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Imprint lithography apparatus and method employing an effective pressure 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • B29D-017/00
출원번호 UP-0931672 (2004-09-01)
등록번호 US-7641468 (2010-02-11)
발명자 / 주소
  • Wu, Wei
  • Tong, William M.
  • Gao, Jun
  • Picciotto, Carl
출원인 / 주소
  • Hewlett-Packard Development Company, L.P.
인용정보 피인용 횟수 : 8  인용 특허 : 23

초록

An imprint apparatus and method employ an effective pressure in imprint lithography. The imprint apparatus includes a compressible chamber that encloses an imprint mold having a mold pattern and a sample to be imprinted. The chamber is compressed to imprint the mold pattern on the sample. The mold i

대표청구항

What is claimed is: 1. An imprint apparatus comprising: an imprint mold having a mold pattern, the imprint mold having a contact area that is an area of contact between the mold pattern and a sample; and a compressible chamber that encloses the imprint mold and the sample, the compressible chamber

이 특허에 인용된 특허 (23)

  1. Tan,Hua; Kong,Linshu; Li,Mingtao; Chou,Stephen Y., Apparatus for fluid pressure imprint lithography.
  2. Mueller Lutz,DEX ; Reuther Frank,DEX ; Springer Alf,DEX ; Heckele Matthias,DEX ; Biedermann Hans,DEX, Apparatus for molding microsystem structures.
  3. Busch Ralf (Cologne DEX) Onnenberg Volker (Wiehl-Drabenderhoehe DEX), Apparatus for the production of expanded cushions with a textile cover.
  4. Stephen Y. Chou, Fluid pressure imprint lithography.
  5. Blalock Guy, Global planarization method and apparatus.
  6. Olsson,Lennart, Imprint method and device.
  7. Harshberger ; Jr. Robert L. ; Olsen Keith A. ; Potter John E. ; McLaughlin Martin J. ; Grossman Stephen P., Isostatic pressure resin transfer molding.
  8. Nimmakayala,Pawan K.; Sreenivasan,Sidlgata V.; Choi,Byung Jin; Cherala,Anshuman, Magnification correction employing out-of-plane distortion of a substrate.
  9. Herzbach, Lars Christian; Thiel, Steffen; Postrach, Stefan, Method for making a microstructure in a glass or plastic substrate according to hot-forming technology and associated forming tool.
  10. Alexander Pechenik, Method for making a nano-stamp and for forming, with the stamp, nano-size elements on a substrate.
  11. Kendale,Amar Maruti; Trumper,David L., Microcontact printing.
  12. Chou Stephen Y., Nanoimprint lithography.
  13. Chen Yong ; Williams R. Stanley, Nanoscale patterning for the formation of extensive wires.
  14. Yong Chen ; R. Stanley Williams, Nanoscale patterning for the formation of extensive wires.
  15. Chung,Yong Chen; Lin,Chia Hung; Chen,Chuan Feng; Hsu,Chia Chun; Feng,Wen Hung; Chen,Ming Chi, Parallelism adjustment device.
  16. Burgin Timothy P. ; Choong Vi-en ; Maracas George N. ; Mance Thomas M., Printing apparatus with inflatable means for advancing a substrate towards the stamping surface.
  17. Matsuno Yoshihiro (Tsukuba JPX) Matsuda Atsunori (Tsukuba JPX) Katayama Shinya (Tsukuba JPX), Process for producing a minute-patterned substrate.
  18. Chou Stephen Y., Release surfaces, particularly for use in nanoimprint lithography.
  19. Willson, Carlton Grant; Colburn, Matthew Earl, Step and flash imprint lithography.
  20. McMackin,Ian M.; Stacey,Nicholas A.; Babbs,Daniel A.; Voth,Duane J.; Watts,Mathew P. C.; Truskett,Van N.; Xu,Frank Y.; Voisin,Ronald D.; Lad,Pankaj B., System for creating a turbulent flow of fluid between a mold and a substrate.
  21. Greschner Johann (Pliezhausen DEX) Schmid Gerhard (Leinfelden-Echterdingen DEX) Steiner Werner (Bblingen DEX) Trippel Gerhard (Sindelfingen DEX) Wolter Olaf (Schnaich DEX), System for stamping an optical storage disk.
  22. Bailey, Todd; Choi, Byung J.; Colburn, Matthew; Sreenivasan, S. V.; Willson, C. Grant; Ekerdt, John, Template for room temperature, low pressure micro-and nano-imprint lithography.
  23. Chung,Yong Chen; Lin,Chia Hung; Hsu,Chia Chun; Chen,Chuan Feng; Feng,Wen Hung; Chen,Ming Chi, Uniform pressing apparatus.

이 특허를 인용한 특허 (8)

  1. Kruijt-Stegeman, Yvonne Wendela; Schram, Ivar; Wuister, Sander Frederik; Lammers, Jeroen Herman, Imprint lithography.
  2. Nakagawa, Kazuki; Hasegawa, Noriyasu; Murakami, Yosuke; Matsumoto, Takahiro, Imprint method, imprint apparatus, and article manufacturing method.
  3. Nakagawa, Kazuki; Hasegawa, Noriyasu; Murakami, Yosuke; Matsumoto, Takahiro, Imprint method, imprint apparatus, and article manufacturing method.
  4. Kawagoe, Masafumi; Masuichi, Mikio; Komura, Tomoyuki; Ueno, Hiroyuki; Nakajima, Miyoshi, Pattern forming apparatus and pattern forming method.
  5. Fukuhara, Kazuya; Hatano, Masayuki, Pattern forming method, pattern forming apparatus, and method for manufacturing semiconductor device.
  6. Komura, Tomoyuki; Masuichi, Mikio; Kawagoe, Masafumi; Tanaka, Tetsuo, Printing apparatus and printing method with measurement of a carrier thickness.
  7. Arik, Mehmet; Wolfe, Charles Franklin; Utturkar, Yogen Vishwas; Seeley, Charles Erklin; Slaton, David Shannon; Lueckenbach, William Henry, Thermal management system for embedded environment and method for making same.
  8. Menard, Etienne, Vacuum coupled tool apparatus for dry transfer printing semiconductor elements.
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