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Circular suction outlet assembly cover 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • 23-01
출원번호 UP-0327789 (2008-11-13)
등록번호 US-D613829 (2010-05-20)
발명자 / 주소
  • Griffin, Ronald H.
  • Rung, Robert
출원인 / 주소
  • Hayward Industries, Inc.
대리인 / 주소
    McCarter & English, LLP
인용정보 피인용 횟수 : 87  인용 특허 : 25

초록

초록이 없습니다.

대표청구항

CLAIM The ornamental design for a circular suction outlet assembly cover, as shown and described.

이 특허에 인용된 특허 (25)

  1. Phillips Trevor (3001 Mission Oaks Blvd. Camarillo CA 93011) Babcock Robert (3001 Mission Oaks Blvd. Camarillo CA 93011), Channel drain and support bracket unit.
  2. Warnekros Casper P. (1410 Clearview Rd. Santa Barbara CA 93101), Combined strainer and shield for use with a dental flask.
  3. Chalberg Philip E. (Costa Mesa CA), Combined suction assembly and light for a whirlpool bath.
  4. DuBois, Kerry J., Cover for an overflow drain.
  5. Enrique Acosta, Device for preventing permanent entrapment.
  6. Barnett Ralph L., Drain assembly for preventing hair entanglement in a pool or hot tub.
  7. Barnett, Ralph Lipsey; Poczynok, Peter Joseph, Drain cover.
  8. Ronald Schroader, Drain safety cover system and method.
  9. Morgan George M. (15658 Reeder Overland Park KS 66212), Floor drain protective cap.
  10. Nelson John, Hair control device for spas.
  11. Gordon Leonard (18344 Oxnard St. Unit 108 Tarzana CA 91356), Hydrostatic relief valve.
  12. Cornwall, Kenneth R., Hydrostatic test cap.
  13. Pan,Ji Cheng, Inlet baffle in a food waste disposal unit.
  14. Zars Leif Alexander, Main drain safety grate apparatus.
  15. Thomas E. Veloskey ; Jeffrey A. Wichmann, Ramped cap unit for a main pool drain cover plate.
  16. Sanders John T. (1441 Calle Pimiento Thousand Oaks CA 91360), Safety circulation system.
  17. Leif Alexander Zars, Safety device and method for swimming pool drain protection.
  18. Nicholas John J., Safety device for swimming pools.
  19. Paul M. Mullings, Safety drain guard for swimming pools and spas.
  20. Baker William O. (Corona Delmar CA) Johnson Charles S. (Laguna Niguel CA), Safety suction outlet for pools.
  21. Zars, Leif Alexander, Safety swimming pool replacement drain cover apparatus and method.
  22. Chalberg Philip E. (3441 Santa Clara Cir. Costa Mesa CA 92626), Suction assembly for a whirlpool bath.
  23. Ohaus Karl G. (Chatham NJ), Suction cover for a jetted tub.
  24. Paul Mullings, Suction drain guard for swimming pools and spas.
  25. Jacuzzi Remo (Little Rock AR), Suction fitting for a hydrotherapy spa and the like.

이 특허를 인용한 특허 (87)

  1. Ootsuka, Fumio, 3D stacked multilayer semiconductor memory using doped select transistor channel.
  2. Geldenhuys, Siegfried; Buitendag, Marthinus Jacobus, Adaptor plate.
  3. Shin, Young-Sun; Park, Jin-Sun; Kim, Tae-Han, Air conditioner.
  4. Shin, Young-Sun; Park, Jin-Sun; Kim, Tae-Han, Air conditioner.
  5. Shin, Young-Sun; Park, Jin-Sun; Kim, Tae-Han, Air conditioner.
  6. Shin, Young-Sun; Park, Jin-Sun; Kim, Tae-Han, Air conditioner.
  7. Shin, Young-Sun; Park, Jin-Sun; Kim, Tae-Han, Air conditioner.
  8. Oosterlaken, Theodorus; de Ridder, Chris; Jdira, Lucian, Apparatus and method for manufacturing a semiconductor device.
  9. Kamiya, Tatsuo, Apparatus and method for transporting wafers between wafer carrier and process tool under vacuum.
  10. den Hartog Besselink, Edwin; Garssen, Adriaan; Dirkmaat, Marco, Cassette holder assembly for a substrate cassette and holding member for use in such assembly.
  11. Zaitsu, Masaru; Fukazawa, Atsuki; Fukuda, Hideaki, Continuous process incorporating atomic layer etching.
  12. Mardian, Karl Anthony; Campbell, Colin David, Cover assembly for a floor drain.
  13. Raisanen, Petri; Shero, Eric; Haukka, Suvi; Milligan, Robert Brennan; Givens, Michael Eugene, Deposition of metal borides.
  14. Zhu, Chiyu; Shrestha, Kiran; Haukka, Suvi, Deposition of metal borides.
  15. Eylon, Nir Gal; Ychie, Sharon, Disposable sink strainer.
  16. Sears, Bill, Drain cover.
  17. Yousufzai, Jamal K., Drain cover assembly.
  18. Wildfang, Fabian, Flow regulator.
  19. Milligan, Robert Brennan, Formation of boron-doped titanium metal films with high work function.
  20. Hawkins, Mark; Halleck, Bradley Leonard; Kirschenheiter, Tom; Hossa, Benjamin; Pottebaum, Clay; Miskys, Claudio, Gas distribution system, reactor including the system, and methods of using the same.
  21. Shugrue, John; Moen, Ron, Lockout tagout for semiconductor vacuum valve.
  22. Mjelde, Olaf, Low profile circular drain with water stop for swimming pools.
  23. Mjelde, Olaf, Low profile pool drain with annular slot cover.
  24. Mjelde, Olaf, Low profile pool drain with circular grid cover.
  25. Jung, Sung-Hoon, Metal oxide protective layer for a semiconductor device.
  26. Pore, Viljami, Method and apparatus for filling a gap.
  27. Pore, Viljami; Knaepen, Werner; Jongbloed, Bert; Pierreux, Dieter; Van Aerde, Steven R. A.; Haukka, Suvi; Fukuzawa, Atsuki; Fukuda, Hideaki, Method and apparatus for filling a gap.
  28. Pore, Viljami; Knaepen, Werner; Jongbloed, Bert; Pierreux, Dieter; Van Der Star, Gido; Suzuki, Toshiya, Method and apparatus for filling a gap.
  29. Tolle, John; Hill, Eric; Winkler, Jereld Lee, Method and system for in situ formation of gas-phase compounds.
  30. Jung, Sung-Hoon; Raisanen, Petri; Liu, Eric Jen Cheng; Schmotzer, Mike, Method and system to reduce outgassing in a reaction chamber.
  31. Winkler, Jereld Lee, Method and systems for in-situ formation of intermediate reactive species.
  32. Suemori, Hidemi, Method for depositing dielectric film in trenches by PEALD.
  33. Kang, DongSeok, Method for depositing thin film.
  34. Takamure, Noboru; Okabe, Tatsuhiro, Method for forming Ti-containing film by PEALD using TDMAT or TDEAT.
  35. Shiba, Eiichiro, Method for forming aluminum nitride-based film by PEALD.
  36. Fukazawa, Atsuki, Method for forming conformal nitrided, oxidized, or carbonized dielectric film by atomic layer deposition.
  37. Fukazawa, Atsuki; Fukuda, Hideaki; Takamure, Noboru; Zaitsu, Masaru, Method for forming dielectric film in trenches by PEALD using H-containing gas.
  38. Kimura, Yosuke; de Roest, David, Method for forming film having low resistance and shallow junction depth.
  39. Ishikawa, Dai; Fukazawa, Atsuki, Method for forming silicon nitride film selectively on sidewalls or flat surfaces of trenches.
  40. Namba, Kunitoshi, Method for forming silicon oxide cap layer for solid state diffusion process.
  41. Shiba, Eiichiro, Method for performing uniform processing in gas system-sharing multiple reaction chambers.
  42. Yamagishi, Takayuki; Suwada, Masaei; Tanaka, Hiroyuki, Method for positioning wafers in multiple wafer transport.
  43. Kato, Richika; Nakano, Ryu, Method for protecting layer by forming hydrocarbon-based extremely thin film.
  44. Kato, Richika; Okuro, Seiji; Namba, Kunitoshi; Nonaka, Yuya; Nakano, Akinori, Method for protecting layer by forming hydrocarbon-based extremely thin film.
  45. Zaitsu, Masaru, Method of atomic layer etching using functional group-containing fluorocarbon.
  46. Zaitsu, Masaru; Kobayashi, Nobuyoshi; Kobayashi, Akiko; Hori, Masaru; Kondo, Hiroki; Tsutsumi, Takayoshi, Method of cyclic dry etching using etchant film.
  47. Knaepen, Werner; Maes, Jan Willem; Jongbloed, Bert; Kachel, Krzysztof Kamil; Pierreux, Dieter; De Roest, David Kurt, Method of forming a structure on a substrate.
  48. Lee, Choong Man; Yoo, Yong Min; Kim, Young Jae; Chun, Seung Ju; Kim, Sun Ja, Method of forming metal interconnection and method of fabricating semiconductor apparatus using the method.
  49. Chun, Seung Ju; Yoo, Yong Min; Choi, Jong Wan; Kim, Young Jae; Kim, Sun Ja; Lim, Wan Gyu; Min, Yoon Ki; Lee, Hae Jin; Yoo, Tae Hee, Method of processing a substrate and a device manufactured by using the method.
  50. Kohen, David; Profijt, Harald Benjamin, Methods for depositing a doped germanium tin semiconductor and related semiconductor device structures.
  51. Raisanen, Petri; Givens, Michael Eugene, Methods for forming a transition metal nitride film on a substrate by atomic layer deposition and related semiconductor device structures.
  52. Margetis, Joe; Tolle, John, Methods of forming highly p-type doped germanium tin films and structures and devices including the films.
  53. Margetis, Joe; Tolle, John, Methods of forming silicon germanium tin films and structures and devices including the films.
  54. Zhu, Chiyu; Asikainen, Timo; Milligan, Robert Brennan, NbMC layers.
  55. Eylon, Nir Gal; Ychie, Sharon, Plug for a bathtub.
  56. Pettinger, Fred; White, Carl; Marquardt, Dave; Ibrani, Sokol; Shero, Eric; Dunn, Todd; Fondurulia, Kyle; Halpin, Mike, Process feed management for semiconductor substrate processing.
  57. Margetis, Joe; Tolle, John; Bartlett, Gregory; Bhargava, Nupur, Process for forming a film on a substrate using multi-port injection assemblies.
  58. Alokozai, Fred; Milligan, Robert Brennan, Process gas management for an inductively-coupled plasma deposition reactor.
  59. Alokozai, Fred; Milligan, Robert Brennan, Process gas management for an inductively-coupled plasma deposition reactor.
  60. Winkler, Jereld Lee, Pulsed remote plasma method and system.
  61. Zhu, Chiyu, Selective film deposition method to form air gaps.
  62. Kim, Young Jae; Choi, Seung Woo; Yoo, Yong Min, Semiconductor device and manufacturing method thereof.
  63. Shero, Eric; Verghese, Mohith E.; White, Carl L.; Terhorst, Herbert; Maurice, Dan, Semiconductor processing reactor and components thereof.
  64. Milligan, Robert Brennan; Alokozai, Fred, Semiconductor reaction chamber with plasma capabilities.
  65. Ikedo, Yozo; Hisamitsu, Takafumi, Shower plate.
  66. Sato, Kazuo, Shower plate.
  67. Yamagishi, Takayuki; Sato, Kazuo; Tsuji, Naoto, Shower plate.
  68. Yamagishi, Takayuki; Sato, Kazuo; Tsuji, Naoto, Shower plate.
  69. Yamagishi, Takayuki; Sato, Kazuo; Tsuji, Naoto, Shower plate.
  70. Yamagishi, Takayuki; Tsuji, Naoto; Sato, Kazuo, Shower plate.
  71. Yamagishi, Takayuki; Tsuji, Naoto; Sato, Kazuo, Shower plate.
  72. Arai, Izumi, Single-and dual-chamber module-attachable wafer-handling chamber.
  73. Lee, I-Chiun, Sink strainer.
  74. Seehoff, Gary Stanley; Anzalone, Christopher, Sink strainer.
  75. Xie, Qi; de Roest, David; Woodruff, Jacob; Givens, Michael Eugene; Maes, Jan Willem; Blanquart, Timothee, Source/drain performance through conformal solid state doping.
  76. Ychie, Sharon; Eylon, Nir, Strainer for a bathtub drain.
  77. Weeks, Keith Doran, Structures and devices including a tensile-stressed silicon arsenic layer and methods of forming same.
  78. Tolle, John, Structures and devices including germanium-tin films and methods of forming same.
  79. Geldenhuys, Siegfried; Buitendag, Marthinus Jacobus, Suction cover.
  80. Jeong, Sang Jin; Han, Jeung Hoon; Choi, Young Seok; Park, Ju Hyuk, Susceptor for semiconductor substrate processing apparatus.
  81. Tang, Fu; Givens, Michael Eugene; Xie, Qi; Raisanen, Petri, System and method for gas-phase sulfur passivation of a semiconductor surface.
  82. Lawson, Keith R.; Givens, Michael E., Systems and methods for dynamic semiconductor process scheduling.
  83. Yamagishi, Takayuki; Sato, Kazuo; Tsuji, Naoto, Top plate.
  84. Yamagishi, Takayuki; Sato, Kazuo; Tsuji, Naoto, Top plate.
  85. Coomer, Stephen Dale, Variable adjustment for precise matching of multiple chamber cavity housings.
  86. Shugrue, John Kevin, Variable conductance gas distribution apparatus and method.
  87. Schmotzer, Michael; Whaley, Shawn, Variable gap hard stop design.
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