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A process for manufacturing a device adapted for exposure to high temperatures. A support structure for retaining a ceramic insulating material on a substrate is formed by the deposition of a support structure material through a patterned masking material. The support structure can define cells into

A process for manufacturing a device adapted for exposure to high temperatures. A support structure for retaining a ceramic insulating material on a substrate is formed by the deposition of a support structure material through a patterned masking material. The support structure can define cells into which the ceramic insulating material is deposited following removal of the masking material. The support structure may be a composite metal-ceramic material having either discreet layers or a graded composition deposited by an electro-deposition process followed by a heat treatment to form a solid state diffusion bond with the substrate. The ceramic filler material may be deposited by the electrophoretic deposition of ceramic particles coated with a bonding material that is subsequently heated to oxidize and to bond the particles together. The support structure may be formed with inclined walls in order to improve its resistance to foreign object impact damage.

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I claim as my invention: 1. A process for manufacturing a device, the process comprising: coating a top surface of a substrate with a layer of masking material; removing a selected portion of the masking material to form a pattern of first volumes in the layer of masking material; depositing a supp

I claim as my invention: 1. A process for manufacturing a device, the process comprising: coating a top surface of a substrate with a layer of masking material; removing a selected portion of the masking material to form a pattern of first volumes in the layer of masking material; depositing a support structure material in the first volumes to form a support structure attached to the top surface of the substrate; removing a remaining portion of the masking material to form a pattern of second volumes; and depositing a thermally insulating filler material in the second volumes; wherein the step of depositing a support structure material further comprises depositing a first layer of support structure material having a first composition onto the top surface of the substrate and depositing a second layer of support structure material having a second composition different than the first composition onto the first layer of support structure material. 2. The process of claim 1, further comprising: selecting the masking material to be a photo-resist material; wherein the step of removing a selected portion of the masking material comprises: exposing the photo-resist material to a pattern of energy to define a pattern of developed and undeveloped photo-resist material; and removing one of the developed and the undeveloped photo-resist material to form the pattern of first volumes. 3. The process of claim 1, wherein the step of removing a selected portion of the masking material comprises applying laser energy to the layer of masking material to vaporize a selected portion of the masking material to form the pattern of first volumes. 4. The process of claim 3, further comprising applying the laser energy at a predetermined angle in relation to the plane of the top surface of the substrate to form the first volumes to have inclined side walls. 5. The process of claim 1, further comprising selecting the masking material to be an epoxy resin. 6. The process of claim 1, wherein the step of depositing a support structure material further comprises electroplating a support structure material onto the top surface of the substrate. 7. The process of claim 1, wherein the top surface of the substrate comprises a curved surface, and further comprising removing a selected portion of the masking material by applying laser energy to form a honeycomb pattern of first volumes in the layer of masking material. 8. The process of claim 1, wherein the step of depositing a thermally insulating filler material further comprises: depositing the thermally insulating filler material in the form of particles of a ceramic material coated with nickel; heating the particles to form an oxide bond between adjoining particles; depositing aluminum in volumes between the particles; and heating the aluminum to form alumina between the particles. 9. The process of claim 1, further comprising: selecting the thermally insulating filler material from the group consisting of yttria stabilized zirconia, yttria stabilized hafnia, magnesium stabilized zirconia, calcium stabilized zirconia, and a ceramic with a pyrochiore structure having a formula A2B2O7 where A is a rare earth element and B is zirconium, hafnium or titanium; and depositing the filler material in the second volumes by one of an electrophoretic, sol-gel or slurry process. 10. A process for manufacturing a device, the process comprising: coating a top surface of a substrate with a layer of masking material; removing a selected portion of the masking material to form a pattern of first volumes in the layer of masking material; depositing a support structure material in the first volumes to form a support structure attached to the top surface of the substrate, the support structure material being changed during the step of depositing such that the support structure comprises a first composition in a bottom portion proximate the top surface of the substrate and a second composition different than the first composition in a top portion proximate a top of the support structure; removing a remaining portion of the masking material to form a pattern of second volumes; and depositing a thermally insulating filler material in the second volumes. 11. The process of claim 10, wherein the step of depositing further comprises depositing a support structure material comprising a graded metal-ceramic composition in the first volumes, wherein a ceramic content of the composition is higher in the top portion than in the bottom portion. 12. The process of claim 10, wherein the step of depositing further comprises depositing a ceramic material in the top portion. 13. The process of claim 11, further comprising forming the support structure to have side walls that are inclined at a non-perpendicular angle to the top surface of the substrate. 14. A process for manufacturing a device, the process comprising: coating a top surface of a substrate with a layer of masking material; removing a selected portion of the masking material to form a pattern of first volumes in the layer of masking material; depositing a support structure material in the first volumes to a depth exceeding a depth of the masking material to form a support structure comprising a T-shaped structure affixed to the substrate; removing a remaining portion of the masking material to form a pattern of second volumes; and depositing a thermally insulating filler material in the second volumes; wherein the T-shaped structure acts as an anchor providing a mechanical interface between the substrate and the filler material. 15. The process of claim 14, further comprising depositing the support structure material to comprise a ceramic material in a top portion of the T-shaped structure. 16. The process of claim 14, further comprising depositing the support structure material to comprise a graded metal-ceramic material wherein a ceramic content of the graded material is higher in a top portion of the T-shaped structure than in a bottom portion.