초록 ▼

The invention provides a charged particle beam device and a method of operation thereof. An emitter (2) emits a primary charged particle beam (12). Depending on the action of a deflection system, which comprises at least three deflection stages (14), it can be switched between at least two detection

The invention provides a charged particle beam device and a method of operation thereof. An emitter (2) emits a primary charged particle beam (12). Depending on the action of a deflection system, which comprises at least three deflection stages (14), it can be switched between at least two detection units (16, 44). Further, beam shaping means (15; 41) is provided and a lens for focusing at the primary charged particle beam on a specimen.

대표청구항 ▼

The invention claimed is: 1. A charged particle beam device, comprising: a charged particle emitter for emitting a primary charged particle beam; a deflection system, comprising three deflection stages, wherein the deflection system is arranged for deflecting the primary charged particle beam and s

The invention claimed is: 1. A charged particle beam device, comprising: a charged particle emitter for emitting a primary charged particle beam; a deflection system, comprising three deflection stages, wherein the deflection system is arranged for deflecting the primary charged particle beam and specimen-released charged particles along a first or a second beam path; and at least two detection units, each associated with one of the first or second beam path, so that the deflection system is adapted to switch between the at least the two detection units, wherein one of the three deflection stages is closer to a specimen stage than the two detection units. 2. The charged particle beam device according to claim 1, further comprising: an aperture unit for shaping the charged particle beam. 3. The charged particle beam device according to claim 2, wherein the aperture unit is a multi-aperture unit having at least two apertures; and wherein each aperture of the two apertures is associated with one of the first or second beam path so that the deflection system is adapted to switch between the two apertures and a corresponding detection unit of the two detection units. 4. The charged particle beam device according to claim 3, wherein the apertures are arranged in a first sector area and the detection units are arranged in a second sector area, and wherein the first and the second sector areas do not overlap. 5. The charged particle beam device according to claim 1, wherein the deflection system comprises six dipole deflectors and is arranged for deflecting the primary charged particle beam and the specimen-released charged particles in two dimensions. 6. The charged particle beam device according to claim 5, wherein each of the three deflection stages comprises two of the six dipole deflectors. 7. The charged particle beam device according to claim 1, wherein each of the three deflection stages comprises a magnetic deflection component. 8. The charged particle beam device according to claim 1 claims, wherein a primary beam deflection angle and a specimen-released charged particles deflection angle are different. 9. The charged particle beam device according to claim 1 further comprising a mirror unit. 10. The charged particle beam device according to claim 1, wherein a primary beam deflection angle and a specimen-released charged particles deflection angle are substantially the same. 11. The charged particle beam device according to claim 1, wherein the three deflection stages are arranged symmetrically to a plane substantially orthogonal to the optical axis. 12. A method of imaging a specimen, comprising: providing a primary charged particle beam; deflecting the primary charged particle beam away from an optical axis using a first deflection stage of a deflection system; deflecting the primary charged particle beam towards the optical axis using a second deflection stage of a deflection system; redirecting the primary charged particle beam to travel substantially along the optical axis using a third deflection stage; focusing the primary charged particle beam on a specimen such that the specimen releases charged particles; and deflecting the specimen-released charged particles, whereby the third deflection stage is controlled such that one detection unit of two detection units is selected. 13. The method of imaging a specimen according to claim 12, wherein the first and the second deflection stages are controlled such that an aperture of a multi-aperture unit is selected, wherein the aperture corresponds to a detection unit of the two detection units. 14. The method of imaging a specimen according to claim 12, wherein the deflecting of the primary charged particle beam and the specimen-released charged particles are conducted in two dimensions. 15. A multiple charged particle device, comprising: a charged particle emitting unit for emitting a plurality of primary charged particle beams; a plurality of deflection systems, each comprising at least three deflection stages, wherein the deflection system is arranged for deflecting the plurality of primary charged particle beams and a plurality of specimen-released charged particles along a plurality of at least a first or a second beam paths; a plurality of at least two detection units, each of the plurality of the at least two detection units associated with one of the plurality of primary beams and each of the at least two detection units associated with one of the at least first or second beam path so that the deflection systems are adapted to switch between the at least two detection units; and a multi-lens unit for focusing the plurality of charged particle beams. 16. A charged particle beam device, comprising: a charged particle emitter for emitting a primary charged particle beam; a deflection system, comprising three deflection stages, wherein the deflection system is arranged for deflecting the primary charged particle beam and specimen-released charged particles along a first or a second beam path; two detection units each associated with one of the first or second beam path so that the deflection system is adapted to switch between the two detection units; wherein one of the three deflection stages is closer to a specimen stage than the two detection units; wherein the charged particle beam device further comprises an aperture unit for shaping the charged particle beam, wherein the aperture unit is a multi-aperture unit comprising two apertures; and wherein each aperture of the two apertures is associated with one of the first or second beam path so that the deflection system is adapted to switch between the two apertures and the corresponding detection unit of the two detection units.