초록 ▼

A method of fabricating an organic film is provided. A non-reactive carrier gas is used to transport an organic vapor. The organic vapor is ejected through a nozzle block onto a cooled substrate, to form a patterned organic film. A device for carrying out the method is also provided. The device inc

A method of fabricating an organic film is provided. A non-reactive carrier gas is used to transport an organic vapor. The organic vapor is ejected through a nozzle block onto a cooled substrate, to form a patterned organic film. A device for carrying out the method is also provided. The device includes a source of organic vapors, a source of carrier gas and a vacuum chamber. A heated nozzle block attached to the source of organic vapors and the source of carrier gas has at least one nozzle adapted to eject carrier gas and organic vapors onto a cooled substrate disposed within the vacuum chamber.

대표청구항 ▼

What is claimed is: 1. A method of depositing an organic film, comprising: a) providing a heated non-reactive carrier gas transporting organic vapor; b) ejecting the heated non-reactive carrier gas transporting an organic vapor through a nozzle block, with a bulk flow velocity at least as great as

What is claimed is: 1. A method of depositing an organic film, comprising: a) providing a heated non-reactive carrier gas transporting organic vapor; b) ejecting the heated non-reactive carrier gas transporting an organic vapor through a nozzle block, with a bulk flow velocity at least as great as the thermal velocity of the molecules, onto a cooled substrate separated from the nozzle block by not more than about 1500 microns, to form a patterned organic film, wherein the method is used to fabricate a patterned organic film without the use of a mask, and wherein the patterned organic film has a resolution of about 1 micron or less. 2. A method of depositing an organic film, comprising: a) providing a heated non-reactive carrier gas transporting an organic vapor; b) ejecting the heated non-reactive carrier gas transporting an organic vapor through a nozzle block, with a bulk flow velocity at least as great as the thermal velocity of the molecules, onto a cooled substrate separated from the nozzle block by not more than about 1500 microns, to form a patterned organic film; wherein the method is used to fabricate a patterned organic film without the use of a mask; wherein the pattern is controlled by the separation between the nozzle block and the substrate, the size of a nozzle in the nozzle block, and the gas velocity; and wherein the distance between the substrate and the nozzle block is less than about 2.5 microns. 3. A method of depositing an organic film, comprising: a) providing a heated non-reactive carrier gas transporting an organic vapor; b) ejecting the heated non-reactive carrier gas transporting an organic vapor through a nozzle block, with a bulk flow velocity at east as great as the thermal velocity of the molecules, onto a cooled substrate separated from the nozzle block by not more than about 20 microns, to form a patterned organic film, wherein the method is used to fabricate a patterned organic film without the use of a mask. 4. A method of depositing an organic film, comprising: a) providing a heated non-reactive carrier gas transporting an organic vapor; b) ejecting the heated non-reactive carrier gas transporting an organic vapor through a nozzle block, with a bulk flow velocity at least as great as the thermal velocity of the molecules, onto a cooled substrate separated from the nozzle block by not more than about 15 microns, to form a patterned organic film. 5. The method of claim 4 wherein the substrate is separated from the nozzle block by not more than about 2.5 microns. 6. A method of depositing an organic film, comprising: a) providing a heated non-reactive carrier gas transporting an organic vapor; b) ejecting the heated non-reactive carrier gas transporting an organic vapor through a nozzle block, with a bulk flow velocity at least as great as the thermal velocity of the molecules, onto a cooled substrate, to form a patterned organic film comprising a plurality of pixels, wherein the patterned organic film is a non-polymeric organic film. 7. A method of depositing an organic film, comprising: a) providing a heated non-reactive carrier gas transporting an organic vapor; b) ejecting the heated non-reactive carrier gas transporting an organic vapor through a nozzle block, with a bulk flow velocity at least as great as the thermal velocity of the molecules, onto a cooled substrate, to form a peed organic film comprising a plurality of pixels, wherein the pixels are arranged in an array. 8. A method of depositing an organic film, comprising: a) providing a heated non-reactive carrier gas transporting an organic vapor; b) ejecting the heated non-reactive carrier gas transporting an organic vapor through a nozzle block, with a bulk flow velocity at least as great as the thermal velocity of the molecules, onto a cooled substrate, to form a patterned organic film comprising a plurality of pixels, wherein the nozzle block comprises a plurality of nozzles, each nozzle to deposit an organic material that emits light of a different color. 9. The method of claim 8, wherein each nozzle is in communication with a separate source cell containing the organic material. 10. A method of depositing an organic film, comprising: a) providing a heated non-reactive carrier gas transporting an organic vapor; b) ejecting the heated non-reactive carrier gas transporting an organic vapor through a nozzle block, with a bulk flow velocity at least as great as the thermal velocity of the molecules, onto a cooled substrate, to form a patterned organic film comprising a plurality of pixels, wherein the nozzle block comprises a plurality of nozzles, each nozzle in communication with a plurality of source cells.