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Apparatus and method for controlled combustion of gaseous pollutants

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • B01D-050/00
출원번호 UP-0742126 (2003-12-19)
등록번호 US-7569193 (2009-08-24)
발명자 / 주소
  • Ferron, Shawn
  • Kelly, John
  • Vermeulen, Robbert
출원인 / 주소
  • Applied Materials, Inc.
대리인 / 주소
    Dugan & Dugan, P.C.
인용정보 피인용 횟수 : 4  인용 특허 : 183

초록

The present invention relates to systems and methods for controlled combustion of gaseous pollutants while reducing and removing deposition of unwanted reaction products from within the treatment systems. The systems employ a two-stage thermal reactor having an upper thermal reactor including at lea

대표청구항

That which is claimed is: 1. An apparatus for use during the abatement of a semiconductor manufacturing process comprising: an upper reaction chamber having: an interior porous wall that defines a central chamber; an outer wall that surrounds the interior porous wall and that defines an interior sp

이 특허에 인용된 특허 (183)

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  3. Huntley, Graeme; Seeley, Andrew James; Smith, James Robert, Vacuum pump with a continuous ignition source.
  4. Kawamura, Kohtaro; Shinohara, Toyoji; Sugiura, Tetsuro; Arai, Hideo; Nakazawa, Toshiharu; Ishikawa, Keiichi; Kashiwagi, Seiji; Suzuki, Yasuhiko; Kyotani, Takashi, Vacuum pump with abatement function.

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