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Enclosed container lid opening/closing system and enclosed container lid opening/closing method 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • B65B-031/04
  • B65D-085/86
  • B65G-001/133
  • B65G-001/12
  • H01L-021/673
  • H01L-021/67
출원번호 UP-0257307 (2005-10-25)
등록번호 US-7523769 (2009-07-01)
우선권정보 JP-2004-310327(2004-10-26)
발명자 / 주소
  • Miyajima, Toshihiko
  • Suzuki, Hitoshi
  • Igarashi, Hiroshi
출원인 / 주소
  • TDK Corporation
대리인 / 주소
    Oblon, Spivak, McClelland, Maier & Neustadt, P.C.
인용정보 피인용 횟수 : 10  인용 특허 : 33

초록

In order to easily and surely remove contaminants or the like from wafers stored in a pod (FOUP), a gas supply pipe is located above an opening portion in a FIMS system. A clean gas is blown to the upper surfaces of the wafers stored in the inner portion of the pod through the gas supply pipe to rem

대표청구항

What is claimed is: 1. A lid opening/closing system for removing, from a storage container including a main body and a lid, the lid, the main body including an opening provided in a horizontal direction and a plurality of shelves arranged in a vertical direction, on each of which an object to be st

이 특허에 인용된 특허 (33)

  1. Chen, San-Pen; Wu, Shun-Lian; Wang, William, Apparatus and method for preventing a wafer mapping system of an SMIF system from being polluted by corrosive gases remaining on wafers.
  2. Miyajima, Toshihiko; Okabe, Tsutomu, Clean box, clean transfer method and system.
  3. Yotsumoto Tadashi,JPX ; Muguruma Terumi,JPX ; Yoshikawa Noriaki,JPX ; Kuroda Yuichi,JPX, Clean storage equipment for substrates and method of storing substrates.
  4. Yamashita, Teppei; Murata, Masanao; Tanaka, Tsuyoshi; Morita, Teruya; Kawano, Hitoshi; Okuno, Atsushi; Tsuda, Masanori; Hayashi, Mitsuhiro, Closed container to be used in a clean room.
  5. Ludwig Joachim (Jena DEX), Device for transporting magazines for molding wafer-shaped objects.
  6. Bonora Anthony C. (Menlo Park CA) Oen Joshua T. (Newark CA), Direct loadlock interface.
  7. Yamashita Teppei (Ise JPX) Murata Masanao (Ise JPX) Tanaka Tsuyoshi (Ise JPX) Morita Teruya (Ise JPX) Kawano Hitoshi (Ise JPX) Hayashi Mitsuhiro (Ise JPX) Okuno Atsushi (Ise JPX) Nakamura Akio (Ise J, Electronic substrate processing system using portable closed containers and its equipments.
  8. Fosnight William J. ; Bonora Anthony C. ; Martin Raymond S. ; Tatro Jay, Evacuation-driven SMIF pod purge system.
  9. Aggarwal, Ravinder, Front opening unified pod.
  10. Shih,Shih Hao; Chen,Wei Chen; Luo,Chi Chen; Liu,Hsin Cheng; Lin,Andy, Gas conduit for a load lock chamber.
  11. Kawano Hitoshi (Ise JPX) Yamashita Teppei (Ise JPX) Murata Masanao (Ise JPX) Tanaka Tsuyoshi (Ise JPX) Morita Teruya (Ise JPX) Okuno Atsushi (Ise JPX) Hayashi Mitsuhiro (Ise JPX) Nakamura Akio (Ise J, Gas purge unit for a portable container.
  12. Tsai, Wen-Shan; Wang, Shu-Hua; Huang, Pi-Hsi; Twu, Zeng-Zong, In-situ purge system for article containers.
  13. Fosnight William J. ; Shenk Joshua W. ; Peterson Perry, Kinematic coupling compatible passive interface seal.
  14. Miyajima, Toshihiko; Igarashi, Hiroshi; Okabe, Tsutomu, Load port mounting mechanism.
  15. Tokunaga, Kenji, Load port, wafer processing apparatus, and method of replacing atmosphere.
  16. Mages Andreas,DEX ; Scheler Werner,DEX ; Blaschitz Herbert,DEX ; Schulz Alfred,DEX ; Schneider Heinz,DEX, Loading and unloading station for semiconductor processing installations.
  17. Heid Oliver,CHX, Method for the phase correction of nuclear magnetic resonance signals.
  18. Tokunaga, Kenji, Method of purging wafer receiving jig, wafer transfer device, and method of manufacturing semiconductor device.
  19. Fosnight William J., Modular SMIF pod breather, adsorbent, and purge cartridges.
  20. Fosnight William J. ; Shenk Joshua W., Passively activated valve for carrier purging.
  21. Yamashita Teppei,JPX ; Murata Masanao,JPX ; Tanaka Tsuyoshi,JPX ; Kawano Hitoshi,JPX ; Morita Teruya,JPX, Portable closed container.
  22. Miyajima,Toshihiko; Kagaya,Takeshi; Suzuki,Hitoshi; Sasaki,Mutsuo, Purging system and purging method for the interior of a portable type hermetically sealed container.
  23. Murata Masanao,JPX ; Tanaka Tsuyoshi,JPX ; Morita Teruya,JPX, Sealable container.
  24. Parikh Mihir (San Jose CA) Bonora Anthony C. (Menlo Park CA), Sealable transportable container having a particle filtering system.
  25. Saga Koichiro,JPX, Sealed container and sealed container ambient gas substitution apparatus and method.
  26. Saga Koichiro,JPX, Sealed container, storage apparatus, electronic part conveyance system, and method of storage and conveyance of electronic parts.
  27. Yang Tung-Fang,TWX ; Wu Tzong-Ming,TWX, Standard mechanical interface wafer pod gas filling system.
  28. Saga, Koichiro, Substrate transportation container.
  29. Schneider Heinz (Jena DEX) Fabian Peter (Jena DEX), Transport container for wafer-shaped objects.
  30. Speasl, Jerry A.; Dante, Edward, Transportable container including an internal environment monitor.
  31. Bonora Anthony C. ; Wartenbergh Robert P. ; Gomes Christopher, Two stage valve for charging and/or vacuum relief of pods.
  32. Tokunaga,Kenji, Wafer carrier, wafer conveying system, stocker, and method of replacing gas.
  33. Igarashi,Hiroshi; Okabe,Tsutomu; Miyajima,Toshihiko, Wafer processing apparatus capable of mapping wafers.

이 특허를 인용한 특허 (10)

  1. Larisch, Michael; Beck, Ulrich; Walser, Michael, Adapter tool and wafer handling system.
  2. Larisch, Michael; Beck, Ulrich; Walser, Michael, Adapter tool configured to be attached to a loadport of a wafer handling system and wafer handling system with such an adapter tool.
  3. Okabe, Tsutomu; Emoto, Jun, Lid opening/closing system for closed container and substrate processing method using same.
  4. Okabe, Tsutomu; Emoto, Jun, Lid opening/closing system for closed container and substrate processing method using same.
  5. Asa, Fuminori; Taniyama, Yasushi, Load port.
  6. Iwamoto, Tadamasa; Emoto, Jun; Miyajima, Toshihiko; Tsutsui, Hidenori, Load port unit and EFEM system.
  7. Bonora, Anthony C, Port door positioning apparatus and associated methods.
  8. Emoto, Jun; Iwamoto, Tadamasa; Miyajima, Toshihiko, Purge device and load port apparatus including the same.
  9. Nambu, Hidetaka; Hironaga, Nobuo; Ota, Futoshi; Yokoyama, Toru; Sugawara, Osamu; Satou, Ryo; Tamura, Masato, Semiconductor device manufacturing method, wafer treatment system, and recording medium.
  10. Onodera, Shinobu; Numakura, Masahiro, Substrate receiving method and controller.
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