초록 ▼

A liquid crystal display (LCD) device includes a first substrate having a plurality of column spacers fixed thereto, a second substrate facing the first substrate, and having a plurality of projections at portions corresponding to the column spacers, the projections contacting the column spacers, an

A liquid crystal display (LCD) device includes a first substrate having a plurality of column spacers fixed thereto, a second substrate facing the first substrate, and having a plurality of projections at portions corresponding to the column spacers, the projections contacting the column spacers, and a liquid crystal layer between the first and second substrates.

대표청구항 ▼

What is claimed is: 1. A liquid crystal display (LCD) device, comprising: a first substrate having a plurality of first and second column spacers; a second substrate facing the first substrate, the second substrate contacting the first column spacers; and a liquid crystal layer between the first an

What is claimed is: 1. A liquid crystal display (LCD) device, comprising: a first substrate having a plurality of first and second column spacers; a second substrate facing the first substrate, the second substrate contacting the first column spacers; and a liquid crystal layer between the first and second substrates, wherein the second substrate has a first area contacting the first column spacers and second areas each having a predetermined interval from the second column spacers, wherein the first area of the second substrate has a projected part from a passivation layer and the passivation layer is formed below a pixel electrode on the second substrate, and wherein a vertical deposition structure within the first area of the second substrate includes at least the substrate, a gate line, a gate insulating layer, a first projection pattern, a second projection pattern, a passivation layer, and an alignment layer and a vertical deposition structure within the second area of the second substrate includes at least the substrate, the gate line, the gate insulating layer, the passivation layer, and the alignment layer. 2. The device according to claim 1, wherein the vertical deposition structure within the first area of the second substrate is different from the vertical deposition structure within the second area of the second substrate. 3. The device according to claim 1, wherein a step difference between the first and second area is about 500Å or more. 4. The device according to claim 1, wherein the first projection pattern is formed of the same material as a semiconductor and the second projection pattern is formed of the same material as a data line.