[특허]Effluent gas stream treatment system having utility for oxidation treatment of semiconductor manufacturing effluent gases

Effluent gas stream treatment system having utility for oxidation treatment of semiconductor manufacturing effluent gases 원문보기

IPC분류정보
국가/구분	United States(US) Patent 등록
국제특허분류(IPC7판)	B01D-053/34 B01D-053/38 B01D-053/68
출원번호	UP-0745428 (2007-05-07)
등록번호	US-7695700 (2010-05-20)
발명자 / 주소	Holst, Mark Carpenter, Kent Lane, Scott Arya, Prakash V.
출원인 / 주소	Applied Materials, Inc.
대리인 / 주소	Dugan & Dugan, PC
인용정보	피인용 횟수 : 5 인용 특허 : 75

초록 ▼

An effluent gas stream treatment system for treatment of gaseous effluents such as waste gases from semiconductor manufacturing operations. The effluent gas stream treatment system comprises a pre-oxidation treatment unit, which may for example comprise a scrubber, an oxidation unit such an electrothermal oxidizer, and a post-oxidation treatment unit, such as a wet or dry scrubber. The effluent gas stream treatment system of the invention may utilize an integrated oxidizer, quench and wet scrubber assembly, for abatement of hazardous or otherwise undesired components from the effluent gas stream. Gas or liquid shrouding of gas streams in the treatment system may be provided by high efficiency inlet structures.

대표청구항 ▼

The invention claimed is: 1. A method for treating the effluent fluid stream from one or more semiconductor manufacturing process tools, comprising the steps of: removing water soluble gases from the effluent fluid stream; oxidizing at least a portion of the oxidizable components of the effluent fluid stream; and using a wet spray tower comprising a demister mesh packing to remove acidic components from the effluent fluid stream. 2. The method for treating the effluent fluid stream from one or more semiconductor manufacturing process tools of claim 1, further comprising removing particulates in the step of removing water soluble gases from the effluent fluid stream. 3. The method for treating the effluent fluid stream from one or more semiconductor manufacturing process tools of claim 2, wherein the step of removing particulates and water soluble gases comprises using a wet spray tower. 4. The method for treating the effluent fluid stream from one or more semiconductor manufacturing process tools of claim 3, wherein said wet spray tower comprises an inert-gas-assisted atomizing nozzle. 5. The method for treating the effluent fluid stream from one or more semiconductor manufacturing process tools of claim 1, further comprising removing particulates in the step of removing acidic components from the effluent fluid stream. 6. The method for treating the effluent fluid stream from one or more semiconductor manufacturing process tools of claim 1, wherein the step of oxidizing comprises the steps of: mixing the effluent fluid stream with an oxidizer medium; and heating the effluent fluid stream. 7. The method for treating the effluent fluid stream from one or more semiconductor manufacturing process tools of claim 1, wherein the step of oxidizing comprises using a catalytic oxidizer. 8. The method for treating the effluent fluid stream from one or more semiconductor manufacturing process tools of claim 1, wherein the step of oxidizing comprises using a thermal oxidizer. 9. A method for treating the effluent fluid stream from one or more semiconductor manufacturing process tools using a system that includes an oxidizing unit and a quench unit, comprising the steps of: effecting, in the oxidizing unit, the destruction of at least portion of the halogen-containing components of the effluent fluid stream using a first hydrogen source and the oxidation of at least a portion of the oxidizable components of the effluent fluid stream; quenching the effluent fluid stream from the oxidizing unit; recycling water vapor from the quench unit back to the oxidizing unit for utilization as a second hydrogen source to effect destruction of at least a portion of the halogen-containing components of the effluent fluid stream; and removing acidic components and particulates from the effluent fluid stream. 10. The method for treating the effluent fluid stream from one or more semiconductor manufacturing process tools using a system that includes an oxidizing unit and a quench unit of claim 9, wherein the step of effecting oxidation comprises the steps of: mixing the effluent fluid stream with an oxidizer medium and water vapor; and heating the effluent fluid stream. 11. The method for treating the effluent fluid stream from one or more semiconductor manufacturing process tools using a system that includes an oxidizing unit and a quench unit of claim 9, wherein the step of effecting oxidation comprises using a catalytic oxidizer. 12. The method for treating the effluent fluid stream from one or more semiconductor manufacturing process tools using a system that includes an oxidizing unit and a quench unit of claim 9 wherein water vapor is used as the first hydrogen source. 13. A method for treating the effluent fluid stream from one or more semiconductor manufacturing process tools using a system that includes an oxidizing unit comprising the steps of: removing particulates and water soluble gases from the effluent fluid stream upstream of the oxidizing unit; and quenching the effluent fluid stream downstream of the oxidizing unit using a quench unit aligned with the oxidizing unit in a single vertical orientation. 14. The method for treating the effluent fluid stream from one or more semiconductor manufacturing process tools using a system that includes an oxidizing unit of claim 13, wherein the step of removing particulates and water soluble gases upstream of the oxidation unit comprises using a wet spray tower including an inert-gas-assisted atomizing nozzle.

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IPC	Description
A	생활필수품
A62	인명구조; 소방(사다리 E06C)
A62B	인명구조용의 기구, 장치 또는 방법(특히 의료용에 사용되는 밸브 A61M 39/00; 특히 물에서 쓰이는 인명구조 장치 또는 방법 B63C 9/00; 잠수장비 B63C 11/00; 특히 항공기에 쓰는 것, 예. 낙하산, 투출좌석 B64D; 특히 광산에서 쓰이는 구조장치 E21F 11/00)
A62B-1/08	.. 윈치 또는 풀리에 제동기구가 있는 것

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Effluent gas stream treatment system having utility for oxidation treatment of semiconductor manufacturing effluent gases 원문보기

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Effluent gas stream treatment system having utility for oxidation treatment of semiconductor manufacturing effluent gases 원문보기

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