초록 ▼

The present invention is a novel cleaning method and a solution for use in a single wafer cleaning process. According to the present invention the cleaning solution comprises ammonium hydroxide (NH4OH), hydrogen peroxide (H2O2), water (H2O) and a chelating agent. In an embodiment of the present inve

The present invention is a novel cleaning method and a solution for use in a single wafer cleaning process. According to the present invention the cleaning solution comprises ammonium hydroxide (NH4OH), hydrogen peroxide (H2O2), water (H2O) and a chelating agent. In an embodiment of the present invention the cleaning solution also contains a surfactant. And still yet another embodiment of the present invention the cleaning solution also comprises a dissolved gas such as H2. In a particular embodiment of the present invention, this solution is used by spraying or dispensing it on a spinning wafer.

대표청구항 ▼

We claim: 1. A method of preparing a rinse solution comprising: using a stacked membrane consisting essentially of a solid membrane on top of a porous membrane; passing H2O along said porous membrane; and passing CO2 gas along said solid membrane; and diffusing said CO2 gas through said solid membr

We claim: 1. A method of preparing a rinse solution comprising: using a stacked membrane consisting essentially of a solid membrane on top of a porous membrane; passing H2O along said porous membrane; and passing CO2 gas along said solid membrane; and diffusing said CO2 gas through said solid membrane and dissolving said CO2 gas into said H2O. 2. The method of claim 1 wherein said CO2 gas contains residual byproduct organic impurities from conversion of petroleum to said CO2 gas, and said diffusing CO2 gas further comprises diffusing said CO2 gas minus said organic impurities through said solid membrane. 3. The method of claim 1 further comprising diffusing said CO2 gas through said solid membrane and dissolving said CO2 gas into said H2O until said rinse solution has a resistivity less than 5 megaohm.cm. 4. The method of claim 1 further comprising, passing said H2O through a multiplicity of conduits formed between a multiplicity of said stacked membranes arranged in parallel. 5. The method of claim 4, wherein said H2O passes along said porous membranes of said multiplicity of stacked membranes. 6. A method of preparing a rinse solution comprising: using a first stacked membrane comprising a first solid membrane in contact with a first porous membrane to prepare a rinse solution, wherein said preparation comprises: passing H2O along said first porous membrane; passing CO2 gas along said first solid membrane; and diffusing said CO2 gas through said first solid membrane and dissolving said CO2 gas into said H2O until said rinse solution has a resistivity less than 5 megaohm.cm. 7. The method of claim 6 wherein said CO2 gas contains residual byproduct organic impurities from conversion of petroleum to said CO2 gas, and said diffusing CO2 gas further comprises diffusing said CO2 gas minus said residual byproduct organic impurities through said first solid membrane. 8. The method of claim 6 wherein the first stacked membrane consists essentially of a first solid membrane in contact with a first porous membrane.