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Partial erase verify 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • G11C-007/00
출원번호 US-0335321 (2006-01-19)
등록번호 US-7468926 (2008-12-23)
발명자 / 주소
  • Shappir,Assaf
  • Eisen,Shai
출원인 / 주소
  • Saifun Semiconductors Ltd.
대리인 / 주소
    EMPK & Shiloh, LLP
인용정보 피인용 횟수 : 10  인용 특허 : 490

초록

A method for erasing memory cells in a memory array, the method including applying an erase pulse to bits of a cell ensemble of a memory cell array, and performing an erase verification operation only on a subgroup of the cell ensemble being erased to check if the memory cells threshold voltage (Vt)

대표청구항

What is claimed is: 1. A method for erasing memory cells in a memory array, the method comprising: applying an erase pulse to bits of a cell ensemble of a memory cell array; and designating the entire cell ensemble as erase verified once an erase verification operation on a subgroup of the cell ens

이 특허에 인용된 특허 (490)

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  189. Fuh-Cheng Jong TW; Kent Kuohua Chang TW, Method for forming a nonvolatile memory with optimum bias condition.
  190. Gill Manzur (Saratoga CA) Shacham Etan (Cupertino CA), Method for forming field oxide regions.
  191. Woo Been-Jon (Saratoga CA) Holler Mark A. (Palo Alto CA), Method for improving erase characteristics of buried bit line flash EPROM devices without using sacrificial oxide growth.
  192. Le, Binh Quang; Chen, Pau-Ling, Method for improving read margin in a flash memory device.
  193. Eitan Boaz,ILX, Method for initiating a retrieval procedure in virtual ground arrays.
  194. Pasotti Marco,ITX ; Lhermet Frank,ITX ; Rolandi Pier Luigi,ITX, Method for maintaining the memory content of non-volatile memory cells.
  195. Chang Thomas T. L. (Santa Clara CA) Ho Chun (Cupertino CA) Malhotra Arun K. (Mt. View CA), Method for making electrically programmable memory device by doping the floating gate by implant.
  196. Van Buskirk Michael A. (San Jose CA), Method for measuring VT\s less than zero without applying negative voltages.
  197. Maayan,Eduardo; Eitan,Boaz, Method for operating a memory device.
  198. Shappir, Assaf; Avni, Dror; Eitan, Boaz, Method for operating a memory device.
  199. Huang, Jen-Ren; Chou, Ming-Hung, Method for operating a multi-level memory cell.
  200. Reisinger Hans,DEX, Method for operating a non-volatile memory cell arrangement.
  201. Tung-Cheng Kuo TW, Method for operating non-volatile memory with symmetrical dual-channels.
  202. Maayan, Eduardo; Eliyahu, Ron; Eisen, Shai; Eitan, Boaz, Method for operation of an EEPROM array, including refresh thereof.
  203. Harari Eliyahou (Los Gatos CA) Guterman Daniel C. (Fremont CA) Mehrotra Sanjay (Milpitas CA) Gross Stephen J. (Santa Clara CA), Method for optimum erasing of EEPROM.
  204. Chevallier, Christophe J., Method for performing analog over-program and under-program detection for a multistate memory cell.
  205. Hakozaki Kenji (Tenri JPX) Sato Shin-ichi (Nara JPX), Method for producing a floating gate memory device including implanting ions through an oxidized portion of the silicon.
  206. Willer, Josef; Kakoschke, Ronald, Method for producing metallic bit lines for memory cell arrays, method for producing memory cell arrays and memory cell array.
  207. Kazerounian Reza (Alameda CA) Eitan Boaz (Sunnyvale CA), Method for programming a floating gate memory device.
  208. Maayan, Eduardo; Eliyahu, Ron; Lann, Ameet; Eitan, Boaz, Method for programming a reference cell.
  209. Gregori, Stefano; Micheloni, Rino; Pierin, Andrea; Khouri, Osama; Torelli, Guido, Method for programming nonvolatile memory cells with program and verify algorithm using a staircase voltage with varying step amplitude.
  210. Cohen Zeev,ILX ; Eitan Boaz,ILX ; Maayan Eduardo,ILX, Method for programming of a semiconductor memory cell.
  211. Beatty Timothy S., Method for protecting a transistor gate from charge damage.
  212. Derhacobian Narbeh ; Fang Hao, Method for reducing program disturb during self-boosting in a NAND flash memory.
  213. Eitan, Boaz; Maayan, Eduardo, Method for reducing voltage drops in symmetric array architectures.
  214. Sali Mauro,ITX ; Dallabora Marco,ITX ; Carrera Marcello,ITX, Method for setting the threshold voltage of a reference memory cell.
  215. Li Xiao-Yu ; Mehta Sunil D., Method for sorting semiconductor devices having a plurality of non-volatile memory cells.
  216. Estakhri Petro ; Assar Mahmud ; Reid Robert Alan ; Iman Berhanu, Method of and architecture for controlling system data with automatic wear leveling in a semiconductor non-volatile mas.
  217. Chang Yao Wen,TWX ; Tsai Wen Jer,TWX ; Lu Tao Cheng,TWX, Method of controlling multi-state NROM.
  218. Sugiyama Toshinobu (Kanagawa JPX) Sakurai Hiroshi (Kanagawa JPX), Method of determining conditions for plasma silicon nitride film growth and method of manufacturing semiconductor device.
  219. Derhacobian Narbeth ; Van Buskirk Michael ; Sobeck Daniel ; Wang Janet S. Y. ; Chang Chi, Method of erasing non-volatile memory cells.
  220. Ranaweera Jeewika Chandanie,CAX ; Kalastirsky Ivan ; Gulersen Elvira,CAX ; Ng Wai Tung,CAX ; Salama Clement Andre T.,CAX, Method of fabricating a fast programmable flash E.sup.2 PROM cell.
  221. Sakurai Yasuhiro (Saitama JPX) Kishi Toshiyuki (Saitama JPX), Method of fabricating a semiconductor nonvolatile storage device.
  222. Sun, Yu; Van Buskirk, Michael A.; Ramsbey, Mark T., Method of fabricating double densed core gates in sonos flash memory.
  223. Mehta Sunil D., Method of forming a non-volatile memory device.
  224. Derhacobian Narbeh ; Hollmer Shane C. ; Sunkavalli Ravi S., Method of maintaining constant erasing speeds for non-volatile memory cells.
  225. Hsu Chen-Chung,TWX, Method of making ROM components.
  226. McElroy David J. (Houston TX), Method of making a high density floating gate electrically programmable ROM.
  227. Shrivastava Ritu (Fremont CA), Method of making flash EPROM cell having improved erase characteristics by using a tilt angle implant.
  228. McElroy David J. (Houston TX), Method of making high density semiconductor device such as floating gate electrically programmable ROM or the like.
  229. Ghneim Said N. ; Fulford ; Jr. H. Jim, Method of making non-volatile memory device having a floating gate with enhanced charge retention.
  230. Komori Kazuhiro (Kodaira JPX) Kuroda Kenichi (Tachikawa NY JPX) Sugiura June (Troy NY), Method of making semiconductor device with memory cells and peripheral transistors.
  231. Jacobs Erwin (Vaterstetten DEX) Schwabe Ulrich (Munich DEX) Takacs Dezso (Munich DEX), Method of making very short channel length MNOS and MOS devices by double implantation of one conductivity type subseque.
  232. Hashimoto, Hiroshi; Takahashi, Koji, Method of manufacturing a semiconductor memory device with a buried bit line.
  233. Lee Roger R. (Boise ID), Method of processing a semiconductor wafer to form an array of nonvolatile memory devices employing floating gate transi.
  234. Hayabuchi Itsunari (Chiba JPX), Method of producing semiconductor devices of a MONOS type.
  235. Wang, Janet S. Y.; Derhacobian, Narbeh, Method of programming a non-volatile memory cell using a baking process.
  236. Richard M. Fastow, Method of programming a non-volatile memory cell using a substrate bias.
  237. Chang, Seung Ho, Method of programming/reading multi-level flash memory using sensing circuit.
  238. Iijima, Mitsuteru, Method of read operation of nonvolatile semiconductor memory and nonvolatile semiconductor memory.
  239. Andrei Mihnea ; Jeffrey Kessenich ; Chun Chen, Method of reducing trapped holes induced by erase operations in the tunnel oxide of flash memory cells.
  240. Takeshima Toshio,JPX, Method of restoring data in non-volatile semiconductor memory.
  241. Tomioka Yugo (Sagamihara JPX) Iwasa Shoichi (Sagamihara JPX) Sato Yasuo (Sagamihara JPX) Wada Toshio (Sagamihara JPX) Anzai Kenji (Sagamihara JPX), Method of writing into non-volatile semiconductor memory.
  242. Efraim Aloni IL; Shai Kfir IL; Menchem Vofsy IL; Avi Ben-Guigui IL, Methods for fabricating a semiconductor chip having CMOS devices and a fieldless array.
  243. Kosonocky George A. (Placerville CA) Winston Mark D. (El Dorado Hills CA), Microprocessor system including first and second nonvolatile memory arrays which may be simultaneously read and reprogra.
  244. Koike Hideharu (Yokohama JPX), Multi-bit-per-cell read only memory circuit.
  245. Lu Tao Cheng,TWX ; Shyu Der Shin,TWX ; Chen Shi Xian,TWX ; Tsai Wen Jer,TWX ; Wang Mam Tsung,TWX, Multi-level memory cell device and method for self-converged programming.
  246. Ohta Yoshiji (Ikoma JPX), Multi-level memory cell with increased read-out margin.
  247. Liang Mong-Song,TWX ; Kuo Di-Son,TWX ; Hsu Ching-Hsiang,TWX ; Lin Ruei-Ling,TWX, Multi-level, split-gate, flash memory cell.
  248. Wen Jemmy,TWX, Multi-stage ROM structure and method for fabricating the same.
  249. Mehrotra Sanjay (Milpitas CA) Harari Eliyahou (Los Gatos CA) Lee Winston (San Francisco CA), Multi-state EEprom read and write circuits and techniques.
  250. Guterman Daniel C. ; Fong Yupin Kawing, Multi-state memory.
  251. Schmitt-Landsiedel Doris,DEX ; Thewes Roland,DEX ; Bollu Michael,DEX ; von Basse Paul-Werner,DEX, Multi-value read-only memory cell having an improved signal-to-noise ratio.
  252. Akaogi Takao ; Cleveland Lee Edward ; Nguyen Kendra, Multiple bank simultaneous operation for a flash memory.
  253. Bill Colin S. ; Haddad Sameer S., Multiple bits per-cell flash EEPROM capable of concurrently programming and verifying memory cells and reference cells.
  254. Earl Jeffrey S., Multiple input/output level interface input receiver.
  255. Maayan, Eduardo; Eitan, Boaz, Multiple use memory chip.
  256. Kawamura, Shoichi, Multiple-bit non-volatile memory utilizing non-conductive charge trapping gate.
  257. Yoshikawa Sadao,JPX, Multistate memory device with reference bit lines.
  258. Ghilardelli Andrea,ITX ; Mulatti Jacopo,ITX ; Branchetti Maurizio,ITX, NMOS negative charge pump.
  259. Maayan, Eduardo; Eitan, Boaz, NROM NOR array.
  260. Boaz Eitan IL, NROM cell with generally decoupled primary and secondary injection.
  261. Eitan Boaz,ILX, NROM cell with improved programming, erasing and cycling.
  262. Boaz Eitan IL, NROM cell with self-aligned programming and erasure areas.
  263. Eitan, Boaz, NROM cell with self-aligned programming and erasure areas.
  264. Boaz Eitan,ILX, NROM fabrication method.
  265. Eitan Boaz,ILX, NROM fabrication method with a periphery portion.
  266. Schumann Steven J. (Sunnyvale CA) Hu James C. (Saratoga CA), Narrow width EEPROM with single diffusion electrode formation.
  267. Hamilton Darlene G. ; Derhacobian Narbeh ; Tanpairoj Kulachet ; Sunkavalli Ravi, Negative gate erase.
  268. Eshel, Noam, Neighbor effect cancellation in memory array architecture.
  269. Yider Wu ; Jean Yee-Mei Yang ; Mark Ramsbey ; Emmanuel H. Lingunis ; Yu Sun, Nitride barrier layer for protection of ONO structure from top oxide loss in a fabrication of SONOS flash memory.
  270. Wu, Yider; Yang, Jean Yee-Mei; Ramsbey, Mark; Lingunis, Emmanuel H.; Sun, Yu, Nitride barrier layer for protection of ONO structure from top oxide loss in fabrication of SONOS flash memory.
  271. Eitan, Boaz, Non-volatile electrically erasable and programmable semiconductor memory cell utilizing asymmetrical charge trapping.
  272. Eitan, Boaz, Non-volatile electrically erasable and programmable semiconductor memory cell utilizing asymmetrical charge trapping.
  273. Bass ; Jr. Roy S. (Underhill VT) Bhattacharyya Arup (Essex Junction VT) Grise Gary D. (Colchester VT), Non-volatile memory cell having Si rich silicon nitride charge trapping layer.
  274. Aozasa Hiroshi,JPX ; Hayashi Yutaka,JPX, Non-volatile memory cell having dual gate electrodes.
  275. Kawamura Tadashi (Tenri JPX) Kimura Naofumi (Nara JPX) Yamamoto Yoshitaka (Yamatokoriyama JPX) Ishii Yutaka (Nara JPX), Non-volatile memory device and a method for producing the same.
  276. Kim, Jongoh, Non-volatile memory transistor array implementing “H” shaped source/drain regions and method for fabricating same.
  277. Gongwer, Geoffrey; Guterman, Daniel C., Non-volatile memory with improved programming and method therefor.
  278. Cernea Raul-Adrian ; Tang Rushyah ; Lee Douglas ; Wang Chi-Ming ; Guterman Daniel, Non-volatile memory with improved sensing and method therefor.
  279. Christie Kenneth Howard (Hopewell Junction NY) DeWitt David (Los Gatos CA) Johnson William Stanford (Hopewell Junction NY), Non-volatile metal nitride oxide semiconductor device.
  280. Mirabel Jean-Michel (Gardanne FRX), Non-volatile programmable bistable multivibrator in predefined initial state for memory redundancy circuit.
  281. Mirabel Jean-Michel (Gardanne FRX), Non-volatile programmable bistable multivibrator, programmable by the source, for memory redundancy circuit.
  282. Mitchell Allan T. (Garland TX) Riemenschneider Bert R. (Murphy TX), Non-volatile semiconductor memory.
  283. Fukumoto Katsumi,JPX, Non-volatile semiconductor memory allowing user to enter various refresh commands.
  284. Torii, Satoshi, Non-volatile semiconductor memory and its driving method.
  285. Kajitani Masanori,JPX, Non-volatile semiconductor memory apparatus.
  286. Wada Toshio (Tokyo JPX) Anzai Kenji (Tokyo JPX) Iwasa Shoichi (Tokyo JPX) Sato Yasuo (Tokyo JPX) Egawa Yuichi (Tokyo JPX), Non-volatile semiconductor memory cell capable of storing more than two different data and method of using the same.
  287. Eitan Boaz,ILX, Non-volatile semiconductor memory cell utilizing asymmetrical charge trapping.
  288. Ohya Shuichi (Tokyo JA) Kikuchi Masanori (Tokyo JA), Non-volatile semiconductor memory device.
  289. Takano, Yoshinori; Taura, Tadayuki; Tanzawa, Toru, Non-volatile semiconductor memory device.
  290. Tsuruta Masataka (Kyoto JPX) Shimoji Noriyuki (Kyoto JPX) Nakao Hironobu (Kyoto JPX) Ozawa Takanori (Kyoto JPX), Non-volatile semiconductor memory device and memory circuit using the same.
  291. Sawada Kikuzo (Tokyo JPX) Wada Toshio (Tokyo JPX), Non-volatile semiconductor memory device capable of storing multi-value data in each memory cell.
  292. Sawada Kikuzo (Tokyo JPX) Sugawara Yoshikazu (Tokyo JPX), Non-volatile semiconductor memory device detachable deterioration of memory cells.
  293. Torii, Satoshi; Kojima, Hideyuki; Mawatari, Hiroshi, Non-volatile semiconductor memory device having a charge storing insulation film and data holding method therefor.
  294. Sawada Kikuzo (Tokyo JPX) Wada Toshio (Tokyo JPX) Sugawara Yoshikazu (Tokyo JPX), Non-volatile semiconductor memory device having memory cells, each for at least three different data writable thereinto.
  295. Kato, Hiroshi, Non-volatile semiconductor memory device of which bit line withstand voltage can be increased.
  296. Kohda Kenji (Hyogo JPX) Toyama Tsuyoshi (Hyogo JPX) Ando Nobuaki (Hyogo JPX) Noguchi Kenji (Hyogo JPX) Kobayashi Shinichi (Hyogo JPX), Non-volatile semiconductor memory device with facility of storing tri-level data.
  297. Bate Robert T. (Garland TX), Non-volatile semiconductor memory elements.
  298. Tsuruta Masataka (Kyoto JPX), Non-volatile semiconductor memory with outer drain diffusion layer.
  299. Uekubo Masaki,JPX, Non-volatile semiconductor storage device having improved program/erase/over erase verify.
  300. Eitan Boaz (Sunnyvale CA) Kazerounian Reza (Fremont CA), Nonvolatile floating gate transistor structure.
  301. Fratin Lorenzo,ITX ; Ravazzi Leonardo,ITX ; Riva Carlo,ITX, Nonvolatile memory cell and a method for forming the same.
  302. Wang Hsingya A. (Saratoga CA) Hsu James J. (Saratoga CA), Nonvolatile memory cell formed using self aligned source implant.
  303. Wang Hsingya Arthur (Saratoga CA) Hsu James Juen (Saratoga CA), Nonvolatile memory cell formed using self aligned source implant.
  304. Kawamura, Shoichi, Nonvolatile memory circuit for recording multiple bit information.
  305. Takeuchi Nobuyoshi,JPX, Nonvolatile memory device with verify function.
  306. Shimoji Noriyuki (Kyoto JPX), Nonvolatile semiconductor device having charge trap film containing silicon crystal grains.
  307. Akaogi Takao (Kawasaki JPX) Yoshida Masanobu (Kawasaki JPX) Ogawa Yasushige (Kasugai JPX) Kasa Yasushi (Kawasaki JPX) Kawamura Shouichi (Kawasaki JPX), Nonvolatile semiconductor memory.
  308. Sakui Koji,JPX ; Miyamoto Junichi,JPX, Nonvolatile semiconductor memory.
  309. Yasushi Kasa JP; Kazunari Kido JP, Nonvolatile semiconductor memory.
  310. Hemink Gertjan,JPX ; Tanaka Tomoharu,JPX, Nonvolatile semiconductor memory device.
  311. Hemink Gertjan,JPX ; Tanaka Tomoharu,JPX, Nonvolatile semiconductor memory device.
  312. Iwahashi Hiroshi (Yokohama JPX), Nonvolatile semiconductor memory device.
  313. Seki Koichi,JPX ; Wada Takeshi,JPX ; Muto Tadashi,JPX ; Shoji Kazuyoshi,JPX ; Kubota Yasurou,JPX ; Kume Hitoshi,JPX, Nonvolatile semiconductor memory device.
  314. Takei Akira (Yokohama JPX) Hika Yoshihiko (Yokohama JPX) Miida Takashi (Tokyo JPX), Nonvolatile semiconductor memory device.
  315. Takeuchi Ken,JPX ; Tanaka Tomoharu,JPX, Nonvolatile semiconductor memory device.
  316. Takeuchi Ken,JPX ; Tanaka Tomoharu,JPX, Nonvolatile semiconductor memory device.
  317. Yamada, Shigekazu, Nonvolatile semiconductor memory device.
  318. Kouno,Kazuyuki, Nonvolatile semiconductor memory device and method for providing security for the same.
  319. Ohba Atsushi,JPX ; Shimizu Satoshi,JPX ; Miyawaki Yoshikazu,JPX, Nonvolatile semiconductor memory device and method of erasing data of nonvolatile semiconductor memory device.
  320. Fujiwara Ichiro,JPX ; Hayashi Yutaka,JPX, Nonvolatile semiconductor memory device and writing and erasing method of the same.
  321. Masaaki Mihara JP; Yoshikazu Miyawaki JP; Shinji Kawai JP, Nonvolatile semiconductor memory device capable of high speed generation of rewrite voltage.
  322. Takahashi, Satoshi; Yamashita, Minoru, Nonvolatile semiconductor memory device programming second dynamic reference cell according to threshold value of first dynamic reference cell.
  323. Iioka, Osamu; Emi, Naoto; Shoji, Atsushi; Mawatari, Hiroshi, Nonvolatile semiconductor memory device with mechanism to prevent leak current.
  324. Naruke Kiyomi (Kanagawa JPX), Nonvolatile semiconductor memory system with a plurality of erase blocks.
  325. Kaoru Yamamoto JP; Nobuhiko Ito JP; Yoshimitsu Yamauchi JP, Nonvolatile semiconductor storage device.
  326. Bettman Roger, Optimized programming/erase parameters for programmable devices.
  327. Partovi Hamid (Westborough MA) Van Buskirk Michael A. (San Jose CA), Output buffer arrangement for reducing chip noise without speed penalty.
  328. Davis Jeffrey B. (Raymond ME), Output buffer for reducing switching induced noise.
  329. Yin, Ming, Output buffer with compensated slew rate and delay control.
  330. Confaloneri, Pierangelo; Nagari, Angelo; Nicollini, Germano, Output buffer with constant switching current.
  331. Liu, Zhizheng; He, Yi; Randolph, Mark W., Overerase correction method.
  332. Gitlin Daniel ; Li Sheau-Suey ; Voogel Martin L. ; Zhao Tiemin, Pass gate circuit with body bias control.
  333. Ormerod William ; Tipton Robert R., Piezo-electric actuator operable in an electrolytic fluid.
  334. Ramsbey, Mark T.; Yang, Jean Y.; Shiraiwa, Hidehiko; Van Buskirk, Michael A.; Rogers, David M.; Sunkavalli, Ravi S.; Wang, Janet S.; Derhacobian, Narbeh, Planar structure for non-volatile memory devices.
  335. Ghilardelli Andrea,ITX ; Mulatti Jacopo,ITX ; Ghezzi Stefano,ITX, Positive charge pump.
  336. You Jyh-Cheng,TWX ; Chen Pei-Hung,TWX ; Yu Shau-Tsung,TWX ; Chu Yi-Jing,TWX, Post metal code engineering for a ROM.
  337. Kinoshita Masayoshi,JPX ; Sakiyama Shiro,JPX ; Kajiwara Jun,JPX ; Satomi Katsuji,JPX ; Yamamoto Hiroo,JPX ; Ootani Katsuhiro,JPX, Power circuit including inrush current limiter, and integrated circuit including the power circuit.
  338. McClintock Cameron (Mountain View CA), Power-on reset circuit with hysteresis.
  339. Yang Andrew ; Hollmer Shane ; Le Binh Q., Precharging mechanism and method for NAND-based flash memory devices.
  340. Khan Sakhawat M. ; Korsh George J., Precision programming of nonvolatile memory cells.
  341. Stephen K. Park ; George Jon Kluth ; Bharath Rangarajan, Process for creating a flash memory cell using a photoresist flow operation.
  342. Wang Hsingya A. (San Jose CA), Process for fabricating a control gate for a floating gate FET.
  343. Komori, Hideki; Foote, David K.; Wang, Fei; Rangarajan, Bharath, Process for fabricating a non-volatile memory device.
  344. Rangarajan, Bharath; Foote, David; Wang, Fei; Park, Steven K., Process for fabricating a non-volatile memory device.
  345. Dawn M. Hopper ; David K. Foote ; Bharath Rangarajan, Process for fabricating an ONO structure.
  346. Holler Mark A. (Palo Alto CA) Tam Simon M. (San Mateo CA), Process for fabricating electrically alterable floating gate memory devices.
  347. Bharath Rangarajan ; David K. Foote ; Fei Wang ; Dawn M. Hopper ; Stephen K. Park ; Jack Thomas ; Mark Chang ; Mark Ramsbey, Process for fabricating high density memory cells using a polysilicon hard mask.
  348. Foote David K. ; Rangarajan Bharath ; Wang Fei ; Park Steven K., Process for forming a bit-line in a MONOS device.
  349. George Jonathan Kluth ; Stephen K. Park ; Arvind Halliyal ; David K. Foote, Process for optimizing pocket implant profile by RTA implant annealing for a non-volatile semiconductor device.
  350. Schwabe Ulrich (Vaterstetten DEX) Jacobs Erwin (Munich DEX), Process for producing an integrated multi-layer insulator memory cell.
  351. Yang Ming-Tzong (Hsin-chu TWX) Huang Cheng-Han (Hsin-chu TWX) Hsue Chen-Chiu (Hsin-chu TWX), Process for producing memory devices having narrow buried N+lines.
  352. Eitan Boaz,ILX, Process for producing two bit ROM cell utilizing angled implant.
  353. Jacobs Erwin (Vaterstetten DEX) Schwabe Ulrich (Munich DEX), Process for production of integrated MOS circuits with and without MNOS memory transistors in silicon-gate technology.
  354. Timothy J. Thurgate, Process for reduction of capacitance of a bitline for a non-volatile memory cell.
  355. En William George, Process induced charging damage control device.
  356. Kodama Noriaki (Tokyo JPX), Process of fabricating floating gate type field effect transistor having drain region gently varied in impurity profile.
  357. Kuo Tiao Hua (San Jose CA) Chang Chung K. (Santa Clara CA) Chen Johnny (Cupertino CA) Yu James C. Y. (San Jose CA), Program algorithm for low voltage single power supply flash memories.
  358. Nachumovsky Ishai,ILX, Program/erase endurance of EEPROM memory cells.
  359. Nachumovsky Ishai,ILX, Programmable configuration for EEPROMS including 2-bit non-volatile memory cell arrays.
  360. Watanabe Takeshi (Tokyo JPX), Programmable read only memory operable with reduced programming power consumption.
  361. Artieri Alain, Programmed memory with improved speed and power consumption.
  362. Hollmer Shane C. ; Cleveland Lee E., Programmed reference.
  363. Avni, Dror; Eitan, Boaz, Programming and erasing methods for a non-volatile memory cell.
  364. Ilan Bloom IL; Eduardo Maayan IL; Boaz Eitan IL, Programming and erasing methods for a reference cell of an NROM array.
  365. Fazio Albert (Los Gatos CA) Atwood Gregory E. (San Jose CA) Mi James Q. (Sunnyvale CA) Ruby Paul (Folsom CA), Programming flash memory using strict ordering of states.
  366. Ilan Bloom IL; Boaz Eitan IL; Zeev Cohen IL; David Finzi IL; Eduardo Maayan IL, Programming of nonvolatile memory cells.
  367. Chen Teh-Yi J. (Cupertino CA), Protected programmable transistor with reduced parasitic capacitances and method of fabrication.
  368. Evertt Jeff ; Tedrow Kerry, Pump supply self regulation for flash memory cell pair reference circuit.
  369. Ghandehari, Kouros; Lingunis, Emmanuil H.; Chang, Mark S.; Hui, Angela; Bell, Scott; Ogura, Jusuke, RELACS shrink method applied for single print resist mask for LDD or buried bitline implants using chemically amplified DUV type photoresist.
  370. Chang Kent Kuohua ; Chi David, RTCVD oxide and N.sub.2 O anneal for top oxide of ONO film.
  371. Uramoto Shinichi (Hyogo JPX) Matsumura Tetsuya (Hyogo JPX) Yoshimoto Masahiko (Hyogo JPX) Ishihara Kazuya (Hyogo JPX) Segawa Hiroshi (Hyogo JPX), Read only memory for storing multi-data.
  372. Kobatake Hiroyuki (Tokyo JPX), Read only semiconductor memory having multiple bit cells.
  373. Krautschneider Wolfgang,DEX ; Risch Lothar,DEX ; Hofmann Franz,DEX ; Rosner Wolfgang,DEX, Read-only-memory cell arrangement using vertical MOS transistors and gate dielectrics of different thicknesses and metho.
  374. Marco Pasotti IT; Giovanni Guaitini IT; Pier Luigi Rolandi IT; Guido De Sandre IT, Reading circuit for a non-volatile memory.
  375. Golla Carla M. (Sesto San Giovanni ITX) Olivo Marco (Bergamo ITX) Padoan Silvia (Rimini ITX), Reading circuit for an integrated semiconductor memory device.
  376. Liron Eran, Redundancy method and structure for 2-bit non-volatile memory cells.
  377. Matsuda Atsushi,JPX ; Tanaka Hirokazu,JPX ; Gotoh Kunihiko,JPX, Regulator circuit and semiconductor integrated circuit device having the same.
  378. Ikeda Shuji,JPX ; Meguro Satoshi,JPX ; Hashiba Soichiro,JPX ; Kuramoto Isamu,JPX ; Koike Atsuyoshi,JPX ; Sasaki Katsuro,JPX ; Ishibashi Koichiro,JPX ; Yamanaka Toshiaki,JPX ; Hashimoto Naotaka,JPX ; , SRAM having load transistor formed above driver transistor.
  379. Ramsbey, Mark T.; Sun, Yu; Chang, Chi, Salicided gate for virtual ground arrays.
  380. Ramsbey, Mark T.; Sun, Yu; Chang, Chi, Salicided gate for virtual ground arrays.
  381. Harari Eliyahou (Los Gatos CA) Mehrotra Sanjay (Milpitas CA), Segmented column memory array.
  382. Chi-Yung Wu,TWX ; Chen Ling ; Peng Tony,TWX, Select gate enhanced high density read-only-memory device.
  383. Jian Chen, Selective operation of a multi-state non-volatile memory system in a binary mode.
  384. Ma Yueh Y. (Los Altos CA) Chang Kuo-Tung (San Jose CA), Self-aligned dual-bit split gate (DSG) flash EEPROM cell.
  385. Chu Sam S. D. (San Jose CA) Ho Calvin V. (Berkeley CA), Self-recovering erase scheme to enhance flash memory endurance.
  386. Tickle Andrew C. (Los Altos CA), Self-refreshing memory cell.
  387. Arase Kenshiro,JPX, Semiconductor NAND type flash memory with incremental step pulse programming.
  388. Franciscus Petrus Widdershoven NL; Jurriaan Schmitz NL, Semiconductor device.
  389. Noguchi Mitsuhiro,JPX ; Oowaki Yukihito,JPX, Semiconductor device.
  390. Aoki Hitoshi (Nara JPX), Semiconductor device ROM having an offset region.
  391. Aoki Hitoshi,JPX, Semiconductor device having first transistor rows with second transistor rows connected therebetween.
  392. Nakao Hironobu (Kyoto JPX), Semiconductor device including nonvolatile memories.
  393. Komori Kazuhiro (Kodaira JPX) Kuroda Kenichi (Tachikawa NY JPX) Sugiura June (Troy NY), Semiconductor device of an LDD structure having a floating gate.
  394. Lee Roger R. (Boise ID), Semiconductor floating gate device having improved channel-floating gate interaction.
  395. Yoneda Masato (Tokyo JPX), Semiconductor integrated circuit.
  396. Nomura Yukihiro (Kawasaki JPX) Ito Shigemasa (Kasugai JPX), Semiconductor integrated circuit device having built-in step-down circuit for stepping down external power supply voltag.
  397. Yamagata Tadato,JPX ; Arimoto Kazutami,JPX ; Tsukude Masaki,JPX, Semiconductor integrated circuit device having hierarchical power source arrangement.
  398. Atsumi Shigeru,JPX ; Taura Tadayuki,JPX, Semiconductor integrated circuit device with a constant current source.
  399. Shimizu Shinji (Houya JPX) Komori Kazuhiro (Kodaira JPX) Kosa Yasunobu (Kodaira JPX) Sugiura June (Musashino JPX), Semiconductor integrated circuit device with memory MISFETS and thin and thick gate insulator MISFETS.
  400. Tanaka Hitoshi,JPX ; Aoki Masakazu,JPX ; Itoh Kiyoo,JPX, Semiconductor integrated circuit including voltage converter effective at low operational voltages.
  401. Taguchi Masao (Kawasaki JPX) Eto Satoshi (Kawasaki JPX) Takemae Yoshihiro (Kawasaki JPX) Yoshioka Hiroshi (Kawasaki JPX) Koga Makoto (Kawasaki JPX), Semiconductor integrated circuit with input/output interface adapted for small-amplitude operation.
  402. Tanoi Satoru (Tokyo JPX), Semiconductor integrated circuit with low-noise output buffers.
  403. Kawahara Takayuki,JPX ; Sato Hiroshi,JPX ; Nozoe Atsushi,JPX ; Yoshida Keiichi,JPX ; Noda Satoshi,JPX ; Kubono Shoji,JPX ; Kotani Hiroaki,JPX ; Kimura Katsutaka,JPX, Semiconductor integrated circuit with multiple write operation modes.
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  2. He, Deping, Erase operations with erase-verify voltages based on where in the erase operations an erase cycle occurs.
  3. Dutta, Deepanshu; Lee, Shih-Chung, Erase verify in non-volatile memory.
  4. Kanamori, Yuki; Miyake, Yusuke, Memory system.
  5. Twitto, Moshe; Kong, Jun-Jin, Methods of driving a memory.
  6. Kim, Tae-Young; Lim, Young Ho, Nonvolatile memory device, operating method thereof and memory system including the same.
  7. Dutta, Deepanshu; Oowada, Ken; Nishimura, Koichi; Dong, Yingda, Optimized erase operation for non-volatile memory with partially programmed block.
  8. Dutta, Deepanshu; Lai, Chun-Hung; Lee, Shih-Chung; Oowada, Ken; Higashitani, Masaaki, Partitioned erase and erase verification in non-volatile memory.
  9. Lai, Chun-Hung; Lee, Shih-Chung, Reduced current program verify in non-volatile memory.
  10. Sun, Yongke; Dong, Yingda, Reduced erase-verify voltage for first-programmed word line in a memory device.
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