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Semiconductor substrates having useful and transfer layers

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • H01L-021/30
출원번호 UP-0186948 (2008-08-06)
등록번호 US-7655537 (2010-03-31)
우선권정보 FR-00 15280(2000-11-27)
발명자 / 주소
  • Ghyselen, Bruno
  • Letertre, Fabrice
출원인 / 주소
  • S.O.I.Tec Silicon on Insulator Technologies
대리인 / 주소
    Winston & Strawn LLP
인용정보 피인용 횟수 : 8  인용 특허 : 16

초록

A method of fabricating composite substrates by associating a transfer layer with an intermediate support to form an intermediate substrate of predetermined thickness with the transfer layer having a free surface; providing a sample carrier having a surface and a recess that has a depth that is appr

대표청구항

What is claimed is: 1. A method of fabricating composite substrates of semiconductor materials for use in optics, electronics, or optoelectronics which comprises: associating a transfer layer with an intermediate support to form an intermediate substrate of predetermined thickness with the transfer

이 특허에 인용된 특허 (16)

  1. Bassous Ernest (Bronx NY) Patton Gary L. (Poughkeepsie NY) Stork Johannes M. C. (Yorktown Heights NY), Method for fabricating self-aligned epitaxial base transistor.
  2. Tayanaka Hiroshi,JPX, Method for making thin film semiconductor.
  3. Brian S. Doyle, Method of delaminating a thin film using non-thermal techniques.
  4. Oliver Steven A. ; Zavracky Paul ; McGruer Nicol E. ; Vittoria Carmine, Method of fabricating an integrated complex-transition metal oxide device.
  5. Haisma Jan (Eindhoven NLX) Michielsen Theodorus M. (Eindhoven NLX) Pals Jan A. (Eindhoven NLX), Method of manufacturing semiconductor devices.
  6. Alexander Y Usenko ; William N. Carr, Process for lift off and transfer of semiconductor devices onto an alien substrate.
  7. Kakizaki Yasuo,JPX ; Yonehara Takao,JPX ; Sato Nobuhiko,JPX, Process for producing semiconductor article.
  8. Sakaguchi Kiyofumi,JPX ; Yonehara Takao,JPX, Process for producing semiconductor article.
  9. Sakaguchi Kiyofumi,JPX ; Yonehara Takao,JPX ; Nishida Shoji,JPX ; Yamagata Kenji,JPX, Process for producing semiconductor article.
  10. Bruel Michel (Veurey FRX), Process for the production of thin semiconductor material films.
  11. Henley Francois J. ; Cheung Nathan W., Reusable substrate for thin film separation.
  12. Matsushita Takeshi,JPX ; Kusunoki Misao,JPX ; Tatsumi Takaaki,JPX, Semiconductor substrate and thin film semiconductor device, method of manufacturing the same, and anodizing apparatus.
  13. Matsumoto, Takuji; Iwamatsu, Toshiaki, Semiconductor wafer and semiconductor device comprising gettering layer.
  14. Inoue, Satoshi; Shimoda, Tatsuya; Miyazawa, Wakao, Thin film device transfer method, thin film device, thin film integrated circuit device, active matrix board, liquid crystal display, and electronic apparatus.
  15. Inoue, Satoshi; Shimoda, Tatsuya; Miyazawa, Wakao, Thin film device transfer method, thin film device, thin film integrated circuit device, active matrix board, liquid crystal display, and electronic apparatus.
  16. Atsushi Ogawa JP; Takayuki Yuasa JP, methods for producing compound semiconductor substrates and light emitting elements.

이 특허를 인용한 특허 (8)

  1. Ejeckam, Felix; Francis, Daniel; Diduck, Quentin; Nasser-Faili, Firooz; Babić, Dubravko, Gallium-nitride-on-diamond wafers and devices, and methods of manufacture.
  2. Werkhoven, Christiaan J.; Arena, Chantal, Metallic carrier for layer transfer and methods for forming the same.
  3. Werkhoven, Christiaan J.; Arena, Chantal, Metallic carrier for layer transfer and methods for forming the same.
  4. Werkhoven, Christiaan J.; Arena, Chantal, Methods of fabricating semiconductor structures using thermal spray processes, and semiconductor structures fabricated using such methods.
  5. Werkhoven, Christiaan J., Methods of forming semiconductor structures including III-V semiconductor material using substrates comprising molybdenum.
  6. Werkhoven, Christiaan J., Methods of forming semiconductor structures including III-V semiconductor material using substrates comprising molybdenum, and structures formed by such methods.
  7. Yamazaki, Shunpei, Semiconductor device and method for manufacturing the same.
  8. Werkhoven, Christiaan J.; Arena, Chantal, Semiconductor devices including substrate layers and overlying semiconductor layers having closely matching coefficients of thermal expansion, and related methods.
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