IPC분류정보
국가/구분 |
United States(US) Patent
등록
|
국제특허분류(IPC7판) |
|
출원번호 |
UP-0743695
(2007-05-03)
|
등록번호 |
US-7648862
(2010-02-22)
|
우선권정보 |
JP-2001-333565(2001-10-30) |
발명자
/ 주소 |
- Maruyama, Junya
- Takayama, Toru
- Goto, Yuugo
|
출원인 / 주소 |
- Semiconductor Energy Laboratory Co., Ltd.
|
대리인 / 주소 |
|
인용정보 |
피인용 횟수 :
28 인용 특허 :
61 |
초록
▼
A semiconductor device having a semiconductor element (a thin film transistor, a thin film diode, a photoelectric conversion element of silicon PIN junction, or a silicon resistor element) which is light-weight, flexible (bendable), and thin as a whole is provided as well as a method of manufacturin
A semiconductor device having a semiconductor element (a thin film transistor, a thin film diode, a photoelectric conversion element of silicon PIN junction, or a silicon resistor element) which is light-weight, flexible (bendable), and thin as a whole is provided as well as a method of manufacturing the semiconductor device. In the present invention, the element is not formed on a plastic film. Instead, a flat board such as a substrate is used as a form, the space between the substrate (third substrate (17)) and a layer including the element (peeled layer (13)) is filled with coagulant (typically an adhesive) that serves as a second bonding member (16), and the substrate used as a form (third substrate (17)) is peeled off after the adhesive is coagulated to hold the layer including the element (peeled layer (13)) by the coagulated adhesive (second bonding member (16)) alone. In this way, the present invention achieves thinning of the film and reduction in weight.
대표청구항
▼
What is claimed is: 1. A method of manufacturing a semiconductor device, comprising steps of: forming a peeled layer over a first substrate; bonding a second substrate to the peeled layer using a first bonding member to sandwich the peeled layer between the first substrate and the second substrate;
What is claimed is: 1. A method of manufacturing a semiconductor device, comprising steps of: forming a peeled layer over a first substrate; bonding a second substrate to the peeled layer using a first bonding member to sandwich the peeled layer between the first substrate and the second substrate; separating at least the first substrate from the peeled layer; bonding a third substrate to the peeled layer using a second bonding member to sandwich the peeled layer between the second substrate and the third substrate; separating at least the second substrate from the peeled layer; and separating the third substrate from the peeled layer while the second bonding member remains as a supporter. 2. A method according to claim 1, wherein the peeled layer includes at least a transistor. 3. A method according to claim 1, wherein the first bonding member is a photosensitive bonding member. 4. A method according to claim 1, wherein the first bonding member is a photosensitive bonding member and the second substrate is separated from the peeled layer by irradiating the first bonding member with light. 5. A method according to claim 1, wherein the second substrate is separated from the peeled layer by dissolving the first bonding member in a solvent. 6. A method according to claim 1, wherein the second bonding member is a photosensitive bonding member. 7. A method according to claim 1, wherein the second bonding member is a photosensitive bonding member and the third substrate is separated from the peeled layer by irradiating the second bonding member with light. 8. A method according to claim 1, wherein the third substrate is separated from the peeled layer by dissolving the second bonding member in a solvent. 9. A method according to claim 1, wherein the second bonding member adheres to the peeled layer at a stronger adhesion than its adhesion to the third substrate. 10. A method according to claim 1, wherein the first substrate is one selected from the group consisting of a glass substrate, a quartz substrate, and a metal substrate. 11. A method according to claim 1, wherein the second substrate is one selected from the group consisting of a glass substrate, a quartz substrate, and a metal substrate. 12. A method according to claim 1, wherein the third substrate is a plastic substrate. 13. A method according to claim 1, wherein the third substrate is a plastic film with a film that contains aluminum, oxygen and nitrogen formed on its surface. 14. A method of manufacturing a semiconductor device, comprising steps of: forming a peeled layer over a first substrate; bonding a second substrate to the peeled layer with a first bonding member interposed therebetween so as to sandwich the peeled layer between the first substrate and the second substrate; separating at least the first substrate from the peeled layer; bonding a third substrate to the peeled layer with a second bonding member interposed therebetween so as to sandwich the peeled layer between the second substrate and the third substrate; separating at least the second substrate from the peeled layer; and separating the third substrate from the peeled layer while the second bonding member remains as a supporter. 15. A method according to claim 14, wherein the peeled layer includes at least a transistor. 16. A method according to claim 14, wherein the first bonding member is a photosensitive bonding member. 17. A method according to claim 14, wherein the first bonding member is a photosensitive bonding member and the second substrate is separated from the peeled layer by irradiating the first bonding member with light. 18. A method according to claim 14, wherein the second substrate is separated from the peeled layer by dissolving the first bonding member in a solvent. 19. A method according to claim 14, wherein the second bonding member is a photosensitive bonding member. 20. A method according to claim 14, wherein the second bonding member is a photosensitive bonding member and the third substrate is separated from the peeled layer by irradiating the second bonding member with light. 21. A method according to claim 14, wherein the third substrate is separated from the peeled layer by dissolving the second bonding member in a solvent. 22. A method according to claim 14, wherein the second bonding member adheres to the peeled layer at a stronger adhesion than its adhesion to the third substrate. 23. A method according to claim 14, wherein the first substrate is one selected from the group consisting of a glass substrate, a quartz substrate, and a metal substrate. 24. A method according to claim 14, wherein the second substrate is one selected from the group consisting of a glass substrate, a quartz substrate, and a metal substrate. 25. A method according to claim 14, wherein the third substrate is a plastic substrate. 26. A method according to claim 14, wherein the third substrate is a plastic film with a film that contains aluminum, oxygen and nitrogen formed on its surface.
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