초록 ▼

A method of chemical vapor infiltration and deposition includes stacking a number of porous structures in a stack in a furnace. The stack has a center opening region extending through the porous structures and an outer region extending along the porous structures. A first portion of a reactant gas

A method of chemical vapor infiltration and deposition includes stacking a number of porous structures in a stack in a furnace. The stack has a center opening region extending through the porous structures and an outer region extending along the porous structures. A first portion of a reactant gas is introduced to the center opening region. A second portion of the reactant gas is introduced to the outer region. The first portion and the second portion are controlled proportions thereby introducing predetermined portions of the reactant gas to both the center opening region and the outer region. The change in weight of the entire furnace, including contents, is measured during the chemical vapor infiltration and deposition process. The rate of weight change is monitored.

대표청구항 ▼

What is claimed is: 1. A method of chemical vapor infiltration and deposition, comprising stacking a number of porous structures in a stack in a furnace, wherein the stack has a center opening region extending through the porous structures and an outer region extending along the porous structures;

What is claimed is: 1. A method of chemical vapor infiltration and deposition, comprising stacking a number of porous structures in a stack in a furnace, wherein the stack has a center opening region extending through the porous structures and an outer region extending along the porous structures; introducing a first portion of a reactant gas to the center opening region; introducing a second portion of the reactant gas to the outer region, wherein the first portion and the second portion are controlled proportions thereby introducing predetermined portions of the reactant gas to both the center opening region and the outer region; measuring the change in weight of the entire furnace, including contents, during the chemical vapor infiltration and deposition process; and monitoring the rate of weight change. 2. The method of claim 1 further comprising monitoring the furnace temperature and changing the furnace temperature to achieve a desired weight gain. 3. The method of claim 2 wherein the furnace temperature is between about 1,700°F. to 1,950° F. 4. The method of claim 1 further comprising monitoring the reactant gas flow into the furnace and changing the reactant gas flow to achieve a desired weight gain. 5. The method of claim 1 further comprising monitoring the internal furnace pressure and changing the internal furnace pressure to achieve a desired weight gain. 6. The method of claim 5 wherein the internal furnace pressure is between about 1 torr and 25 torr. 7. The method of claim 1 further comprising monitoring the reactivity of the reactant gas and changing the reactant gas flow to achieve a desired weight gain. 8. The method of claim 7, wherein the reactant gas is a mixture of hydrocarbon gases with between about 80% to 100% natural gas and between about 20% to 0% propane. 9. The method of claim 1, wherein the first portion is between about 15% to 80% of the reactant gas and the second portion is between about 85% to 20% of the reactant gas. 10. The method of claim 1, wherein the first portion is between about 15% to 35% of the reactant gas and the second portion is between about 85% to 65% of the reactant gas. 11. The method of claim 1, further comprising heating the reactant gas to a temperature between about 1,700° F. to 1,950° F., depressurizing the reactant gas to a pressure between about 1 torr and 25 torr, and maintaining the temperature and the pressure between about 150 hours to 500 hours. 12. The method of claim 1, wherein the reactant gas is a mixture of hydrocarbon gases with between about 80% to 100% natural gas and between about 20% to 0% propane. 13. The method of claim 1, further comprising spacing the annular porous structures apart thereby forming open passages therebetween and passing at least some of one of the first and second portions of the reactant gas between the center opening region and the outer region through the open passages. 14. The method of claim 1, further comprising blocking at least a portion of the center opening region at one end of the stack, passing at least some of the first portion of the reactant gas out of the center opening region through a hole at the blocked end, and passing at least some of the second portion of the reactant gas out of the outer region without passing to the center opening region. 15. The method of claim 1, further comprising spacing one of the annular porous structures at one end of the stack away from a blocking plate thereby forming an open passage therebetween and passing at least some of the first portion of the reactant gas from the center opening region to the outer region through the open passage. 16. The method of claim 1, further comprising spacing one of the annular porous structures at one end of the stack away from a blocking plate thereby forming an open passage therebetween and passing at least some of the second portion of the reactant gas from the outer region to the center opening region through the open passage. 17. The method of claim 1, further comprising spacing the annular porous structures apart thereby forming open passages therebetween and passing at least some of the first portion of the reactant gas from the center opening region to the outer region through the open passages; and wherein the first portion is between about 60% to 80% of the reactant gas and the second portion is between about 40% to 20% of the reactant gas. 18. The method of claim 1, further comprising spacing the annular porous structures apart thereby forming open passages therebetween and passing at least some of the second portion of the reactant gas from the outer region to the center opening region through the open passages; and wherein the first portion is between about 15% to 35% of the reactant gas and the second portion is between about 85% to 65% of the reactant gas. 19. The method of claim 1, in combination with a prior densification process, wherein the prior densification process comprises passing a reactant gas between a prior center opening region and a prior outer region, and wherein the method further comprises passing most of one of the first and second portions of the reactant gas between the center opening region and the outer region in an opposite direction to that of the prior densification process.