초록 ▼

A three-dimensional (3D) ordered polymer microstructure having a length, a width and a height and including a plurality of waveguides that can be formed utilizing a mask and collimated light. The plurality of waveguides includes a first waveguide having a first finite propagation distance extended a

A three-dimensional (3D) ordered polymer microstructure having a length, a width and a height and including a plurality of waveguides that can be formed utilizing a mask and collimated light. The plurality of waveguides includes a first waveguide having a first finite propagation distance extended along a first direction, a second waveguide having a second finite propagation distance extended along a second direction and a third waveguide having a third finite propagation distance extended along a third direction. Here, only one of the length, width and height of the 3D ordered polymer microstructure is limited by the first finite propagation distance of the first waveguide, the second finite propagation distance of the second waveguide and the third finite propagation distance of the third waveguide.

대표청구항 ▼

What is claimed is: 1. A three-dimensional (3D) ordered polymer microstructure having first, second and third dimensions, the 3D ordered polymer microstructure comprising: a plurality of waveguides comprising: a first waveguide having a first finite propagation distance extended along a first direc

What is claimed is: 1. A three-dimensional (3D) ordered polymer microstructure having first, second and third dimensions, the 3D ordered polymer microstructure comprising: a plurality of waveguides comprising: a first waveguide having a first finite propagation distance extended along a first direction, a second waveguide having a second finite propagation distance extended along a second direction, and a third waveguide having a third finite propagation distance extended along a third direction, wherein: each of the first waveguides defines a non-perpendicular angle with at least one waveguide selected from the second and third waveguides; and the first, second and third waveguides are coupled at waveguide intersections unperturbed by changes in index of refraction caused by photopolymerization. 2. The 3D ordered polymer microstructure of claim 1, wherein the plurality of waveguides are formed by a plurality of collimated light beams directed through a plurality of apertures on a mask having a two-dimensional (2D) pattern and onto a two-dimensional (2D) exposure surface of a volume of photo-monomer adapted to polymerize by the collimated light beams. 3. The 3D ordered polymer microstructure of claim 2, wherein two dimensions of the first, second and third dimensions of the 3D ordered polymer microstructure are not limited by the first finite propagation distance of the first waveguide, the second finite propagation distance of the second waveguide and the third finite propagation distance of the third waveguide. 4. The 3D ordered polymer microstructure of claim 3, wherein the two dimensions not limited by the first finite propagation distance of the first waveguide, the second finite propagation distance of the second waveguide and the third finite propagation distance of the third waveguide correspond to the 2D exposure surface. 5. The 3D ordered polymer microstructure of claim 1, wherein two dimensions of the first, second and third dimensions of the 3D ordered polymer microstructure are not limited by the first finite propagation distance of the first waveguide, the second finite propagation distance of the second waveguide and the third finite propagation distance of the third waveguide. 6. The 3D ordered polymer microstructure of claim 1, wherein the waveguide intersections have substantially constant cross-sectional dimensions. 7. A three-dimensional (3D) ordered polymer microstructure having a length, a width and a height, the 3D ordered polymer microstructure comprising: a plurality of waveguides comprising: a first waveguide having a first finite propagation distance extended along a first direction, a second waveguide having a second finite propagation distance extended along a second direction, and a third waveguide having a third finite propagation distance extended along a third direction, wherein: each of the first waveguides defines a non-perpendicular angle with at least one waveguide selected from the second and third waveguides; each of the second waveguides defines a non-perpendicular angle with at least one waveguide selected from the first and third waveguides; and the first, second and third waveguides are coupled at waveguide intersections unperturbed by changes in index of refraction caused by photopolymerization. 8. The 3D ordered polymer microstructure of claim 7, wherein the plurality of waveguides are formed by a plurality of collimated light beams through a plurality of apertures on a mask having a two-dimensional (2D) pattern and onto a two-dimensional (2D) exposure surface of a volume of photo-monomer adapted to polymerize by the collimated light beams. 9. The 3D ordered polymer microstructure of claim 8, wherein the two dimensions not limited by the first finite propagation distance of the first waveguide, the second finite propagation distance of the second waveguide and the third finite propagation distance of the third waveguide correspond to the 2D exposure surface. 10. A three-dimensional (3D) ordered polymer microstructure having a length, a width and a height, the 3D ordered polymer microstructure comprising: a plurality of waveguides comprising: a first waveguide having a first finite propagation distance extended along a first direction, a second waveguide having a second finite propagation distance extended along a second direction, and a third waveguide having a third finite propagation distance extended along a third direction, wherein: each of the first waveguides defines a non-perpendicular angle with at least one waveguide selected from the second and third waveguides; each of the second waveguides defines a non-perpendicular angle with at least one waveguide selected from the first and third waveguides; each of the third waveguides defines a non-perpendicular angle with at least one waveguide selected from the first and second waveguides; and the first, second and third waveguides are coupled at waveguide intersections unperturbed by changes in index of refraction caused by photopolymerization. 11. The 3D ordered polymer microstructure of claim 10, wherein the plurality of waveguides are formed by a plurality of collimated light beams through a plurality of apertures on a mask having a two-dimensional (2D) pattern and onto a two-dimensional (2D) exposure surface of a volume of photo-monomer adapted to polymerize by the collimated light beams. 12. The 3D ordered polymer microstructure of claim 11, wherein only the height of the 3D ordered polymer microstructure is limited by the first finite propagation distance of the first waveguide, the second finite propagation distance of the second waveguide and the third finite propagation distance of the third waveguide. 13. The 3D ordered polymer microstructure of claim 11, wherein the length and width of the 3D ordered polymer microstructure are not limited by the first finite propagation distance of the first waveguide, the second finite propagation distance of the second waveguide and the third finite propagation distance of the third waveguide. 14. The 3D ordered polymer microstructure of claim 13, wherein the length and width of the 3D ordered polymer microstructure correspond to the 2D exposure surface. 15. The 3D ordered polymer microstructure of claim 10, wherein only the height of the 3D ordered polymer microstructure is limited by the first finite propagation distance of the first waveguide, the second finite propagation distance of the second waveguide and the third finite propagation distance of the third waveguide. 16. The 3D ordered polymer microstructure of claim 10, wherein the length and width of the 3D ordered polymer microstructure are not limited by the first finite propagation distance of the first waveguide, the second finite propagation distance of the second waveguide and the third finite propagation distance of the third waveguide.