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Turbidity monitoring methods, apparatuses, and sensors 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • G01N-021/00
출원번호 UP-0820575 (2004-04-07)
등록번호 US-7538880 (2009-07-01)
발명자 / 주소
  • Moore, Scott E.
  • Meikle, Scott G.
  • Crum, Magdel
출원인 / 주소
  • Micron Technology, Inc.
대리인 / 주소
    Wells St. John, P.S.
인용정보 피인용 횟수 : 2  인용 특허 : 64

초록

Semiconductor processors, sensors, semiconductor processing systems, semiconductor workpiece processing methods, and turbidity monitoring methods are provided. According to one aspect, a semiconductor processor includes a process chamber configured to receive a semiconductor workpiece for processing

대표청구항

The invention claimed is; 1. An apparatus comprising: a container configured to provide a subject material in a substantially static state; and a plurality of sensors individually configured to monitor turbidity of the subject material, wherein the sensors are individually configured to monitor the

이 특허에 인용된 특허 (64)

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  2. Obeng Yaw S. ; Schultz Laurence D., Apparatus and method for continuous delivery and conditioning of a polishing slurry.
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  9. Jordan Michael (Merrimack NH), Automated multiple-purpose chemical-analysis apparatus.
  10. Hungerford William G. (Medina NY) Miller Donald L. (Middleport NY) Griffith Carl (Middleport NY) Kaiser Donald (Clarence Center NY), Automatic fluid sampling and monitoring apparatus and method.
  11. Kloth Bernd (Hamburg DEX) Behnk Holger (Hamburg DEX), Blood coagulation time measuring device.
  12. Taylor Lauren P. (Swarthmore PA) Petroski Alex (Springfield PA), Catch basin processing apparatus.
  13. Yang Ming-Sheng,TWX ; Chen Hsueh-Chung,TWX ; Lin Tsang-Jung,TWX ; Wu Juan-Yuan,TWX, Chemical-mechanical polishing station with end-point monitoring device.
  14. Russ Richard D. ; Thomas Daniel, Chemical-mechanical-polishing system with continuous filtration.
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  16. Tsai Pei-Wei,TWX ; Tseng Huan-Jen,TWX ; Chang Chih-Hsien,TWX ; Chin Yi-Hua,TWX, Control device for maintaining a chemical mechanical polishing machine in a wet mode.
  17. Mian Alec ; Kieffer-Higgins Stephen G. ; Corey George D., Devices and methods for using centripetal acceleration to drive fluid movement in a microfluidics system.
  18. Berkcan Ertugrul (Schnectady NY), Dynamic temperature compensation method for a turbidity sensor used in an appliance for washing articles.
  19. Uzoh Cyprian E., Electroetch and chemical mechanical polishing equipment.
  20. Smith, Craig Roland; White, David A., Fluid waster diversion system.
  21. Ottens, Gregory J.; Engler, Kevin J.; Guiffre, Thomas R.; Moyer, Thomas M., Focused laser light turbidity sensor.
  22. Yueh William, In-situ endpoint control apparatus for semiconductor wafer polishing process.
  23. Vincent John D. (531 SW. 63 Ter. Margate FL 33068), Industrial waste water reclamation process.
  24. Sato Ko (2-6 Fukazawa 6 chome Setagaya-ku ; Tokyo JPX), Integration sphere type turbidimeter.
  25. Meyer Richard C. (La Habra CA), Magnetic strirrer for sample container.
  26. Tambo Norihito (Hokkaido) Matsui Yoshihiko (Hokkaido) Ohto Tokio (Kawasaki) Zaitsu Yasushi (Kawasaki) Hiraoka Mutsuhisa (Kawasaki) Hoshikawa Hiroshi (Kawasaki) Ito Haruo (Kawasaki JPX), Method and apparatus for detecting flocculation process of components in liquid.
  27. Ackerson Bruce J., Method and apparatus for fiber optic multiple scattering suppression.
  28. Yamaguchi Dabide,JPX ; Ohto Tokio,JPX ; Harada Kenji,JPX ; Sasaki Akinori,JPX, Method and apparatus for measuring turbidity.
  29. Karnis Alkibiadis (487 Montcalm Ave. Dollard des Ormeaux ; Quebec CAX) Shallhorn Paul M. (159 Bastien Vaudreuil ; Quebec CAX J7V 5Y7), Method and apparatus for on-line monitoring of specific surface of mechanical pulps.
  30. Corlett Gary L. ; Roberson ; Jr. Glenn A., Method and apparatus for recovery of water and slurry abrasives used for chemical and mechanical planarization.
  31. Strippler Kurt (Marzling DEX) Wasmuht Klaus (Ellingen DEX) Maitner Wolfgang (Freising DEX), Method for operating the rake gear in a lauter tub for beer production.
  32. Obeng Yaw Samuel, Method of forming planarized layers in an integrated circuit.
  33. Jeannotte Anthony C. (Foxboro MA) Gilby Anthony C. (Foxboro MA) Cheney M. Charles (Wrentham MA) Meneghelli Barry J. (Plymouth MA), On-line titration using colorimetric end point detection.
  34. McMullan ; James P. ; Stevens ; Albert, Optical device for measuring the turbidity of a liquid.
  35. Jeannotte Anthony C. (Foxboro MA) Gilby Anthony C. (Foxboro MA), Optical probe for fluid light transmission properties.
  36. Giuffre Thomas R. ; Figi Bruce B. ; Patel Sharadkumar D. ; Moyer Thomas M., Overmolded flowthrough turbidity sensor.
  37. Burr Kenneth J. (St. Austell GB2), Particle size determination.
  38. Shibata Miki,JPX ; Nishi Toyomi,JPX ; Nakao Hidetaka,JPX ; Togawa Tetsuji,JPX, Polishing apparatus.
  39. Ishikawa Seiji (Yokohama JPX) Kimura Norio (Fujisawa JPX) Aoki Katsuyuki (Yokohama JPX), Polishing apparatus with swinging structures.
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  41. Robinson Karl M. ; Walker Michael A. ; Skrovan John K., Polishing pad methods of manufacture and use.
  42. Adams John A. ; Krulik Gerald A. ; Harwood C. Randall, Rinse water recycling in CMP apparatus.
  43. Moore Scott E. ; Meikle Scott G. ; Crum Magdel, Semiconductor processors, sensors, and semiconductor processing systems.
  44. Rose Thomas A. (LaGrange IL), Sensing probe for sludge detectors.
  45. Rose Thomas A. (LaGrange IL), Sensing probe for sludge detectors.
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  47. Boyer Jeffrey E. (Freeport IL) Brashaw Mark J. (Stockton IL) Cummins Brad L. (Freeport IL) Erickson Timothy K. (Lena IL) O\Brien ; Jr. Gary R. (Freeport IL) Sies Duane J. (Freeport IL), Sensor platform for use in machines for washing articles.
  48. Foreman Donald S. (Fridley MN) Kubisiak David (Chanhassen MN), Sensor with led current control for use in machines for washing articles.
  49. Sugiyama Misuo,JPX ; Wang Xu Jin,JPX ; Iida Shinya,JPX, Slurry circulation type surface polishing machine.
  50. Kurisawa Shuu,JPX, Slurry recycling apparatus and slurry recycling method for chemical-mechanical polishing technique.
  51. Adams John A. (Escondido CA) Krulik Gerald A. (San Clemente CA) Harwood C. Randall (Tempe AZ), Slurry recycling in CMP apparatus.
  52. Yueh William, Slurry recycling system for chemical-mechanical polishing apparatus.
  53. Elsik, Curtis M.; Smith, George A.; Ashrawi, Samir S.; Anantaneni, Prakasa R.; Whewell, Christopher J., Structured liquids made using LAB sulfonates of varied 2-isomer content.
  54. Goldberg Marvin C. (Englewood CO) Cunningham Kirk M. (Lakewood CO), Suspended sediment sensor.
  55. Bannerjee Ashim K. ; Stream Robert D., System for verifying the calibration of a turbidimeter.
  56. Kushner Jack (Lindenhurst NY) Zwirblis Henry G. (Nesconset NY), Turbidimeter.
  57. Banerjee Ashim K., Turbidimeter array system.
  58. King Karl L. (Brown Deer WI) Weiss Bruce W. (Whitefish Bay WI) Endl Robert W. (Johnson Creek WI), Turbidimeter having a baffle assembly for removing entrained gas.
  59. Lin Ellen Y. (St. Louis MO) Teng James (St. Louis MO), Turbidity measuring device and method.
  60. Hirschberg Joseph G. (Coral Gables FL), Turbidity meter.
  61. Silveston Peter L. (Waterloo CAX), Turbidity meter with parameter selection and weighting.
  62. Taylor Robert E. ; Bull David W., Turbidity sensor.
  63. Kubisiak David (Carver County MN) Wilson Mark L. (Ramsey County MN), Turbidity sensor with analog to digital conversion capability.
  64. Mori Takeshi (Kyoto JPX) Ohkawa Hiromi (Kyoto JPX) Kohno Satoshi (Kyoto JPX), Water measuring system with improved calibration.

이 특허를 인용한 특허 (2)

  1. Liu, Hsu-Shui; Pai, Jiun-Rong; Wang, Yeh-Chieh, Method and apparatus for wireless transmission of diagnostic information.
  2. Byers, Gary Allen; Derecskei, Bela; Bayer, Benjamin Patrick, Slurry supply and/or chemical blend supply apparatuses, processes, methods of use and methods of manufacture.
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