초록 ▼

Containers for providing vapor phase reactant from liquid sources include bubbler designs and designs in which carrier gas flows over the liquid surface. Among the bubbler arrangements, a bypass conductance is provided to release excess pressure from the gas volume inside the container, or an enlarg

Containers for providing vapor phase reactant from liquid sources include bubbler designs and designs in which carrier gas flows over the liquid surface. Among the bubbler arrangements, a bypass conductance is provided to release excess pressure from the gas volume inside the container, or an enlarged bubbler tube is provided with a volume sufficient to accommodate all possible liquid backflow without having the liquid exit the container. Among the overflow designs, flow dividers provide a tortuous path for the gas to increase the time exposure of carrier gas packets to the evaporating liquid surface. The flow dividers can be microporous to encourage capillary action, thereby increasing the evaporating surface. The tortuous gas flow path can be separated from the liquid phase by a breathable semi-porous membrane that permits vapor phase reactant to pass through but prohibits liquid from passing in the other direction.

대표청구항 ▼

I claim: 1. A liquid source chemical vaporizer for vaporizing liquid source chemical and delivering vapor phase chemical, comprising: a container configured to hold liquid source chemical up to a liquid fill level and to additionally define an inner gas volume; a carrier gas inlet configured to com

I claim: 1. A liquid source chemical vaporizer for vaporizing liquid source chemical and delivering vapor phase chemical, comprising: a container configured to hold liquid source chemical up to a liquid fill level and to additionally define an inner gas volume; a carrier gas inlet configured to communicate carrier gas into the container; a gas outlet communicating with a vapor deposition reactor and the inner gas volume of the container; and a porous element positioned to be in contact with liquid source chemical and in contact with the inner gas volume within the container, wherein the porous element comprises a porous gas flow divider at least partially defining a gas flow path from the carrier gas inlet to the gas outlet, wherein the gas flow divider is configured to allow vapor phase reactant to pass through while preventing liquid phase reactant from passing through. 2. The source chemical vaporizer of claim 1, wherein a porosity of the gas flow divider is selected to cause liquid chemical to migrate along the flow divider by capillary action. 3. The source chemical vaporizer of claim 2, wherein each of the carrier gas inlet and the gas outlet is arranged to open to the inner gas volume above the liquid fill level. 4. The source chemical vaporizer of claim 3, wherein the gas flow divider comprises a spiral wall extending from a bottom of the container to a ceiling of the container, wherein one of the carrier gas inlet and the gas outlet is positioned approximately at a center of the spiral and the other of the carrier gas inlet and the gas outlet is positioned approximately at an outer end of the spiral. 5. A liquid source chemical vaporizer, comprising: an outer container configured to hold liquid source chemical; a carrier gas inlet communicating with an inner gas volume defined within the outer container; a gas mixture outlet communicating with a vapor deposition reactor and the inner gas volume; and at least one flow divider defining a gas flow path through the inner gas volume, wherein the material of the at least one flow divider is microporous. 6. The source chemical vaporizer of claim 5, wherein the at least one flow divider comprises a material selected for causing liquid chemical to wet the flow divider by capillary action. 7. The source chemical vaporizer of claim 5, wherein the flow divider extends a height of the outer container from an outer container floor to an outer container ceiling. 8. The source chemical vaporizer of claim 7, wherein the flow divider has a spiral shape, and one of the gas inlet and gas outlet communicates with the inner gas volume overlying liquid source chemical proximate a center of the spiral, while the other of the gas inlet and the gas outlet communicates with the inner gas volume proximate an outer edge of the spiral flow divider. 9. The source chemical vaporizer of claim 5, wherein the material of the at least one flow divider has a porosity between about 30% and 70%. 10. The source chemical vaporizer of claim 5, wherein the at least one flow divider comprises a semi-porous, breathable membrane in contact with each of the gas flow path and the liquid source chemical. 11. The source chemical vaporizer of claim 5, wherein the material of the at least one flow divider has a porosity between about 20% and 80%. 12. The source chemical vaporizer of claim 5, wherein the material of the at least one flow divider is absorbent. 13. The source chemical vaporizer of claim 5, wherein a nominal radius of pores in the microporous material is between about 10 μm and 200 μm. 14. The source chemical vaporizer of claim 5, wherein a nominal radius of pores in the microporous material is between about 30 μm and 70 μm. 15. The source chemical vaporizer of claim 8, wherein distance of a gas flow path between the gas inlet to the gas outlet is about 3 times greater than a linear distance between the gas inlet and the gas outlet. 16. The source chemical vaporizer of claim 8, wherein distance of a gas flow path between the gas inlet to the gas outlet is about 5 times greater than a linear distance between the gas inlet and the gas outlet.