IPC분류정보
국가/구분 |
United States(US) Patent
등록
|
국제특허분류(IPC7판) |
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출원번호 |
UP-0120180
(2005-05-03)
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등록번호 |
US-7566481
(2009-08-05)
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발명자
/ 주소 |
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출원인 / 주소 |
- Guardian Industries Corp.
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대리인 / 주소 |
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인용정보 |
피인용 횟수 :
11 인용 특허 :
31 |
초록
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A method is provided for making a coated article including an anti-etch layer(s) that is resistant to attacks by at least some fluoride-based etchant(s) for at least a period of time. In certain example embodiments, an anti-etch layer(s) is provided on a glass substrate in order to protect the glass
A method is provided for making a coated article including an anti-etch layer(s) that is resistant to attacks by at least some fluoride-based etchant(s) for at least a period of time. In certain example embodiments, an anti-etch layer(s) is provided on a glass substrate in order to protect the glass substrate from attacks by fluoride-based etchant(s). In certain example embodiments, the anti-etch layer(s) is formed using at least one ion beam (possibly in combination with at least one sputtering target). In certain embodiments, a diamond-like carbon (DLC) inclusive layer(s) may be provided over and/or under the anti-etch layer.
대표청구항
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The invention claimed is: 1. A method of making a coated article for use in a window, the method comprising: providing a glass substrate; and forming an anti-etch layer on the glass substrate that is resistant to attacks by fluoride-based etchant(s) using each of at least one sputtering target and
The invention claimed is: 1. A method of making a coated article for use in a window, the method comprising: providing a glass substrate; and forming an anti-etch layer on the glass substrate that is resistant to attacks by fluoride-based etchant(s) using each of at least one sputtering target and at least one ion source so that ions in an ion beam from the ion source impinge on a layer-forming surface along with material sputtered from the sputtering target, wherein the anti-etch layer comprises one or more of: silicon carbide nitride, hydrogenated silicon carbide nitride, zirconium oxycarbide, zirconium carbide, hydrogenated zirconium oxycarbide, and/or hydrogenated zirconium carbide; and using the glass substrate with at least the anti-etch layer thereon as a window of a car, train, subway car, bus or building; wherein the glass substrate with at least the anti-etch layer thereon has a visible transmission of at least about 30%. 2. The method of claim 1, wherein when forming the anti-etch layer gas comprising carbon and/or nitrogen flows through the ion source. 3. The method of claim 1, wherein when forming the anti-etch layer gas comprising carbon and nitrogen flows through the ion source. 4. The method of claim 1, wherein the sputtering target comprises one or more of zirconium and silicon. 5. The method of claim 1, wherein the coated article has a visible transmission of at least about 70%. 6. The method of claim 1, further comprising ion beam depositing diamond-like carbon (DLC) on the glass substrate under and/or over the anti-etch layer. 7. The method of claim 1, further comprising forming a layer comprising silicon oxide and/or silicon nitride on the glass substrate so that the layer comprising silicon oxide and/or silicon nitride is located between the glass substrate and the anti-etch layer. 8. The method of claim 1, wherein the coated article comprises multiple anti-etch layers. 9. The method of claim 1, further comprising ion beam depositing a protective layer comprising diamond-like carbon over and contacting the anti-etch layer. 10. The method of claim 1, wherein the anti-etch layer comprises hydrogenated silicon carbide nitride. 11. The method of claim 1, wherein the anti-etch layer comprises zirconium oxycarbide. 12. The method of claim 1, wherein the anti-etch layer comprises hydrogenated zirconium carbide. 13. The method of claim 1, wherein the glass substrate with at least the anti-etch layer thereon has a visible transmission of greater than at least about 30%. 14. A method of making a window, the method comprising: providing a glass substrate; and forming an anti-etch layer on the glass substrate using at least one sputtering target and at least one ion source so that ions from the ion source impinge on a layer-forming surface along with material sputtered from the sputtering target, wherein the anti-etch layer comprises one or more of: silicon carbide nitride, hydrogenated silicon carbide nitride, zirconium oxycarbide, zirconium carbide, hydrogenated zirconium oxycarbide, and/or hydrogenated zirconium carbide; and using the glass substrate with at least the anti-etch layer thereon in a window of a car, train, subway car, bus or building; wherein the glass substrate with at least the anti-etch layer thereon has a visible transmission of at least about 50%. 15. The method of claim 14, wherein, when forming the anti-etch layer gas comprising carbon and/or nitrogen flows in the ion source. 16. The method of claim 14, further comprising providing a dielectric layer between the glass substrate and the anti-etch layer, wherein the dielectric layer comprises an oxide of silicon, or an oxide of tin and/or indium.
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