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Spot grid array scanning system 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • H01J-003/14
  • H01J-003/00
  • H01J-005/16
  • H01J-005/02
  • H01J-040/14
  • H01J-040/00
출원번호 US-0334963 (2006-01-19)
등록번호 US-7468506 (2008-12-23)
발명자 / 주소
  • Rogers,Steven R.
  • Elmaliach,Nissim
  • Elyasef,Emanuel
  • Litman,Alon
  • Naftali,Ron
출원인 / 주소
  • Applied Materials, Israel, Ltd.
대리인 / 주소
    Fahmi,Tarek N.
인용정보 피인용 횟수 : 28  인용 특허 : 17

초록

A method for scanning a surface, consisting of focusing an array of beams using optics having an axis, so as to irradiate a region of the surface intercepted by the axis, such that each beam irradiates a portion of a respective sub-region within the region. The method further includes moving at leas

대표청구항

We claim: 1. An apparatus for scanning a surface, comprising: a beam generator which generates an array of beams; beam optics having an optical axis, which are adapted to focus the array of beams so as to irradiate a region of the surface intercepted by the optical axis, wherein each beam irradiate

이 특허에 인용된 특허 (17)

  1. Nakasuji Mamoru,JPX, Apparatus and methods for inspecting wafers and masks using multiple charged-particle beams.
  2. Kimba,Toshifumi; Satake,Tohru; Karimata,Tsutomu; Watanabe,Kenji; Noji,Nobuharu; Murakami,Takeshi; Hatakeyama,Masahiro; Nakasuji,Mamoru; Sobukawa,Hirosi; Yoshikawa,Shoji; Oowada,Shin; Saito,Mutsumi, Apparatus for inspection with electron beam, method for operating same, and method for manufacturing semiconductor device using former.
  3. Nakasuji,Mamoru; Satake,Tohru; Noji,Nobuharu; Sobukawa,Hirosi; Karimata,Tsutomu; Yoshikawa,Shoji; Kimba,Toshifumi; Oowada,Shin; Saito,Mutsumi; Hamashima,Muneki; Kohama,Yoshiaki; Okubo,Yukiharu, Electron beam apparatus and device fabrication method using the electron beam apparatus.
  4. Nakasuji, Mamoru; Satake, Tohru; Watanabe, Kenji; Murakami, Takeshi; Noji, Nobuharu; Sobukawa, Hirosi; Karimata, Tsutomu; Yoshikawa, Shoji; Kimba, Toshifumi; Oowada, Shin; Saito, Mutsumi; Hamashima, , Electron beam apparatus and method of manufacturing semiconductor device using the apparatus.
  5. Nakasuji,Mamoru; Noji,Nobuharu; Satake,Tohru; Hatakeyama,Masahiro; Watanabe,Kenji; Kato,Takao; Sobukawa,Hirosi; Karimata,Tsutomu; Yoshikawa,Shoji; Kimba,Toshifumi; Oowada,Shin; Saito,Mutsumi; Hamashi, Electron beam apparatus and method of manufacturing semiconductor device using the apparatus.
  6. Nakasuji,Mamoru; Noji,Nobuharu; Satake,Tohru; Hatakeyama,Masahiro; Watanabe,Kenji; Kato,Takao; Sobukawa,Hirosi; Karimata,Tsutomu; Yoshikawa,Shoji; Kimba,Toshifumi; Oowada,Shin; Saito,Mutsumi; Hamashi, Electron beam apparatus and method of manufacturing semiconductor device using the apparatus.
  7. Nakasuji,Mamoru; Satake,Tohru; Watanabe,Kenji; Murakami,Takeshi; Noji,Nobuharu; Sobukawa,Hirosi; Karimata,Tsutomu; Yoshikawa,Shoji; Kimba,Toshifumi; Oowada,Shin; Saito,Mutsumi; Hamashima,Muneki; Taka, Electron beam apparatus and method of manufacturing semiconductor device using the apparatus.
  8. Muraki Masato,JPX ; Gotoh Susumu,JPX, Electron beam exposure method, and device manufacturing method using same.
  9. Mamoru Nakasuji JP, High-throughput specimen-inspection apparatus and methods utilizing multiple parallel charged particle beams and an array of multiple secondary-electron-detectors.
  10. Nakasuji,Mamoru; Noji,Nobuharu; Satake,Tohru; Kimba,Toshifumi; Sobukawa,Hirosi; Yoshikawa,Shoji; Karimata,Tsutomu; Oowada,Shin; Saito,Mutsumi; Hamashima,Muneki; Takagi,Toru, Inspection system by charged particle beam and method of manufacturing devices using the system.
  11. Benedict, George, Method and apparatus for scanning an optical beam using an optical conduit.
  12. Nakasuji,Mamoru; Noji,Nobuharu; Satake,Tohru; Kimba,Toshifumi; Hatakeyama,Masahiro; Watanabe,Kenji; Sobukawa,Hirosi; Karimata,Tsutomu; Yoshikawa,Shoji; Oowada,Shin; Saito,Mutsumi; Hamashima,Muneki, Method for inspecting substrate, substrate inspecting system and electron beam apparatus.
  13. Yoda,Haruo; Souda,Yasunari; Ohta,Hiroya; Yui,Yoshikiyo; Hashimoto,Shinichi, Multi-electron beam exposure method and apparatus.
  14. Ito, Koji; Kato, Ryota; Hattori, Yutaka, Multibeam scanner.
  15. Knippelmeyer,Rainer; Kienzle,Oliver, Particle-optical systems and arrangements and particle-optical components for such systems and arrangements.
  16. Hayashi Shinichi,JPX, Scanning microscope.
  17. Nagamura, Yoshikazu, Sensitivity adjusting method for pattern inspection apparatus.

이 특허를 인용한 특허 (28)

  1. Zwart, Gerrit Townsend; Cooley, James, Active return system.
  2. Zwart, Gerrit Townsend; Gall, Kenneth P.; Van der Laan, Jan; Rosenthal, Stanley; Busky, Michael; O'Neal, III, Charles D.; Franzen, Ken Yoshiki, Adjusting energy of a particle beam.
  3. Zwart, Gerrit Townsend; Gall, Kenneth P.; Van der Laan, Jan; Rosenthal, Stanley; Busky, Michael; O'Neal, III, Charles D; Franzen, Ken Yoshiki, Adjusting energy of a particle beam.
  4. Stark, James M.; Rosenthal, Stanley J.; Wagner, Miles S.; Ahearn, Michael J., Applying a particle beam to a patient.
  5. Gall, Kenneth; Rosenthal, Stanley; Row, Gordon; Ahearn, Michael, Charged particle radiation therapy.
  6. Jones, Mark R.; Robinson, Mark; Franzen, Ken Yoshiki, Coil positioning system.
  7. Zwart, Gerrit Townsend; Jones, Mark R.; Cooley, James, Collimator and energy degrader.
  8. Gall, Kenneth P.; Rosenthal, Stanley; Sobczynski, Thomas C.; Molzahn, Adam C., Control system for a particle accelerator.
  9. Gall, Kenneth P.; Rosenthal, Stanley; Sobczynski, Thomas C.; Molzahn, Adam C., Control system for a particle accelerator.
  10. Gall, Kenneth P.; Zwart, Gerrit Townsend; Van der Laan, Jan; Molzahn, Adam C.; O'Neal, III, Charles D.; Sobczynski, Thomas C.; Cooley, James, Controlling intensity of a particle beam.
  11. Gall, Kenneth P.; Rosenthal, Stanley J.; Sobczynski, Thomas C.; Molzahn, Adam C.; O'Neal, Charles D.; Cooley, James, Controlling particle therapy.
  12. Gall, Kenneth P.; Rosenthal, Stanley; Sobczynski, Thomas C.; Molzahn, Adam C.; O'Neal, III, Charles D.; Cooley, James, Controlling particle therapy.
  13. Gall, Kenneth P.; Zwart, Gerrit Townsend; Van der Laan, Jan; O'Neal, III, Charles D.; Franzen, Ken Yoshiki, Focusing a particle beam.
  14. Zwart, Gerrit Townsend; Gall, Kenneth P.; Van der Laan, Jan; O'Neal, III, Charles D.; Franzen, Ken Yoshiki, Focusing a particle beam using magnetic field flutter.
  15. Gall, Kenneth P.; Rosenthal, Stanley J.; Row, Gordon D.; Ahearn, Michael J., Inner gantry.
  16. Gall, Kenneth P.; Rosenthal, Stanley; Row, Gordon D.; Ahearn, Michael J., Inner gantry.
  17. Gall, Kenneth; Rosenthal, Stanley; Row, Gordon; Ahearn, Michael, Inner gantry.
  18. Gall, Kenneth P.; Zwart, Gerrit Townsend, Interrupted particle source.
  19. Gall, Kenneth P.; Zwart, Gerrit Townsend; Van Der Laan, Jan; Franzen, Ken Yoshiki, Magnetic field regenerator.
  20. Zwart, Gerrit Townsend; Van der Laan, Jan; Gall, Kenneth P.; Sobczynski, Stanislaw P., Magnetic shims to alter magnetic fields.
  21. O'Neal, III, Charles D.; Molzahn, Adam C.; Vincent, John J., Matching a resonant frequency of a resonant cavity to a frequency of an input voltage.
  22. Yeh, Chang Chun; Chang, Shih-Tsuan, Method and apparatus for charged particle beam inspection.
  23. Yeh, Chang Chun; Chang, Shih-Tsuan, Method and apparatus for charged particle beam inspection.
  24. Zwart, Gerrit Townsend; O'Neal, III, Charles D.; Franzen, Ken Yoshiki, Particle accelerator that produces charged particles having variable energies.
  25. Zwart, Gerrit Townsend; Cooley, James; Franzen, Ken Yoshiki; Jones, Mark R.; Li, Tao; Busky, Michael, Particle beam scanning.
  26. Bouchet, Lionel G.; Rakes, Richard Bruce, Patient positioning system.
  27. Sliski, Alan; Gall, Kenneth, Programmable radio frequency waveform generator for a synchrocyclotron.
  28. O'Neal, III, Charles D.; Molzahn, Adam C., Scanning system for a particle therapy system.
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