IPC분류정보
국가/구분 |
United States(US) Patent
등록
|
국제특허분류(IPC7판) |
|
출원번호 |
UP-0875520
(2004-06-25)
|
등록번호 |
US-7585396
(2009-09-22)
|
발명자
/ 주소 |
|
출원인 / 주소 |
- Guardian Industries Corp.
|
대리인 / 주소 |
|
인용정보 |
피인용 횟수 :
1 인용 특허 :
30 |
초록
▼
A coated article is provided that may be used as a vehicle windshield, insulating glass (IG) window unit, or the like. Ion beam treatment is performed on a layer(s) of the coating. For example, an overcoat layer (e.g., of silicon nitride) of a low-E coating may be ion beam treated in a manner so as
A coated article is provided that may be used as a vehicle windshield, insulating glass (IG) window unit, or the like. Ion beam treatment is performed on a layer(s) of the coating. For example, an overcoat layer (e.g., of silicon nitride) of a low-E coating may be ion beam treated in a manner so as to cause the ion beam treated layer to include (a) nitrogen-doped Si3N4, and/or (b) nitrogen graded silicon nitride. It has been found that this permits durability of the coated article to be improved.
대표청구항
▼
The invention claimed is: 1. A method of making a coated article, the method comprising: providing a glass substrate; forming a layer comprising silver on the glass substrate; forming a layer comprising silicon nitride on the substrate over the layer comprising silver, wherein the layer comprising
The invention claimed is: 1. A method of making a coated article, the method comprising: providing a glass substrate; forming a layer comprising silver on the glass substrate; forming a layer comprising silicon nitride on the substrate over the layer comprising silver, wherein the layer comprising silicon nitride is formed on the substrate by at least sputtering a target comprising silicon; and after said sputtering, ion beam treating the layer comprising silicon nitride in a manner so as to cause the layer comprising silicon nitride to be nitrogen graded so that a portion of the layer comprising silicon nitride further from the glass substrate has a higher nitrogen content than does a portion of the layer closer to the glass substrate, and wherein said ion beam treating of the layer comprising silicon nitride is performed in a manner so as to cause a stress of the layer comprising silicon nitride to change from tensile stress to compressive stress due to the ion beam treating, and wherein the ion beam treating is performed using nitrogen gas and an ion energy from about 600-1100 eV per N2+ ion. 2. The method of claim 1, further comprising sputtering at least one dielectric layer on the substrate so as to be located between the substrate and the layer comprising silver, wherein the at least one dielectric layer comprises at least one of silicon nitride and a metal oxide, and wherein the layer comprising silicon nitride which is subjected to the ion beam treating is an outermost layer of a coating supported by the glass substrate. 3. The method of claim 1, further comprising forming at least a layer comprising NiCr on the substrate over at least the layer comprising silver so as to be located between the layer comprising silver and the layer comprising silicon nitride. 4. The method of claim 1, wherein said ion beam treating includes ion beam treating at least part of the layer comprising silicon nitride with at least nitrogen ions, and wherein an outermost 20 Å thick portion of the layer comprising silicon nitride has at least a 5% higher nitrogen content than an innermost 20 Å thick portion of the layer comprising silicon nitride. 5. The method of claim 1, wherein said ion beam treating further causes the silicon nitride to comprise nitrogen-doped Si3N4. 6. The method of claim 1, wherein the layer comprising silicon nitride following said ion beam treating has compressive stress of from 50 MPa to 2 GPa. 7. The method of claim 1, further comprising heat treating the coated article in a manner sufficient for at least one of tempering and heat bending, so that following said heat treating the coated article has a visible transmission of at least 70% and a sheet resistance (Rs) of no greater than 5.5 ohms/square. 8. The method of claim 1, further comprising heat treating the coated article in a manner sufficient for at least one of tempering and heat bending, so that following said heat treating the coated article has a visible transmission of at least 75% and a sheet resistance (Rs) of no greater than 2.5 ohms/square. 9. The method of claim 1, wherein prior to any optional heat treating, the coated article in monolithic form has a visible transmission of at least 70% and a sheet resistance (Rs) of no greater than 6.0 ohms/square. 10. The method of claim 1, further comprising forming a layer comprising zinc oxide on the glass substrate, so that the layer comprising silver is located over and directly contacting the layer comprising zinc oxide. 11. The method of claim 1, further comprising forming the following layers on the glass substrate in the following order: a) forming a layer comprising silicon nitride on the glass substrate; b) forming a layer comprising zinc oxide on the glass substrate over at least the layer comprising silicon nitride formed in step a); c) forming said layer comprising silver so as to contact an upper surface of the layer comprising zinc oxide; d) forming a layer comprising tin oxide on the substrate and over at least the layer comprising silver; e) forming another layer comprising zinc oxide on the substrate and over at least the layer comprising tin oxide; f) forming another layer comprising silver on the substrate so as to contact an upper surface of the another layer comprising zinc oxide form in step e); g) forming said layer comprising silicon nitride that is ion beam treated on the substrate over at least the another layer comprising silver. 12. The method of claim 1, wherein the layer comprising silicon nitride further comprises from about 1-10% aluminum, and wherein said ion beam treating comprises ion beam treating the layer comprising silicon nitride after the layer comprising silicon nitride has been formed by only sputtering. 13. A method of making a coated article which includes a coating supported by a glass substrate, the method comprising: providing the glass substrate; forming an IR reflecting layer on the glass substrate; forming at least an outermost layer of the coating on the substrate over the IR reflecting layer by using at least a sputtering target; after forming the outermost layer via sputtering, ion beam treating the outermost layer of the coating in a manner so as to cause a stress of the outermost layer of the coating to change from tensile stress to compressive stress due to the ion beam treating, and wherein the ion beam treating that causes stress of the outermost layer to change from tensile to compressive is performed using nitrogen gas and an ion energy of from about 600-1100 eV per N2+ ion. 14. The method of claim 13, wherein the outermost layer of the coating comprises silicon nitride. 15. The method of claim 14, wherein the ion beam treating uses at least nitrogen ions which are at least one of: (a) directed toward the layer comprising silicon nitride at the same time the layer comprising silicon nitride is being grown by at least sputtering, and (b) directed toward the layer comprising silicon nitride after the layer comprising silicon nitride has been sputter-deposited. 16. A method of making a coated article which includes a coating supported by a glass substrate, the method comprising: providing the coating so as to include at least one infrared (IR) reflecting layer sandwiched between at least first and second dielectric layers; and in providing the coating, sputter-depositing at least one layer thereof and after said sputter-depositing then ion beam treating said layer in a manner so as to cause a tensile stress of said layer to be reduced by at least 10% due to the ion beam treating, and wherein the ion beam treating is performed using nitrogen gas and an ion energy from about 600-1100 eV per N2+ ion. 17. The method of claim 16, wherein the layer which is ion beam treated comprises silicon nitride. 18. The method of claim 16, wherein the ion beam treating causes a tensile stress of the at least one layer to be reduced by at least 20% due to the ion beam treating. 19. The method of claim 16, wherein the ion beam treating causes a tensile stress of the at least one layer to be reduced by at least 50% due to the ion beam treating.
※ AI-Helper는 부적절한 답변을 할 수 있습니다.