초록 ▼

This invention is directed to methods of treating inorganic surfaces with aqueous compositions including ionic organosilicon compounds. Surprisingly, it has been found that the application of water soluble ionic organosilicon compounds, which until the present invention have only been used in small

This invention is directed to methods of treating inorganic surfaces with aqueous compositions including ionic organosilicon compounds. Surprisingly, it has been found that the application of water soluble ionic organosilicon compounds, which until the present invention have only been used in small quantities to solubilize silanes, to inorganic surfaces provides the treated surface with an excellent hydrophobic property. The present invention exclusively utilizes ionic organosilicon compounds as the main or sole component for imparting water repellency upon surface treatment of inorganic substrates. The methods of the present invention comprise the application of ionic organosilicon compounds to inorganic surfaces whereby imparting water resistance to the substrate. After application, a treated surface may be characterized as having a long term water repellant property.

대표청구항 ▼

The invention claimed is: 1. A method of treating an inorganic surface comprising applying to the surface an aqueous solution consisting essentially of at least one ionic organosilicon compound selected from the formula: wherein: Y is RO where R is an alkyl radical of one to four carbon atoms,

The invention claimed is: 1. A method of treating an inorganic surface comprising applying to the surface an aqueous solution consisting essentially of at least one ionic organosilicon compound selected from the formula: wherein: Y is RO where R is an alkyl radical of one to four carbon atoms, (CH2CH2O)nH where n has a value of one through ten, (CH3OCH2CH2), or (CH3CH2OCH2CH2); a has a value of zero, one and two; R′ is a methyl or ethyl radical; R″ is an alkylene group one to four carbon atoms; R′″, R″″ and Rv are alkyl groups containing one to twenty two carbon atoms, wherein at least one such group is larger than eight carbon atoms, —CH2C6H5, —CH2CH2OH, —CH2OH, and —(CH2)xNHC(O)Rvi wherein x has a value of from two to ten and Rvi is a perfluoroalkyl radical having one to twelve carbon atoms; and X is chloride, bromide, fluoride, iodide, acetate or tosylate; such that said surface exhibits a water exclusion percentage from about 80 to about 100% wherein the inorganic surface has functional groups that will bond with silanols. 2. The method according to claim 1 wherein said ionic organosilicon comprises between about 0.1 to about 10 weight percent of said aqueous solution. 3. The method according to claim 1, wherein said applying step comprises spraying said aqueous solution onto said surface. 4. The method according to claim 1; wherein said applying step comprises applying the aqueous solution to an inorganic surface. 5. The method according to claim 4; wherein said surface is selected from the group consisting of concrete, masonry products, gypsum, concrete blocks, cinder blocks, soft mud bricks, sand lime bricks, drain tiles, ceramic tiles, sandstone, plaster, clay bricks, natural stones and rocks, roofing tiles, calcium silicate bricks, cement articles, slag stones and bricks, stucco, limestone, macadam, marble, grouts, mortar, terrazzo, clinker, pumice, terra, cotta, porcelain, adobe, coral, dolomite and asphalt. 6. A method according to claim 1, comprising: i) dissolving the at least one ionic organosilicon compound in water to form an aqueous solution consisting essentially of the at least one ionic organosilicon compound; ii) applying the aqueous solution onto the inorganic surface; and iii) allowing the aqueous solution to dry so that the at least one ionic organosilicon compound bonds with reactive sites present on the inorganic surface to form a protective hydrophobic layer on said inorganic surface such that said surface exhibits a water exclusion percentage from about 80 to about 100%. 7. The method according to claim 6 wherein said at least one ionic organosilicon comprises between about 0.1 and 10 weight percent of said aqueous solution. 8. The method according to claim 7; wherein said at least one ionic organosilicon is at least one of 3-(trimethoxysilyl)propyldimethyloctadecyl ammonium chloride, 3-(trimethoxysilyl)propylmethyldidecyl ammonium chloride, and 3-(trimethoxysilyl)propyldimethylhexadecyl ammonium chloride. 9. The method according to claim 8; wherein the step of applying said aqueous solution is selected from the group consisting of at least one of brushing, rolling and spraying said aqueous solution onto said surface. 10. An article comprising an inorganic surface having a hydrophobic layer bonded to said surface such that said surface exhibits a water exclusion percentage from about 80 to about 100%, said hydrophobic layer comprising a polycondensate of a water soluble ionic organosilicon compound according to the formula: wherein: Y is RO where R is an alkyl radical of one to four carbon atoms, (CH2CH2O)nH where n has a value of one through ten, (CH3OCH2CH2), or (CH3CH2OCH2CH2); a has a value of zero, one and two; R′ is a methyl or ethyl radical; R″ is an alkylene group one to four carbon atoms; R′ ″, R″″ and Rv are alkyl groups containing one to twenty two carbon atoms, wherein at least one such group is larger than eight carbon atoms, —CH2C6H5, —CH2CH2OH, —CH2OH, and —(CH2)xNHC(O)Rvi wherein x has a value of from two to ten and Rvi is a perfluoroalkyl radical having one to twelve carbon atoms; and X is chloride, bromide, fluoride, iodide, acetate or tosylate. 11. The article of claim 10; wherein said hydrophobic layer and said inorganic surface are attached by Si—O—Si bonds. 12. The article of claim 11; wherein said hydrophobic layer further comprises long chain alkyl groups bonded to an ionic group. 13. The article of claim 12; wherein said long chain alkyl groups are located such that water cannot reach said ionic group. 14. The water repellant article of claim 13; wherein said water resistant layer comprises a polycondensate of at least one of 3-(trimethoxysilyl)propyldimethyloctadecyl ammonium chloride, 3-(trimethoxysilyl)propylmethyldidecyl ammonium chloride, and 3-(trimethoxysilyl)propyldimethylhexadecyl ammonium chloride. 15. The method according to claim 1; wherein said ionic organosilicon compounds are selected from the formula: wherein: Y is RO where R is (CH2CH2O)nH where n has a value of one through ten; a has a value of zero, one and two; R′ is a methyl or ethyl radical; R″ is an alkylene group one to four carbon atoms; R′″, R″″ and Rv are alkyl groups containing one to twenty two carbon atoms, wherein at least one such group is larger than eight carbon atoms, —CH2C6H5, —CH2CH2OH, —CH2OH, and —(CH2)xNHC(O)Rvi wherein x has a value of from two to ten and Rvi is a perfluoroalkyl radical having one to twelve carbon atoms; and X is chloride, bromide, fluoride, iodide, acetate or tosylate. 16. The method according to claim 15, wherein R″ is an alkylene group with four carbon atoms.