A chemical reaction apparatus includes a solid body in which a reaction flow path is formed, and a heater having a thin-film heater formed on the body to oppose the reaction flow path and at least partially exposed to the reaction flow path, and which supplies a predetermined heat amount to the reac
A chemical reaction apparatus includes a solid body in which a reaction flow path is formed, and a heater having a thin-film heater formed on the body to oppose the reaction flow path and at least partially exposed to the reaction flow path, and which supplies a predetermined heat amount to the reaction flow path by the thin-film heater.
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The invention claimed is: 1. A chemical reaction apparatus comprising: a first substrate in which a reaction flow path, in which a fluid material containing hydrogen atoms as compositions flows, is formed, a reaction catalyst layer being formed in at least a portion of the reaction flow path, and a
The invention claimed is: 1. A chemical reaction apparatus comprising: a first substrate in which a reaction flow path, in which a fluid material containing hydrogen atoms as compositions flows, is formed, a reaction catalyst layer being formed in at least a portion of the reaction flow path, and a reaction of the reaction fluid on the reaction catalyst layer being caused in the reaction flow path to produce reaction products including hydrogen gas; and a second substrate including a heating element which comprises: a combustion flow path which is formed in the second substrate to correspond to the reaction flow path, and in which a combustion fluid flows, and a combustion catalyst layer formed in at least a portion of the combustion flow path, the combustion catalyst layer being different from the reaction catalyst layer, and the heating element heating the fluid material flowing in the reaction flow path by a reaction of the combustion fluid on the combustion catalyst layer to cause the reaction in the reaction flow path; wherein the first substrate and the second substrate are stacked. 2. A chemical reaction apparatus according to claim 1, wherein at least one of the first and second substrates comprises a silicon substrate. 3. A chemical reaction apparatus according to claim 1, further comprising a heat radiation preventing film covering at least a portion of outermost surfaces of the first and second substrates. 4. A chemical reaction apparatus according to claim 3, wherein the radiation preventing film is one of: a metal film made of a material selected from the group consisting of Au, Al, and Ag, and a metal oxide film made of a material selected from the group consisting of SnO2, InO3, and ZnO. 5. A chemical reaction apparatus according to claim 1, further comprising a box member in which the first and second substrates are provided, wherein a space is formed in at least a partial portion between the box member and the outermost surfaces of the first and second substrates. 6. A chemical reaction apparatus according to claim 5, wherein one of: the space is in a substantially vacuum state, and a gas having a thermal conductivity lower than a thermal conductivity of components of the box member is sealed in the space. 7. A chemical reaction apparatus according to claim 1, wherein the combustion fluid supplied to the combustion flow path includes oxygen. 8. A chemical reaction apparatus according to claim 1, wherein a first fluid is supplied to the reaction flow path, and the combustion fluid supplied to the combustion flow path comprises the first fluid and a second fluid containing oxygen. 9. A chemical reaction apparatus according to claim 1, wherein a first fluid is supplied to the reaction flow path, and the combustion fluid supplied to the combustion flow path comprises a second fluid containing oxygen and a third fluid formed by separating and removing hydrogen from a fluid discharged from the reaction flow path. 10. A chemical reaction apparatus according to claim 1, further comprising: an inlet port and outlet port corresponding to a first end portion and a second end portion, respectively, of the reaction flow path; an inlet port and outlet port corresponding to a first end portion and a second end portion, respectively, of the combustion flow path; a separation film, which is formed between the second end portion of the reaction flow path and the outlet port of the reaction flow path, and which selectively transmits hydrogen; and a communication hole formed in the first and second substrates between the second end portion of the reaction flow path and the first end portion of the combustion flow path; wherein a first fluid is supplied to the inlet port of the reaction flow path, a second fluid containing oxygen is supplied to the inlet port of the combustion flow path, and a third fluid formed by separating and removing hydrogen from a fluid discharged from the second end portion of the reaction flow path is supplied to the communication hole. 11. A chemical reaction apparatus according to claim 1, further comprising: an inlet port corresponding to a first end portion of the reaction flow path; an inlet port and outlet port formed corresponding to a first end portion and a second end portion, respectively, of the combustion flow path; and a communication hole formed in the first and second substrates between a second end portion of the reaction flow path and the first end portion of the combustion flow path; wherein a first fluid is supplied to the inlet port of the reaction flow path, a fluid discharged from the second end portion of the reaction flow path is supplied to the communication hole, and a second fluid containing oxygen is supplied to the inlet port of the combustion flow path. 12. A chemical reaction apparatus according to claim 1, further comprising: an inlet port and outlet port corresponding to a first end portion and a second end portion of the reaction flow path; an outlet port formed corresponding to a second end portion of the combustion flow path; a separation film, which is formed between the second end portion of the reaction flow path and the outlet port of the reaction flow path, and which selectively transmits hydrogen; and a communication hole formed in the first and second substrates between the second end portion of the reaction flow path and a first end portion of the combustion flow path; wherein a first fluid is supplied to the inlet port of the reaction flow path, and a fluid formed by separating and removing hydrogen from a fluid discharged from the second end portion of the reaction flow path through the communication hole is supplied to the first end portion of the combustion flow path. 13. A chemical reaction apparatus according to claim 1, further comprising: a fluid supplying unit which supplies the fluid to the reaction flow path, and a vaporizing unit which vaporizes the fluid in the reaction flow path by heating an interior of the reaction flow path by the heating element. 14. A chemical reaction apparatus according to claim 1, wherein the reaction catalyst layer comprises a reforming catalyst, and the chemical reaction apparatus further comprises: a fluid supplying unit which supplies the fluid to the reaction flow path; and a reforming unit which reforms the fluid in the reaction flow path by heating an interior of the reaction flow path by the heating element, so that hydrogen is produced. 15. A chemical reaction apparatus according to claim 14, wherein the fluid supplied to the reaction flow path comprises an aqueous solution of methanol. 16. A chemical reaction apparatus according to claim 1, wherein the reaction catalyst layer comprises a selective oxidation catalyst, and the chemical reaction apparatus further comprises: a fluid supplying unit which supplies the fluid to the reaction flow path; and a converting unit which converts carbon monoxide in the fluid into carbon dioxide and hydrogen in the reaction flow path by heating an interior of the reaction flow path by the heating element. 17. A chemical reaction apparatus according to claim 16, wherein the fluid comprises a gas mixture of hydrogen and carbon monoxide. 18. A chemical reaction apparatus according to claim 1, wherein the heating element further comprises: a third substrate provided with a thin-film heater which corresponds to the reaction flow path, and which supplies a predetermined heat amount to the reaction flow path. 19. A chemical reaction apparatus according to claim 18, further comprising a fourth substrate which covers the thin-film heater formed on the third substrate and is bonded to a surface of the third substrate. 20. A chemical reaction apparatus according to claim 19, wherein the fourth substrate comprises a recess in a surface opposing the thin-film heater. 21. A chemical reaction apparatus according to claim 20, wherein one of: the recess is in a substantially vacuum state, and a gas having thermal conductivity lower than a thermal conductivity of the fourth substrate is sealed in the recess. 22. A chemical reaction apparatus comprising: a first substrate including a reaction flow path in which a fluid material containing hydrogen atoms as compositions flows, and a reaction catalyst layer formed in at least a portion of the reaction flow path, a reaction being of the reaction fluid on the reaction catalyst layer being caused in the reaction flow path to produce reaction products including hydrogen gas; a second substrate which includes a combustion flow path formed therein in which combustion fluid flows, the combustion flow path being provided with a combustion catalyst layer that is different from the reaction catalyst layer at least at a portion thereof, a combustion reaction of the combustion fluid on the combustion catalyst layer being caused to heat the fluid in the reaction flow path; and a third substrate which includes a thin-film heater for heating the fluid material flowing in the reaction flow path; wherein the first, second, and third substrates are overlapped with each other with the second substrate being positioned between the first and third substrates; wherein the first substrate includes a first surface and a second surface opposite to the first surface, and the reaction flow path is formed in the first surface of the first substrate; wherein the second substrate includes a first surface and a second surface opposite to the first surface, the first surface of the second substrate is adjacent to the second surface of the first substrate, and the combustion flow path is formed in the second surface of the second substrate; wherein the third substrate includes a first surface and a second surface opposite to the first surface, the first surface of the third substrate is adjacent to the second surface of the second substrate, and the thin film heater is provided on the second surface of the third substrate; and wherein the reaction flow path, combustion flow path, and thin-film heater are arranged to correspond to one another. 23. A chemical reaction apparatus comprising: a first substrate including a reaction flow path in which a fluid material containing hydrogen atoms as compositions flows, and a reaction catalyst layer formed in at least a portion of the reaction flow path, a reaction being of the reaction fluid on the reaction catalyst layer being caused in the reaction flow path to produce reaction products including hydrogen gas; a second substrate which includes a combustion flow path formed therein in which combustion fluid flows, the combustion flow path being provided with a combustion catalyst layer that is different from the reaction catalyst layer at least at a portion thereof, a combustion reaction of the combustion fluid on the combustion catalyst layer being caused to heat the fluid in the reaction flow path; means for supplying a predetermined heat amount to the fluid material flowing in the reaction flow path, said means for supplying the predetermined heat amount comprising a thin heater; and a box member which entirely covers outermost surfaces of the first and second substrates; wherein a space is formed at least in a part of a portion between the box member and the outermost surfaces of the first and second substrates, and the space is substantially in a vacuum state; wherein the first and second substrates are overlapped with each other; wherein the first substrate includes a first surface and a second surface opposite to the first surface, and the reaction flow path is formed in the first surface of the first substrate; and wherein the second substrate includes a first surface and a second surface opposite to the first surface, the first surface of the second substrate is adjacent to the second surface of the first substrate, and the combustion flow path is formed in the second surface of the second substrate.
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