System and method for extracting headspace vapor
원문보기
IPC분류정보
국가/구분
United States(US) Patent
등록
국제특허분류(IPC7판)
G01N-030/24
G01N-001/22
G01N-035/10
G01N-030/02
G01N-030/08
출원번호
UP-0251310
(2005-10-14)
등록번호
US-7709267
(2010-06-03)
발명자
/ 주소
Tipler, Andrew
Mazza, Christopher
출원인 / 주소
PerkinElmer LAS, Inc.
대리인 / 주소
St. Onge Stewart Johnston & Reens LLC
인용정보
피인용 횟수 :
12인용 특허 :
19
초록▼
A system and method for extracting headspace vapor is generally disclosed comprising pressurizing a vessel containing headspace vapor with a carrier gas and subsequently venting the sample mixture through an adsorbent trap and out a vent. A flow controller is employed to gradually increase the flow
A system and method for extracting headspace vapor is generally disclosed comprising pressurizing a vessel containing headspace vapor with a carrier gas and subsequently venting the sample mixture through an adsorbent trap and out a vent. A flow controller is employed to gradually increase the flow therethrough as the pressure drops as a result of the gradual depletion of headspace vapor in the vessel and, in certain embodiments, the flow controller maintains a constant flow rate. Due to the time saved, in some embodiments, multiple pressurization-venting cycles are implemented to maximize the amount of vapor extracted from the vial. Due to the constant flow rate, in certain embodiments, the pressure decay is monitored and compared to reference values in order to determine whether the sample vessel has a leak or other defect.
대표청구항▼
What is claimed is: 1. A method of extracting headspace vapor, the method comprising the steps of: providing a vessel holding headspace vapor containing analytes to be measured; inserting a receptacle into the vessel; pressurizing the vessel by communicating carrier gas from a carrier gas inlet thr
What is claimed is: 1. A method of extracting headspace vapor, the method comprising the steps of: providing a vessel holding headspace vapor containing analytes to be measured; inserting a receptacle into the vessel; pressurizing the vessel by communicating carrier gas from a carrier gas inlet through the receptacle and into the vessel; venting the headspace vapor and carrier gas in the vessel through an adsorbent, which adsorbs analytes in the headspace vapor, and out a vent; and controlling the flow of the carrier gas and headspace vapor as they are vented such that the rate of flow is controlled to counter at least some of a decrease in pressure due to the depletion of headspace vapor in the vessel. 2. A method as claimed in claim 1, wherein the step of venting the headspace vapor and carrier gas comprises closing the carrier gas inlet. 3. A method as claimed in claim 1, further comprising the step of desorbing the analytes adsorbed by the adsorbent. 4. A method as claimed in claim 3, further comprising the step of purging the adsorbent of moisture by venting additional carrier gas through the adsorbent and out the vent prior to the step of desorbing the analytes. 5. A method as claimed in claim 1, wherein the step of controlling the flow comprises increasing the flow through a flow controller. 6. A method as claimed in claim 1, wherein the step of controlling the flow comprises maintaining a constant flow rate. 7. A method as claimed in claim 1, further comprising repeating the steps of pressurizing and venting a predetermined number of times. 8. A method as claimed in claim 7, wherein the steps of pressurizing and venting comprise a pressurization-venting cycle, the method further comprising the step of: determining the total number of pressurization-venting cycles to be performed; and wherein the predetermined number of times the steps of pressurizing and venting are repeated is one less than the determined total number of pressurization-venting cycles to be performed. 9. A method as claimed in claim 8, wherein the step of determining the total number of pressurization-venting cycles to be performed comprises the steps of: determining a percentage of the original headspace vapor to remain in the vessel as residual vapor; and calculating the number of pressurization-venting cycles required to extract enough of the original headspace vapor from the vessel such that the percentage of original headspace vapor remaining in the vessel after performing the calculated number of pressurization-venting cycles does not exceed the determined percentage. 10. A method as claimed in claim 9, wherein the number of pressurization-venting cycles required is calculated according to the equation: n = Int [ log ( ( 100 - R ) 100 ) log ( P lo P hi ) + 0.5 ] . 11. A method as claimed in claim 1, further comprising the step of monitoring the pressure in the vessel as the carrier gas carrying the headspace vapor is vented through the adsorbent and the vent to determine the rate of pressure decay in the monitored vessel. 12. A method as claimed in claim 11, further comprising the steps of: measuring the rate of pressure decay in a reference vessel to determine the rate of pressure decay therein; comparing the rate of pressure decay in the monitored vessel to the rate of pressure decay in the reference vessel to determine if the monitored vessel is defective. 13. A system for extracting headspace vapor, comprising: a vessel for holding headspace vapor containing analytes to be measured; a receptacle adapted to be inserted and withdrawn from said vessel, said receptacle having a vessel port; a carrier gas inlet for supplying carrier gas to pressurize said vessel and to carry the headspace vapor; an adsorbent housing in fluid communication with said carrier gas inlet, said adsorbent housing having an adsorbent disposed therein for adsorbing the analytes in the carrier gas carrying the headspace vapor; a vent in fluid communication with said adsorbent housing for venting the carrier gas carrying the headspace vapor; wherein, when the vessel port of said receptacle is in fluid communication with said vessel and said carrier gas inlet is open, carrier gas flows into and pressurizes said vessel; wherein, when the vessel port of said receptacle is in fluid communication with said vessel and said carrier gas inlet is closed, the headspace vapor and carrier gas flow into said adsorbent housing and are vented through said vent; and a flow controller in fluid communication with said adsorbent housing and said vent for controlling the rate of flow of the carrier gas and headspace vapor to counter at least some of a decrease in pressure due to depletion of the headspace vapor in said vessel. 14. A system as claimed in claim 13, wherein said flow controller is configured to increase the flow therethrough. 15. A system as claimed in claim 13, wherein said flow controller is configured to maintain a constant flow rate. 16. A system as claimed in claim 13, wherein said flow controller comprises a forward pressure regulator. 17. A system as claimed in claim 13, wherein said flow controller comprises a mass flow controller. 18. A system as claimed in claim 13, wherein said flow controller comprises an electronic flow controller. 19. A system as claimed in claim 13, further comprising a processor, wherein: the pressurization of said vessel and the venting of the headspace vapor and carrier gas through said vent comprise a pressurization-venting cycle; said processor is configured to receive data reflecting a number of pressurization-venting cycles; and said processor is configured to generate a signal causing the number of pressurization-venting cycles to be performed. 20. A system as claimed in claim 13, further comprising a processor, wherein: the pressurization of said vessel and the venting of the headspace vapor and carrier gas through said vent comprise a pressurization-venting cycle; said processor is configured to receive data reflecting a maximum percentage of the original headspace vapor in the vessel to remain as residual vapor; said processor is configured to calculate a number of pressurization-venting cycles required to extract enough headspace vapor from said vessel so as not to exceed the maximum percentage; and said processor is configured to generate a signal causing the calculated number of pressurization-venting cycles to be performed. 21. A system as claimed in claim 20, wherein said processor is configured to calculate the number of pressurization-venting cycles according to the equation: n = Int [ log ( ( 100 - R ) 100 ) log ( P lo P hi ) + 0.5 ] . 22. A system as claimed in claim 13, further comprising a gauge for monitoring the pressure in said vessel as headspace vapor flows out of said vessel. 23. A system as claimed in claim 22, wherein said gauge comprises a pressure transducer. 24. A method as claimed in claim 22, further comprising a memory for storing the rate of pressure decay in a reference vessel for later comparison with the rate of pressure decay in the monitored vessel to determine if the monitored vessel is defective. 25. A system as claimed in claim 13, wherein said adsorbent comprises carbon black. 26. A system as claimed in claim 13, wherein said adsorbent comprises a polymeric adsorbent. 27. A system as claimed in claim 13, wherein said adsorbent comprises a carbon molecular sieve.
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이 특허에 인용된 특허 (19)
Tipler, Andrew; Campbell, Gary; Collins, Mark, Analyte pre-concentrator for gas chromatography.
Augenblick Kurt B. (Wilmington DE) Crilly Paul B. (Knoxville TN) Engel Steven J. (Kennett Square PA) Fogelman Kimber D. (Hockessin DE), Headspace sampling system.
Pieters Wim J.M. (Morristown NJ) Gates William E. (Somerset NJ), Method and apparatus for determining the amount of gas adsorbed or desorbed from a solid.
Bushey, Jared M; Henderson, Robert C; Wilson, William H, Methods, devices, and systems for controlling the rate of gas depressurization within a vial containing a gas sample.
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