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An electroless deposition system and electroless deposition stations are provided. The system includes a processing mainframe, at least one substrate cleaning station positioned on the mainframe, and an electroless deposition station positioned on the mainframe. The electroless deposition station in

An electroless deposition system and electroless deposition stations are provided. The system includes a processing mainframe, at least one substrate cleaning station positioned on the mainframe, and an electroless deposition station positioned on the mainframe. The electroless deposition station includes an environmentally controlled processing enclosure, a first processing station configured to clean and activate a surface of a substrate, a second processing station configured to electrolessly deposit a layer onto the surface of the substrate, and a substrate shuttle positioned to transfer substrates between the first and second processing stations. The electroless deposition station also includes various fluid delivery and substrate temperature controlling devices to perform a contamination free and uniform electroless deposition process.

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We claim: 1. A processing chamber having a processing region adapted to process a substrate, comprising: a platen assembly positioned in the processing region, the platen assembly comprising: a base plate member having a fluid aperture formed therethrough; a substantially disk shaped fluid diffusio

We claim: 1. A processing chamber having a processing region adapted to process a substrate, comprising: a platen assembly positioned in the processing region, the platen assembly comprising: a base plate member having a fluid aperture formed therethrough; a substantially disk shaped fluid diffusion member sealably positioned to the base plate member and having an upstream side and a downstream side, wherein the substantially disk shaped fluid diffusion member has a plurality of fluid passages in fluid communication between the upstream side and the downstream side; a fluid volume formed between the base plate member and the upstream side of the substantially disk shaped fluid diffusion member; a raised portion protruding a first distance above the downstream side of the diffusion member; and a rotatable substrate support assembly positioned in the processing region and having a substrate supporting surface, wherein the rotatable substrate support is coupled to the platen assembly and is adapted to rotate relative to the platen assembly. 2. The processing chamber of claim 1, wherein the substantially disk shaped fluid diffusion member has an outer edge and a surface of the raised portion is coincident with the outer edge of the substantially disk shaped fluid diffusion member. 3. The processing chamber of claim 1, wherein the first distance is between about 0.5 mm and about 25 mm. 4. The processing chamber of claim 1, wherein the substantially disk shaped fluid diffusion member has an upstream surface and a downstream surface, and the downstream surface of the substantially disk shaped fluid diffusion member has a surface roughness (Ra) of between about 1.6 μm to about 20 μm. 5. A processing chamber having a processing region adapted to process a substrate, comprising: a platen assembly positioned in the processing region, the platen assembly comprising: a base plate member having a fluid aperture formed therethrough; a substantially disk shaped fluid diffusion member sealably positioned to the base plate member and having a upstream side and a downstream side; a fluid volume formed between the base plate member and the upstream side of the substantially disk shaped fluid diffusion member; and a plurality of fluid passages formed in the substantially disk shaped fluid diffusion member, wherein the plurality of fluid passages are in fluid communication between the downstream side and the upstream side of the substantially disk shaped fluid diffusion member and at least one of the plurality of fluid passages further comprise: a first portion that is in fluid communication with the upstream side and has a first cross-sectional area; and a second portion having a second cross-sectional area different than the first cross-sectional area, wherein the first portion and the second portion are in fluid communication; and a rotatable substrate support assembly positioned in the processing region and having a substrate supporting surface, wherein the rotatable substrate support is coupled to the platen assembly and is adapted to rotate relative to the platen assembly. 6. The processing chamber of claim 5, wherein the second cross-sectional area is larger than the first cross-sectional area. 7. The processing chamber of claim 5, wherein the plurality of fluid passages comprises: an array of at least four fluid passages that are substantially evenly distributed across the downstream side; and an annular shaped feature protruding a first distance above a downstream surface of the substantially disk shaped fluid diffusion member, wherein the first distance is between about 0.5 mm and about 25 mm. 8. The processing chamber of claim 5, wherein the plurality of fluid passages comprises an array of fluid passages arranged in a square, rectangular, radial or hexagonal close packed orientation. 9. The processing chamber of claim 5, wherein at least two or more of the plurality of fluid passages further comprise a first cylindrical shape for a portion of its length extending from the upstream side and a second cylindrical shape that is in fluid communication with the first cylindrical shape, wherein the second cylindrical shape has a cross-sectional area larger than the first cylindrical shape. 10. A processing chamber having a processing region adapted to process a substrate, comprising: a platen assembly positioned in the processing region, the platen assembly comprising: a base plate member having a fluid aperture formed therethrough; a substantially disk shaped fluid diffusion member sealably positioned to the base plate member and having an upstream side and a downstream side, wherein the substantially disk shaped fluid diffusion member has a plurality of fluid passages in fluid communication between the upstream side and the downstream side; a fluid volume formed between the base plate member and the upstream side of the substantially disk shaped fluid diffusion member; a raised portion protruding a first distance above the downstream side of the diffusion member; and a rotatable substrate support assembly positioned in the processing region and having a substrate supporting surface, wherein the rotatable substrate support is coupled to the platen assembly and is adapted to rotate relative to the platen assembly, wherein the rotatable substrate support assembly has one or more substrate supporting surfaces, and the processing chamber further comprises: an edge dam positioned in the processing region and having a first surface, wherein the edge dam and/or a substrate positioned on the one or more substrate supporting surfaces may be positioned to form a gap between the first surface of the edge dam and an edge of the substrate; and a fluid source positioned to deliver an electroless processing solution to a surface of a substrate positioned on the substrate support. 11. The processing chamber of claim 10, wherein the fluid source further comprises a fluid heater in thermal communication with the electroless processing solution delivered from the fluid source. 12. The processing chamber of claim 10, wherein the edge dam further comprises a lift assembly that is adapted to position the edge dam relative to a surface of the substrate positioned on the one or more substrate supporting surfaces. 13. A processing chamber having a processing region adapted to process a substrate, comprising: a platen assembly positioned in the processing region, the platen assembly comprising: a base plate member having a fluid aperture formed therethrough; a substantially disk shaped fluid diffusion member sealably positioned to the base plate member and having an upstream side and a downstream side, wherein the substantially disk shaped fluid diffusion member has a plurality of fluid passages in fluid communication between the upstream side and the downstream side; a fluid volume formed between the base plate member and the upstream side of the substantially disk shaped fluid diffusion member; a raised portion protruding a first distance above the downstream side of the diffusion member; and a rotatable substrate support assembly positioned in the processing region and having a substrate supporting surface, wherein the rotatable substrate support is coupled to the platen assembly and is adapted to rotate relative to the platen assembly, wherein the rotatable substrate support assembly has one or more substrate supporting fingers that each have a substrate supporting surface, and the processing chamber further comprises: a bowl assembly positioned in the processing region and having one or more walls that form the fluid volume, wherein the fluid volume is sized to allow the one or more substrate supporting features to be immersed in a fluid positioned in the fluid volume; and a fluid source in fluid communication with the fluid volume and a substrate that is positioned on the one or more substrate supporting surfaces. 14. The processing chamber of claim 13, wherein the processing chamber further comprises a fluid heater in thermal communication with the fluid positioned in the fluid volume. 15. The processing chamber of claim 13, wherein the processing chamber further comprises a lift assembly that is adapted to position the rotatable substrate support assembly relative to the one or more walls of the bowl assembly. 16. The processing chamber of claim 13, wherein the rotatable substrate support assembly further comprises: a plenum in fluid communication with the substrate supporting surface; and a vacuum source in fluid communication with the plenum and a substrate positioned on the substrate supporting surface. 17. A processing chamber having a processing region adapted to process a substrate, comprising: a platen assembly positioned in the processing region, the platen assembly comprising: a base plate member having a fluid aperture formed therethrough; a substantially disk shaped fluid diffusion member sealably positioned to the base plate member and having an upstream side and a downstream side, wherein the substantially disk shaped fluid diffusion member has a plurality of fluid passages in fluid communication between the upstream side and the downstream side; a fluid volume formed between the base plate member and the upstream side of the substantially disk shaped fluid diffusion member; a raised portion protruding a first distance above the downstream side of the diffusion member; and a rotatable substrate support assembly positioned in the processing region and having a substrate supporting surface, wherein the rotatable substrate support is coupled to the platen assembly and is adapted to rotate relative to the platen assembly, wherein the substrate support assembly has one or more spaced substrate supporting fingers that each have a substrate supporting surface, and the processing chamber further comprises: a bowl assembly positioned in the processing region and having one or more walls that form the fluid volume, wherein the fluid volume is sized to allow the one or more spaced substrate supporting fingers to be immersed in a fluid positioned in the fluid volume; a motor adapted to rotate the one or more spaced substrate supporting fingers; a gap formed between a surface of a substrate positioned on the one or more spaced substrate supporting fingers and a surface of the one or more walls of the bowl; and a fluid source in fluid communication with the fluid volume and the surface of the substrate that is positioned on the one or more substrate supportfing surfaces.