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특허 상세정보

Reactive media, methods of use and assemblies for purifying

국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판) C01B-031/08    C01B-031/00   
미국특허분류(USC) 502/417; 502/184
출원번호 US-0717374 (2000-11-22)
등록번호 US-7465692 (2008-12-16)
발명자 / 주소
출원인 / 주소
대리인 / 주소
    Leydig, Voit & Mayer, Ltd.
인용정보 피인용 횟수 : 1  인용 특허 : 64
초록

A reactive medium comprising reactive particles having a surface area of about 300 m2/gm to about 1500 m2/gm and a size in the range of from about 0.10 mm to about 4 mm. The reactive particles include particles of an inorganic material, including carbon, and active metal sites, including sodium bonded to the carbon. The reactive medium can remove impurities to trace levels and has a high capacity for contaminants.

대표
청구항

The invention claimed is: 1. A reactive medium for the removal of impurities from a fluid comprising a plurality of reactive particles having a surface area of greater than about 900 m2/gm and a size in the range of from about 0.10 mm to about 4 mm and including particles of an inorganic material and active metal sites, the particles or inorganic material including activated carbon and the active metal sites including sodium chemically bonded to the carbon, wherein the sodium is substantially deoxygenated to react with and remove impurities from a fluid...

이 특허에 인용된 특허 (64)

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