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A distributed aperture sensor system and sensing method comprising a plurality of sensors each having an aperture and window that provides electromagnetic interference shielding by a material with a bulk resistivity of less than or approximately equal to 10 ohm-cm that is substantially uniform throu

A distributed aperture sensor system and sensing method comprising a plurality of sensors each having an aperture and window that provides electromagnetic interference shielding by a material with a bulk resistivity of less than or approximately equal to 10 ohm-cm that is substantially uniform throughout the window.

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What is claimed is: 1. A distributed aperture sensor system comprising: a plurality of manufactured sensors, each having an aperture and each having a corresponding window that provides electromagnetic interference shielding by having a bulk resistivity less than or approximately equal to 10 ohm-cm

What is claimed is: 1. A distributed aperture sensor system comprising: a plurality of manufactured sensors, each having an aperture and each having a corresponding window that provides electromagnetic interference shielding by having a bulk resistivity less than or approximately equal to 10 ohm-cm which bulk resistivity is substantially uniform throughout. 2. The sensor system of claim 1 wherein each said window lacks an epitaxial layer. 3. The sensor system of claim 1 wherein each of said plurality of sensors is an electro optical sensor. 4. The sensor system of claim 1 wherein said bulk resistivity is less than or equal to approximately 5 ohm-cm. 5. The sensor system of claim 4 wherein each said window is approximately 0.25″ thick. 6. The sensor system of claim 1 wherein each said window comprises silicon. 7. The sensor system of claim 1 wherein each of said plurality of sensors is an infrared sensor. 8. A sensing method comprising: employing in a manufactured distributed aperture sensor system a plurality of windows that provide electromagnetic interference shielding by having a bulk resistivity of less than or approximately equal to 10 ohm-cm, which bulk resistivity is substantially uniform throughout each window; and sensing electromagnetic radiation through the windows with a plurality of corresponding sensors. 9. The method of claim 8 wherein each window lacks an epitaxial layer. 10. The method of claim 8 wherein the distributed aperture sensor system is an electro optical system. 11. The method of claim 8 wherein the bulk resistivity is less than or equal to approximately 5 ohm-cm. 12. The method of claim 11 wherein each window is approximately 0.25″ thick. 13. The method of claim 8 wherein each window comprises silicon. 14. The method of claim 8 wherein in the employing step the distributed aperture sensor system is an infrared sensor system. 15. In a manufactured sensor system comprising a window which comprises electromagnetic shielding properties, the improvement comprising said window having electromagnetic shielding properties by having a bulk resistivity of less than or approximately equal to 10 ohm-cm which bulk resistivity is substantially uniform throughout said window. 16. The sensor system of claim 15 wherein in the bulk resistivity is less than or equal to approximately 5 ohm-cm. 17. The sensor system of claim 16 wherein said window is approximately 0.25″ thick. 18. The sensor system of claim 15 wherein said window comprises silicon.