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특허 상세정보

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Reactive deposition for electrochemical cell production

특허상세정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판) C23C-008/00    C23C-014/30    C23C-014/28    B05D-005/12    H01M-008/00   
미국특허분류(USC) 427/585; 427/596; 427/115; 427/248.1; 429/012; 429/122
출원번호 UP-0854931 (2004-05-27)
등록번호 US-7521097 (2009-07-01)
발명자 / 주소
출원인 / 주소
대리인 / 주소
    Dardi & Associates, PLLC
인용정보 피인용 횟수 : 8  인용 특허 : 59
초록
▼

Light reactive deposition can be adapted effectively for the deposition of one or more electrochemical cell components. In particular, electrodes, electrolytes, electrical interconnects can be deposited form a reactive flow. In some embodiments, the reactive flow comprises a reactant stream that intersects a light beam to drive a reaction within a light reactive zone to produce product that is deposited on a substrate. The approach is extremely versatile for the production of a range of compositions that are useful in electrochemical cells and fuel cell,...

대표
청구항
▼

What we claim is: 1. A method for forming an electrochemical cell, the method comprising performing the sequential reactive deposition of an elemental metal or metal alloy, and a metalloid oxide, wherein the reactive deposition comprises moving a substrate or platen relative to a product flow for at least a portion of the time period when deposition is being performed and wherein the sequential reactive depositions are performed with respect to a single reaction zone, wherein a reactant flow intersects with a light beam to drive a reaction that forms th...

이 특허에 인용된 특허 (59)

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