IPC분류정보
| 국가/구분 |
United States(US) Patent
등록
|
| 국제특허분류(IPC7판) |
|
| 출원번호 |
UP-0005927
(2004-12-06)
|
| 등록번호 |
US-7570424
(2009-08-24)
|
|
발명자
/ 주소 |
- Perkins, Raymond T.
- Cheng, Cheng Yuan
- Hansen, Douglas P.
- Gardner, Eric W.
|
| 출원인 / 주소 |
|
| 대리인 / 주소 |
Thorpe North & Western, LLP
|
| 인용정보 |
피인용 횟수 :
26 인용 특허 :
116 |
초록
▼
A multilayer wire-grid polarizer for polarizing light includes a stack of thin film layers disposed over a substrate, including a wire-grid array of elongated metal elements having lengths longer than a wavelength of the light and a period less than half the wavelength of the light. One of the layer
A multilayer wire-grid polarizer for polarizing light includes a stack of thin film layers disposed over a substrate, including a wire-grid array of elongated metal elements having lengths longer than a wavelength of the light and a period less than half the wavelength of the light. One of the layers can include a thin film layer with a refractive index greater than a refractive index of the substrate. One of the thin film layers can include a dielectric array of non-metal elements.
대표청구항
▼
The invention claimed is: 1. A wire-grid polarizer device for polarizing light, comprising: a) a substrate; b) a wire-grid layer, disposed over the substrate, the wire-grid layer including an array of elongated metal elements having lengths longer than a wavelength of the light and a period less th
The invention claimed is: 1. A wire-grid polarizer device for polarizing light, comprising: a) a substrate; b) a wire-grid layer, disposed over the substrate, the wire-grid layer including an array of elongated metal elements having lengths longer than a wavelength of the light and a period less than half the wavelength of the light and defining gaps between the elements; c) at least three continuous thin film layers, disposed between the substrate and the wire-grid layer and extending between the gaps, the thin film layers having different refractive indices with respect to one another; d) the refractive index of at least one of the three thin film layers being greater than a refractive index of the substrate; and e) at least one of the thin film layers includes a dielectric grid including an array of non-metal elements, the non-metal and metal elements of the arrays being oriented substantially parallel with one another, and the arrays having substantially equal periods. 2. A device in accordance with claim 1, wherein the at least three thin film layers are formed of materials selected from the group consisting of: aluminum oxide; antimony trioxide; antimony sulphide; beryllium oxide; bismuth oxide; bismuth triflouride; cadmium sulphide; cadmium telluride; calcium fluoride; eerie oxide; chiolite; cryolite; germanium; hafhnium dioxide; lanthanum fluoride; lanthanum oxide; lead chloride; lead fluoride; lead telluride; lithium fluoride; magnesium fluoride; magnesium oxide; neogymium fluoride; neodymium oxide; praseodymium oxide; scandium oxide; silicon; silicon oxide; disilicon trioxide; silicon dioxide; sodium fluoride; tantalum pentoxide; tellurium; titanium dioxide; thallous chloride; yttrium oxide; zinc selenide; zinc sulphide; and zirconium dioxide. 3. A device in accordance with claim 1, wherein non-metal elements of the dielectric grid are aligned below the metal elements of the wire grid layer. 4. A device in accordance with claim 1, further comprising: at least one other thin film layer, disposed over the wire-grid layer. 5. A device in accordance with claim 4, wherein the at least one other thin film layer includes a dielectric grid including an array of non-metal elements, the non-metal and metal elements of the arrays being oriented substantially parallel with one another, and the arrays having substantially equal periods. 6. A device in accordance with claim 5, wherein non-metal elements of the dielectric grid are aligned above the metal elements of the wire grid layer. 7. A device in accordance with claim 1, wherein the elongated metal elements include alternating layers of metal and non-metal materials. 8. A device in accordance with claim 1, wherein at least one of the at least three continuous thin film layers entirely cover a surface of the substrate. 9. A wire-grid polarizer device for polarizing light, comprising: a) a substrate; b) a wire-grid layer, disposed over the substrate, the wire-grid layer including an array of elongated metal elements having lengths longer than a wavelength of the light and a period less than half the wavelength of the light and defining gaps between the elements; c) a first dielectric-grid layer, disposed over the wire-grid layer, the dielectric-grid layer including an array of non-metal elements; and d) a plurality of continuous thin film layers with different refractive indices with respect to one another, disposed between the wire-grid layer and the dielectric-grid layer and extending between the gaps; and e) at least one of the plurality of continuous thin film layers including a second dielectric grid layer, the second dielectric-grid layer including an array of non-metal elements, the non-metal and metal elements of the arrays being oriented substantially parallel with one another, and the arrays having substantially equal periods. 10. A device in accordance with claim 9, wherein non-metal elements of the second dielectric grid layer are aligned above the metal elements of the wire grid layer. 11. A device in accordance with claim 9, wherein at least one of the plurality of continuous thin film layers entirely covers a surface of the substrate. 12. A wire-grid polarizer device for polarizing light, comprising: a) a substrate; b) a wire-grid layer, disposed over the substrate, the wire-grid layer including an array of elongated metal elements having lengths longer than a wavelength of the light and a period less than half the wavelength of the light and defining gaps between the elements; c) at least three continuous thin film layers, disposed between the substrate and the wire-grid layer and extending between the gaps, the thin film layers having different refractive indices with respect to one another; d) the refractive index of at least one of the three thin film layers being greater than a refractive index of the substrate; and e) at least one other thin film layer, disposed over the wire-grid layer and including a dielectric grid including an array of non-metal elements, the non-metal and metal elements of the arrays being oriented substantially parallel with one another, and the arrays having substantially equal periods. 13. A device in accordance with claim 12, wherein the at least three thin film layers are formed of materials selected from the group consisting of: aluminum oxide; antimony trioxide; antimony sulphide; beryllium oxide; bismuth oxide; bismuth triflouride; cadmium sulphide; cadmium telluride; calcium fluoride; ceric oxide; chiolite; cryolite; germanium; hafnium dioxide; lanthanum fluoride; lanthanum oxide; lead chloride; lead fluoride; lead telluride; lithium fluoride; magnesium fluoride; magnesium oxide; neogymium fluoride; neodymium oxide; praseodymium oxide; scandium oxide; silicon; silicon oxide; disilicon trioxide; silicon dioxide; sodium fluoride; tantalum pentoxide; tellurium; titanium dioxide; thallous chloride; yttrium oxide; zinc selenide; zinc sulphide; and zirconium dioxide. 14. A device in accordance with claim 12, wherein one of the thin film layers includes a dielectric grid including an array of non-metal elements, the non-metal and metal elements of the arrays being oriented substantially parallel with one another, and the arrays having substantially equal periods. 15. A device in accordance with claim 14, wherein non-metal elements of the dielectric grid are aligned below the metal elements of the wire grid layer. 16. A device in accordance with claim 12, wherein non-metal elements of the dielectric grid are aligned above the metal elements of the wire grid layer. 17. A device in accordance with claim 12, wherein the elongated metal elements include alternating layers of metal and non-metal materials. 18. A device in accordance with claim 12, wherein the at least one of the at least three continuous thin film layers entirely cover a surface of the substrate. 19. A wire-grid polarizer device for polarizing light, comprising: a) a substrate; b) a wire-grid layer, disposed over the substrate, the wire-grid layer including an array of elongated metal elements having lengths longer than a wavelength of the light and a period less than half the wavelength of the light and defining gaps between the elements; c) a first dielectric-grid layer, disposed over the wire-grid layer, the dielectric-grid layer including an array of non-metal elements; d) a plurality of continuous thin film layers with different refractive indices with respect to one another, disposed between the wire-grid layer and the dielectric-grid layer; and e) at least one of the plurality of continuous thin film layers including a second dielectric grid layer, the second dielectric-grid layer including an array of non-metal elements, the non-metal and metal elements of the arrays being oriented substantially parallel with one another, and the arrays having substantially equal periods.
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