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Polyimide composite coverlays and methods and compositions relating thereto 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • G03F-007/028
  • G03F-007/032
출원번호 UP-0080608 (2005-03-15)
등록번호 US-7579134 (2009-09-08)
발명자 / 주소
  • Dueber, Thomas Eugene
  • Auman, Brian C.
  • Kanakarajan, Kuppusamy
출원인 / 주소
  • E. I. Dupont de Nemours and Company
인용정보 피인용 횟수 : 9  인용 특허 : 20

초록

The present invention is directed to coverlay compositions derived from two-layer polyamic acid-based composites having a cover layer and adjacent thereto an adhesive layer wherein the cover layer comprises polyamic acid and other additives allowing the composition to be photosensitive and aqueous b

대표청구항

What is claimed is: 1. A multi-layer composite coverlay substrate, comprising: A. an adhesive layer having a thickness in a range between and including 1-20 microns, comprising: i. an adhesive polyamic acid precursor curable to an adhesive polyimide base polymer wherein said adhesive base polymer e

이 특허에 인용된 특허 (20)

  1. Collier ; John R. ; Pilette ; Yvan P., Channeled photosensitive element.
  2. Anderson Albert G. (Wilmington DE) Dueber Thomas E. (Wilmington DE), Constrained n-alkylamino aryl ketones as sensitizers for photopolymer compositions.
  3. Dueber Thomas E. (Wilmington DE), Derivatives of aryl ketones and p-dialkyl-aminoarylaldehydes as visible sensitizers of photopolymerizable compositions.
  4. Anderson Albert G. (Wilmington DE), Derivatives of aryl ketones as visible sensitizers of photopolymerizable compositions.
  5. Anderson Albert G. (Wilmington DE), Derivatives of aryl ketones based on 9,10-dihydro-9,10-ethanoanthracene and p-dialkyl-aminoaryl aldehydes as visible sen.
  6. Dessauer Rolf (Greenville DE), Dimers derived from unsymmetrical 2,4,5,-triphenylimidazole compounds as photoinitiators.
  7. Kawamura Kouichi (Kanagawa JPX) Kondo Hirokazu (Kanagawa JPX) Aotani Yoshimasa (Kanagawa JPX), Light sensitive composition containing a light sensitive s-triazine compound.
  8. Oddi Michael J. (64 Fairfax St. Burlington MA 01803) Orio Alfred P. (26 River St. Westford MA 01886), Method of applying photoresist by screening in the formation of printed circuits.
  9. Dueber Thomas E. (Wilmington DE) Link ; deceased William J. (late of Wilmington DE by Elizabeth T. Link ; executrix), N-Alkylindolylidene and N-alkylbenzo-thiazolylidene alkanones as sensitizers for photopolymer compositions.
  10. Gottschalk Peter (Centerville OH) Schuster Gary B. (Champaign IL), Photohardenable compositions containing a dye borate complex and photosensitive materials employing the same.
  11. Sheets Thomas M. (Wysox PA), Photoimaging composition containing admixture of leuco dye and 2,4,5-triphenylimidazolyl dimer.
  12. Sysak Peter K. (Wilmington DE), Photoimaging compositions containing substituted cyclohexadienone compounds.
  13. Weed Gregory C. (Towanda PA), Photopolymerizable composition containing carboxy benzotriazole.
  14. Higashi Tatsuji (Shizuoka JPX), Photopolymerizable composition including an unsaturated monomer, a photopolymerization initator and a carbozole compound.
  15. Pazos Jose F. (Claymont DE), Photopolymerizable compositions containing nitroso dimers to selectively inhibit thermal polymerization.
  16. Dueber Thomas E. (Wilmington DE) Monroe Bruce M. (Wilmington DE), Polymeric sensitizers for photopolymer composition.
  17. Moss Mary G. (Rolla MO) Brewer Terry (Rolla MO) Cuzmar Ruth M. (Rolla MO) Hawley Dan W. (St. James MO) Flaim Tony D. (St. James MO), Positive working polyamic acid/imide photoresist compositions and their use as dielectrics.
  18. Losert Ewald (Rheinfelden CHX) Rembold Heinz (Arlesheim CHX), Process for the production of solder masks for printed circuits.
  19. Lipson Melvin A. (Fullerton CA) Knoth Dale W. (Norwalk CA) Custer Walter D. (Garden Grove CA) Gilano Michael N. (Fullerton CA), Process for treating selected areas of a surface with solder.
  20. Friel ; Daniel D., Vacuum laminating process.

이 특허를 인용한 특허 (9)

  1. Humphries, Mark Robson; Ferdinandi, Frank; Smith, Rodney Edward, Apparatus with a multi-layer coating and method of forming the same.
  2. Brooks, Andrew Simon Hall; Von Werne, Timothy Allan, Electrical assembly and method.
  3. Rumbaugh, Michael R.; Evenson, Jim F.; Reynolds, Jackson E.; Korte, David G.; Livingston, David W.; Frey, Jeffrey G., Electrical submersible pump system having high temperature insulation materials.
  4. Rumbaugh, Michael R.; Evenson, Jim F.; Reynolds, Jackson E.; Korte, David G., Electrical submersible pump system having high temperature insulation materials and buffered lubricant.
  5. Rumbaugh, Michael R.; Evenson, Jim F.; Reynolds, Jackson E.; Korte, David G.; Livingston, David W.; Frey, Jeffrey G., Electrical submersible pump system having high temperature slot, end bell and phase-to-phase insulation.
  6. Rumbaugh, Michael R.; Evenson, Jim F.; Reynolds, Jackson E.; Korte, David G., Electrical submersible pump system having improved magnet wire leads.
  7. Ferdinandi, Frank; Smith, Rodney Edward; Humphries, Mark Robson, Method for manufacturing printed circuit boards.
  8. Ferdinandi, Frank; Smith, Rodney Edward; Humphries, Mark Robson, Printed circuit boards.
  9. Auman, Brian C.; Dunbar, Meredith L.; He, Tao; Kourtakis, Kostantinos, Thin film transistor compositions, and methods relating thereto.
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