery system.
  12. Gauthier Scott, Liquid precursor delivery system.
  13. Adney Billy R. (Orange TX) Alworth Charles W. (Ponca City OK) Durkee John B. (Ponca City OK) Jeffries Bryce T. (Ponca City OK), Mass flowmeter apparatus.
  14. Pierce John M. (Palo Alto CA) Lehrer William I. (Los Altos CA), Method and apparatus for low pressure chemical vapor deposition.
  15. McMillan Larry D. (Colorado Springs CO) Paz de Araujo Carlos A. (Colorado Springs CO) Roberts Tommy L. (Colorado Springs CO), Method and apparatus for material deposition.
  16. Paz de Araujo Carlos A. ; McMillan Larry D. ; Solayappan Narayan ; Bacon Jeffrey W., Method and apparatus for preparing integrated circuit thin films by chemical vapor deposition.
  17. Oguro Kyoji (Gunma-ken JPX) Kurosawa Yasushi (Gunma-ken JPX), Method and apparatus for supply of liquid raw material gas.
  18. Kaloyeros Alain E. ; Arkles Barry C., Method for the chemical vapor deposition of copper-based films.
  19. Gordon Roy G. (22 Highland St. Cambridge MA 02138), Method of depositing electrically conductive, infra-red reflective, transparent coatings of stannic oxide.
  20. Ryoki Tobe JP; Yasuaki Tanaka JP; Atsushi Sekiguchi JP; Hitoshi Jimba JP; So Won Kim KR, Method of depositing titanium nitride thin film and CVD deposition apparatus.
  21. Nguyen Tue ; Senzaki Yoshihide ; Kobayashi Masato ; Charneski Lawrence J. ; Hsu Sheng Teng, Method of using water vapor to increase the conductivity of cooper desposited with cu(hfac)TMVS.
  22. Schmitt, John Vincent; Li, Shih-Hung; Marcadal, Christophe; Chang, Anzhong; Chen, Ling, Methods and apparatus for improved vaporization of deposition material in a substrate processing system.
  23. Ohnishi Hiroshi (Amagasaki JPX) Hoshinouchi Susumu (Amagasaki JPX), Mixture thin film forming apparatus.
  24. Ohmi Tadahiro (Sendai JPX) Sugiyawa Kazuhiko (Sendai JPX) Nakahara Fumio (Sendai JPX) Umeda Masaru (Tokyo JPX), Process gas supply piping system.
  25. Ritrosi Joe ; Schmitt Gary ; Quintino Carl ; Kasper Gerhard, Purgeable connection for gas supply cabinet.
  26. Kanno Yohichi (Miyagi JPX) Uchisawa Osamu (Miyagi JPX) Murakami Kohichi (Miyagi JPX) Ohmi Tadahiro (Sendai JPX), Supply control system for semiconductor process gasses.
  27. McMenamin Joseph C. (Fresno CA), Vapor mass flow control system.

이 특허를 인용한 특허 (10)

  1. Park, Jong Bum; Kang, Chun Ho; Kim, Young Seung, Fabricating low contact resistance conductive layer in semiconductor device.
  2. Ye, Zhiyuan; Kim, Yihwan, Method and apparatus for gas delivery.
  3. Gregg, John N.; Battle, Scott L.; Banton, Jeffrey I.; Naito, Donn K.; Laxman, Ravi, Method and apparatus to help promote contact of gas with vaporized material.
  4. Gregg, John N.; Battle, Scott L.; Banton, Jeffrey I.; Naito, Donn K.; Laxman, Ravi K., Method and apparatus to help promote contact of gas with vaporized material.
  5. Gregg, John N.; Battle, Scott L.; Banton, Jeffrey I.; Naito, Donn K.; Laxman, Ravi K., Method and apparatus to help promote contact of gas with vaporized material.
  6. Gregg, John N.; Battle, Scott L.; Banton, Jeffrey I.; Naito, Donn K.; Laxman, Ravi K., Method and apparatus to help promote contact of gas with vaporized material.
  7. Gregg, John N.; Battle, Scott L.; Banton, Jeffrey I.; Naito, Donn K.; Laxman, Ravi K., Method and apparatus to help promote contact of gas with vaporized material.
  8. Lu, Songwei; McCamy, James W.; Finley, James J., Method of depositing niobium doped titania film on a substrate and the coated substrate made thereby.
  9. Fondurulia, Kyle; Shero, Eric; Verghese, Mohith E.; White, Carl L., Precursor delivery system.
  10. Cleary, John M.; Arno, Jose I.; Hendrix, Bryan C.; Naito, Donn; Battle, Scott; Gregg, John N.; Wodjenski, Michael J.; Xu, Chongying, Solid precursor-based delivery of fluid utilizing controlled solids morphology.
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