초록 ▼

Techniques of the present invention are directed to distribution of deposition gases onto a substrate. In one embodiment, a gas distributor for use in a processing chamber is provided. The gas distributor includes a body having a gas deflecting surface and a gas distributor face. The gas deflecting

Techniques of the present invention are directed to distribution of deposition gases onto a substrate. In one embodiment, a gas distributor for use in a processing chamber is provided. The gas distributor includes a body having a gas deflecting surface and a gas distributor face. The gas deflecting surface defines a cleaning gas pathway. The gas distributor face is disposed on an opposite side of the body from the gas deflecting surface and faces toward a substrate support member. The gas distributor face includes a raised step and at least one set of apertures through the raised step. The at least one set of apertures are adapted to distribute a deposition gas over a substrate positioned on the substrate support member.

대표청구항 ▼

What is claimed is: 1. A gas distributor for use in a processing chamber, the gas distributor comprising: a body having a threaded section configured to be coupled with a gas supply, the body also having a distal face and a central section extending between the threaded section and the distal face,

What is claimed is: 1. A gas distributor for use in a processing chamber, the gas distributor comprising: a body having a threaded section configured to be coupled with a gas supply, the body also having a distal face and a central section extending between the threaded section and the distal face, the body further including a gas inlet, a plurality of gas outlets and a gas passage extending through the threaded section and the central section connecting the gas inlet to the plurality of gas outlets, the body further including a lateral seat disposed between the threaded section and the central section, the lateral seat extending outward from the body to an outer periphery of the lateral seat, wherein the central section includes a concavely curved gas deflecting surface extending from the outer periphery of the lateral seat outward from the body and toward the distal face, and wherein the distal face includes a continuous surface having a central flat portion and a recessed peripheral flat portion separated from the central flat portion by an inclined step surface, wherein the central flat portion extends radially from a center of the distal face to the inclined step surface and has a diameter of between about 0.01 to 3 inches, and the recessed peripheral flat portion is recessed relative to the central flat portion and the plurality of gas outlets are disposed in the inclined step surface. 2. The gas distributor of claim 1 wherein the gas distributor is a single piece. 3. The gas distributor of claim 1 wherein the gas distributor comprises at least one of aluminum oxide, aluminum nitride, sapphire and silicon carbide. 4. The gas distributor of claim 1 wherein the inclined step surface forms a circle on the distal face, and the plurality of gas outlets are evenly distributed around the inclined step surface. 5. The gas distributor of claim 1 wherein the plurality of gas outlets and the inclined step surface are sloped at about the same angle. 6. The gas distributor of claim 1 wherein the concavely curved gas deflecting surface is curved to direct a cleaning gas towards a wall of the processing chamber. 7. The gas distributor of claim 1 wherein the concavely curved gas deflecting surface is curved to divert a cleaning gas away from a substrate support member. 8. The gas distributor of claim 1 wherein a slope of the inclined step surface is in a range of about 90 degrees to about 180 degrees. 9. The gas distributor of claim 1 wherein each of the plurality of gas outlets are in a range of about 90 degrees to about 20 degrees to a riser. 10. The gas distributor of claim 1 further comprising at least one clean gas passageway extending between the concavely curved gas deflecting surface and the distal face. 11. The gas distributor of claim 1 wherein the plurality of gas outlets includes at least eight apertures. 12. The gas distributor of claim 1 further comprising a second inclined step surface and at least a second plurality of gas outlets through the second inclined step surface. 13. A substrate processing chamber, the chamber comprising: an enclosure having a ceiling and a sidewall; a substrate support capable of supporting a substrate; a gas distributor positioned centrally above and extending towards the substrate support from the ceiling, the gas distributor comprising a body having a threaded section configured to be coupled with a gas supply, the body also having a distal face and a central section extending between the threaded section and distal face, the body further including a gas inlet, a plurality of gas outlets and a gas passage extending through the threaded section and the central section connecting the gas inlet to the plurality of gas outlets, the body further including a lateral seat disposed between the threaded section and the central section, the lateral seat extending outward from the body to an outer periphery of the lateral seat, wherein the central section includes a concavely curved gas deflecting surface extending from the outer periphery of the lateral seat outward from the body and toward the distal face, and wherein the distal face includes a continuous surface having a central flat portion and a recessed peripheral flat portion separated from the central flat portion by an inclined step surface, wherein the central flat portion extends radially from a center of the distal face to the inclined step surface and has a diameter of between about 0.01 to 3 inches, and the recessed peripheral flat portion is recessed relative to the central flat portion and the plurality of gas outlets are disposed in the inclined step surface. 14. The substrate processing chamber of claim 13 further comprising a top vent disposed around a portion of the body and defining an annular gas passageway adapted to direct gas towards the concavely curved gas deflecting surface. 15. The substrate processing chamber of claim 13 wherein the gas distributor is a single piece. 16. The substrate processing chamber of claim 13 wherein the gas distributor comprises at least one of aluminum oxide or aluminum nitride. 17. The substrate processing chamber of claim 13 wherein the inclined step surface forms a circle on the distal face, and the plurality of gas outlets are evenly distributed around the inclined step surface. 18. The substrate processing chamber of claim 13 wherein the plurality of gas outlets and the inclined step surface are sloped at about the same angle. 19. The substrate processing chamber of claim 13 wherein the concavely curved gas deflecting surface is curved to direct a cleaning gas towards the sidewall of the chamber. 20. The substrate processing chamber of claim 13 wherein the concavely curved gas deflecting surface is curved to divert a cleaning gas away from the substrate support. 21. The substrate processing chamber of claim 13 wherein a slope of the inclined step surface is in a range of about 90 degrees to about 180 degrees. 22. The substrate processing chamber of claim 13 wherein each of the plurality of gas outlets are in a range of about 90 degrees to about 15 degrees to a riser. 23. The substrate processing chamber of claim 13 further comprising at least one clean gas passageway extending between the concavely curved gas deflecting surface and the distal face. 24. The substrate processing chamber of claim 13 wherein the plurality of gas outlets includes at least eight apertures. 25. The substrate processing chamber of claim 13 wherein the gas distributor further comprises a second inclined step surface and at least a second plurality of gas outlets through the second inclined step surface. 26. The gas distributor of claim 1 wherein the central flat portion is substantially parallel to the recessed peripheral flat portion. 27. The gas distributor of claim 1 wherein the central flat portion is disposed distally from the recessed peripheral flat portion. 28. The substrate processing chamber of claim 13 further comprising a plurality of gas nozzles positioned along the circumference of the sidewall and surrounding the substrate support, the gas nozzles adapted to flow gas inward toward the substrate support. 29. A gas distributor comprising: a body having a threaded section with a first diameter, the body also having a distal face and a central section extending between the threaded section and the distal face, the body further including a gas inlet, a plurality of gas outlets, and a gas passage extending through the threaded section and the central section connecting the gas inlet to the plurality of gas outlets, the body further including a lateral seat disposed between the threaded section and the central section, the lateral seat extending outward from the body to an outer periphery of the lateral seat, wherein the central section includes a concavely curved gas deflecting surface extending from the outer periphery of the lateral seat outward from the body and toward the distal face, and wherein the distal face includes a continuous surface having a central flat portion and a recessed peripheral flat portion separated from the central flat portion by an inclined step surface, wherein the central flat portion extends radially from a center of the distal face to the inclined step surface, the central flat portion having a second diameter greater than the first diameter, and the recessed peripheral flat portion is recessed relative to the central flat portion and the plurality of gas outlets are disposed on the inclined step surface.