IPC분류정보
국가/구분 |
United States(US) Patent
등록
|
국제특허분류(IPC7판) |
|
출원번호 |
UP-0780463
(2004-02-17)
|
등록번호 |
US-7588728
(2009-09-24)
|
발명자
/ 주소 |
- Clark, Phillip
- Greenizen, Kurt E.
- Doyle, John
|
출원인 / 주소 |
|
인용정보 |
피인용 횟수 :
13 인용 특허 :
9 |
초록
▼
A laboratory device design particularly for a multiplate format that includes a manifold wherein the position of the plate is not a function of gasket compression or vacuum rate applied. In one embodiment, the device has a modular design, wherein one or more removable inserts, preferably with differ
A laboratory device design particularly for a multiplate format that includes a manifold wherein the position of the plate is not a function of gasket compression or vacuum rate applied. In one embodiment, the device has a modular design, wherein one or more removable inserts, preferably with different functionalities can be positioned between a base component and a collar component. The particular insert(s) chosen depend on the desired sample preparation or assay to be carried out. The insert(s) are stacked and are positioned between the base and collar as a unit, so that the stack within the manifold does not move during evacuation of the vacuum chamber. The consistent position of the insert(s) facilitates using vacuum sample processing with automated liquid handlers.
대표청구항
▼
What is claimed is: 1. A manifold assembly comprising: a collar having a substantially vertical side wall including a bottom periphery region forming a skirt; a base having a peripheral portion; a first seal positioned between the collar and the base wherein the skirt sealingly positions over the p
What is claimed is: 1. A manifold assembly comprising: a collar having a substantially vertical side wall including a bottom periphery region forming a skirt; a base having a peripheral portion; a first seal positioned between the collar and the base wherein the skirt sealingly positions over the peripheral portion of the base; a first sample-processing device having an outer perimeter edge wherein the collar is positioned on the outer perimeter edge of the first sample processing device; a second seal comprising a gasket positioned between the first sample processing device and the collar; and a second sample processing device stacked below said first sample processing device to form an integral stacked unit preventing relative movement between said first and second devices, said stacked unit positioned between said collar and said base. 2. The manifold assembly of claim 1, wherein said first sample processing device is a multiwell filtration plate. 3. The manifold assembly of claim 1, wherein the first sample processing device is selected from the group consisting of filter plates, chromatography plates, DNA capture plates, RNA capture plates, plasmid capture plates, flow directors and combinations thereof. 4. The manifold assembly of claim 1, wherein the second sample processing device is selected from the group consisting of filter plates, chromatography plates, DNA capture plates, RNA capture plates, plasmid capture plates, spacers, support plates, flow directors, wicks, MALDI target trays, MALDI targets, collection plates and combinations thereof. 5. The manifold of claim 1, wherein the first sample processing device is a multiwell filtration device and the second sample processing device is a collection plate. 6. The manifold assembly of claim 1, wherein said first seal is a gasket. 7. The manifold assembly of claim 1, wherein said first seal allows for variability in the height of said first and second devices. 8. The manifold assembly of claim 1, wherein said first seal is created with a gasket positioned within said base, said sealing being along the substantially vertical side walls of said collar. 9. The manifold assembly of claim 1, wherein said first and second seal are a unitary seal. 10. The manifold assembly of claim 1, further comprising a vacuum source, and wherein said base comprises a port for communication with said vacuum source. 11. The manifold assembly of claim 1, further comprising a vacuum source, and wherein said collar comprises a port for communication with said vacuum source. 12. The manifold assembly of claim 1, wherein the relative movement of said first and second devices of said integral stack unit is unaffected by the application of vacuum to said manifold. 13. A manifold assembly comprising: a collar having a substantially lateral side wall; a base in sealing engagement with said collar, the base comprising an outer peripheral flange and a side wall which together form a peripheral groove; a first gasket positioned between the base and the collar wherein a portion of first gasket contacts a slot formed in-the collar; wherein the collar comprises a skirt formed along a bottom periphery of the substantially lateral wall such that the skirt sealingly positions over a peripheral portion of the base; a sample processing; and a second gasket positioned between the sample processing device and the collar, such that the sample processing is in sealing engagement with said collar. 14. The manifold assembly of claim 13, further comprising a removable support positioned below said sample processing device. 15. The manifold assembly of claim 13, wherein said sample processing device is a multiwell filtration plate. 16. The manifold assembly of claim 1 wherein the first and second sample processing devices are selected from the group consisting of filter plates, chromatography plates, DNA capture plates, RNA capture plates, plasmid capture plates, spacers, support plates, flow directors, MALDI target trays, MALDI targets, collection plates and combinations thereof. 17. The manifold assembly of claim 12 wherein the first sample processing device is selected from the group consisting of filter plates, chromatography plates, DNA capture plates, RNA capture plates, plasmid capture plates, spacers, support plates, flow directors, MALDI target trays, MALDI targets, collection plates and combinations thereof. 18. The manifold assembly of claim 1 wherein the top surface of the first sample processing device lies below the top surface of the collar. 19. A manifold assembly comprising: a collar having a substantially vertical side wall including a bottom periphery region forming a skirt; a base having a peripheral portion wherein the skirt sealingly positions over the peripheral portion of the base; a first sample processing device having an outer perimeter edge; a second processing device stacked below said first sample processing device to form an integral stacked unit preventing relative movement between said first and second devices, said stacked unit positioned between said collar and said base, and said collar is positioned on the outer perimeter edge of said first sample processing device; and a first seal between said collar and said base; and a second seal between said first sample processing device and said collar, wherein said first and second seals are a unitary seal. 20. The manifold assembly of claim 19 wherein the top surface of the first sample processing device lies below the top surface of the collar. 21. A manifold assembly comprising: a base; a collar comprising a skirt formed along a bottom periphery of a lateral wall such that the skirt positions over a peripheral portion of the base; a first sample processing device comprising a multiwell filtration plate or a single well filtration device; a second processing device stacked below said first sample processing device to form an integral stacked unit preventing relative movement between said first and second devices, said stacked unit positioned between said collar and said base; a first seal between said collar and said base; and a second seal between said first sample processing device and said collar, wherein said first and second seals are a unitary seal; wherein the first sample processing device is seated recessed within the collar such that the top surface of the first sample processing device lies below the top surface of the collar. 22. The manifold assembly of claim 13, further comprising a vacuum source, and said base comprises a port for communication with said vacuum source. 23. The manifold assembly of claim 13, further comprising a vacuum source, and said collar comprises a port for communication with said vacuum source. 24. The manifold assembly of claim 13, wherein the relative movement of said first and second devices of said integral stack unit is unaffected by the application of vacuum to said manifold. 25. A manifold assembly comprising: a base comprising a flat surface and having a peripheral portion; a collar comprising a substantially vertical side wall including a bottom periphery region forming a skirt and a port for communication with a vacuum source; a first sealing gasket positioned between the base and the collar wherein the skirt sealingly positions over the peripheral portion of the base; and a first sample processing device having an outer perimeter edge wherein the collar is sealingly positioned on the outer perimeter edge of the first sample processing device, and a second seal comprising a gasket positioned between the first sample processing device and the collar. 26. The manifold assembly of claim 25 wherein the base is selected from the group consisting of a bench top, a floor and a wall. 27. The manifold assembly of claim 25, further comprising a removable support positioned below said sample processing device. 28. The manifold assembly of claim 25, wherein the first sample processing device is a multiwell filtration plate. 29. The manifold assembly of claim 25, further comprising a vacuum source. 30. The manifold assembly of claim 25, wherein the first sample processing device is selected from the group consisting of filter plates, chromatography plates, DNA capture plates, RNA capture plates, plasmid capture plates, flow directors and combinations thereof. 31. The manifold assembly of claim 30, further comprising a second sample processing device stacked below the first sample processing device to form an integral stacked unit positioned between the collar and the base. 32. The manifold assembly of claim 31, wherein the second sample processing device is selected from the group consisting of filter plates, chromatography plates, DNA capture plates, RNA capture plates, plasmid capture plates, spacers, support plates, flow directors, wicks, MALDI target frays, MALDI targets, collection plates and combinations thereof.
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