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Apparatus and method for generating a chemical precursor

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • F27B-015/08
  • F27B-015/00
출원번호 UP-0383642 (2006-05-16)
등록번호 US-7588736 (2009-09-24)
발명자 / 주소
  • Chen, Ling
  • Ku, Vincent W.
  • Chung, Hua
  • Marcadal, Christophe
  • Ganguli, Seshadri
  • Lin, Jenny
  • Wu, Dien Yeh
  • Ouye, Alan
  • Chang, Mei
출원인 / 주소
  • Applied Materials, Inc.
대리인 / 주소
    Patterson & Sheridan, LLP
인용정보 피인용 횟수 : 4  인용 특허 : 184

초록

Embodiments of an apparatus for generating a chemical precursor used in a vapor deposition processing system are provide which include a canister having a sidewall, a top, and a bottom forming an interior volume which is in fluid communication with an inlet port and an outlet port. The canister cont

대표청구항

The invention claimed is: 1. An apparatus for generating a chemical precursor used in a vapor deposition processing system, comprising: a canister having a sidewall, a top, and a bottom providing an interior volume; a precursor material at least partially filling the interior volume of the canister

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  1. Chu, Schubert S.; Marcadal, Christophe; Ganguli, Seshadri; Nakashima, Norman M.; Wu, Dien-Yeh, Ampoule with a thermally conductive coating.
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  3. Nakashima, Norman; Marcadal, Christophe; Ganguli, Seshadri; Ma, Paul; Chu, Schubert S., Chemical delivery apparatus for CVD or ALD.
  4. Birtcher, Charles Michael; Steidl, Thomas Andrew; Lei, Xinjian; Ivanov, Sergei Vladimirovich, Vessel with filter.
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