Hard surface cleaner with extended residual cleaning benefit
원문보기
IPC분류정보
국가/구분
United States(US) Patent
등록
국제특허분류(IPC7판)
C11D-003/37
C11D-001/68
C11D-003/43
C11D-007/08
출원번호
UP-0889542
(2007-08-14)
등록번호
US-7741265
(2010-07-12)
발명자
/ 주소
Iverson, Robert D.
Randall, Francis J.
Avery, Richard W.
Wietfeldt, John R.
Taneja, Ashish
Ouattara, Tantiboro S.
출원인 / 주소
S.C. Johnson & Son, Inc.
인용정보
피인용 횟수 :
4인용 특허 :
61
초록▼
A cleaning composition for a hard surface is disclosed which provides for initial cleaning of the hard surface and provision of a hydrophilic coating or barrier layer on the surface which provides residual cleaning to the hard surface for an extended number of rinsings. The composition includes a hy
A cleaning composition for a hard surface is disclosed which provides for initial cleaning of the hard surface and provision of a hydrophilic coating or barrier layer on the surface which provides residual cleaning to the hard surface for an extended number of rinsings. The composition includes a hydrophilic polymer, at least one nonionic surfactant, at least one solvent, an acid and water, wherein the acid provides the composition with a pH of about 2 to 3.5 and the composition is provided in the absence of any anionic, cationic or amphoteric surfactant.
대표청구항▼
The invention claimed is: 1. A hard surface cleaning composition consisting of (a) about 0.05 to about 1 wt. % based on actives of a hydrophilic polymer comprising (1) an acidic monomer having or capable of forming an anionic charge, (2) a monomer having a permanent cationic charge or is capable of
The invention claimed is: 1. A hard surface cleaning composition consisting of (a) about 0.05 to about 1 wt. % based on actives of a hydrophilic polymer comprising (1) an acidic monomer having or capable of forming an anionic charge, (2) a monomer having a permanent cationic charge or is capable of forming a cationic charge upon protonation, and (3) optionally, a monomer having a neutral charge; (b) about 1.5 to about 5 wt. % of at least one nonionic surfactant, said at least one nonionic surfactant including at least one alkoxylated alcohol and said at least one alkoxylated alcohol is present in relation to said polymer based on wt. % in a ratio of 7:1 to 25:1; (c) about 1 to about 4 wt. % of at least one solvent; (d) at least one acid in an amount sufficient to provide said cleaning composition with an acidic pH in a range of about 2 to about 3.5; (e) a balance of water; wherein said cleaning composition is provided in absence of any anionic, cationic or amphoteric surfactant. 2. The cleaning composition of claim 1, wherein said at least one alkoxylated alcohol is present in relation to said polymer based on wt. % in a ratio of 17:1. 3. The cleaning composition of claim 1, wherein said acidic pH is from about 2.5 to about 3. 4. The cleaning composition of claim 1, wherein said acidic pH is from about 2.5 to about 2.65. 5. The cleaning composition of claim 1, wherein said hydrophilic polymer is a quaternized ammonium acrylamide acrylic acid copolymer. 6. The cleaning composition of claim 1, wherein said hydrophilic polymer is diallyl dimethyl ammonium acrylamide acrylic acid copolymer. 7. The cleaning composition of claim 1, wherein said polymer is present in an amount of about 0.1 to about 0.4 wt. % based on actives. 8. The cleaning composition of claim 5, wherein said polymer is present in an amount of about 0.1 to about 0.4 wt. % based on actives. 9. The cleaning composition according to claim 1, wherein said polymer is present in an amount of about 0.13 to about 0.16 wt. % based on actives. 10. The cleaning composition according to claim 5, wherein said polymer is present in an amount of about 0.13 to about 0.16 wt. % based on actives. 11. The cleaning composition of claim 1, wherein said at least one solvent is at least one mono-, di- or tri-alkylene glycol ether or diether. 12. The cleaning composition of claim 11, wherein said at least one alkylene glycol ether or diether has 4 to 14 carbon atoms. 13. The cleaning composition of claim 1, wherein said at least one nonionic surfactant further includes an alkyl polyglycoside. 14. The cleaning composition of claim 1, wherein said at least one nonionic surfactant further includes a secondary ethoxylated alcohol. 15. The cleaning composition of claim 13, wherein said at least one nonionic surfactant further includes a secondary ethoxylated alcohol. 16. The cleaning composition of claim 1, wherein said at least one alkoxylated alcohol is an ethoxylated C10 Guerbet alcohol having an HLB of about 10 to about 15. 17. The cleaning composition of claim 1, wherein said composition provides to a hard surface a continuous lateral heterogeneous film following coating said hard surface with said cleaning composition. 18. The cleaning composition of claim 1, wherein said polymer and said at least one alkoxylated alcohol are present in amounts relative to each other to provide an average contact angle of less than 30 following 30 rinses, where contact angle is measured according to Test B. 19. A hard surface cleaning composition comprising (1) from about 0.05 to about 1 wt. % based on actives of an aqueous solution of an acrylic acid-based amine-functional polymer comprising a first monomer having or being capable of forming an anionic charge, a second monomer having or being capable of forming a cationic charge, and optionally a third monomer having a neutral charge; (2) at least one acid in an amount sufficient to provide a pH of 2 to 3.5 to the composition; (3) from about 1.5 to about 5 wt. % of a first nonionic surfactant comprising a C10-15 alcohol ethoxylate having 6-8 ethylene oxide groups and an HLB in a range from about 10 to about 15; (4) from 0 to about 3 wt. % of a second nonionic surfactant comprising an alkyl polyglycoside; (5) from 0 to about 1 wt. % of a third nonionic surfactant comprising a C11-15 secondary ethoxylated alcohol; (6) from about 1 to about 4 wt. % of at least one alkylene ether solvent; and (7) a balance of water, wherein when more than one nonionic surfactant is present, combined amounts present of the first nonionic surfactant, the second nonionic surfactant and the third nonionic surfactant is not greater than about 5 wt. %; said polymer is present in relation to said first nonionic surfactant based on wt. % in a ratio of 7:1 to 25:1; application of said composition to a hard surface provides on said hard surface a hydrophilic film, said film remaining at least partially on said surface and providing said surface with resistance to soiling through a plurality of rinsings with a liquid of a neutral pH; and said composition is provided in absence of any anionic, cationic or amphoteric surfactant. 20. A hard surface cleaning composition comprising (a) about 0.05 to about 1 wt. % based on actives of a hydrophilic polymer comprising a quaternized ammonium acrylamide acrylic acid copolymer; (b) about 1.5 to about 5 wt. % of a nonionic water-soluble ethoxylated C10 Guerbet alcohol with 7 ethylene oxide groups and said at least one alkoxylated alcohol is present in relation to said polymer based on wt. % in a ratio of 7:1 to 25:1; (c) about 1 to about 3 wt. % of an alkyl polyglycoside; (d) about 1 to about 4 wt. % of at least one mono-, di- or tri-alkylene glycol ether solvent; (e) at least one acid in an amount sufficient to provide said cleaning composition with an acidic pH in a range of from about 2 to about 3.5; and (f) a balance of water; wherein said cleaning composition is provided in absence of any anionic, cationic or amphoteric surfactant. 21. The cleaning composition of claim 20, wherein said copolymer is a diallyl dimethyl ammonium acrylamide acrylic acid copolymer. 22. The cleaning composition of claim 20, wherein said copolymer is present in an amount of about 0.1 to about 0.4 wt. % based on actives. 23. The cleaning composition of claim 20, wherein said copolymer is present in an amount of about 0.15 wt. % based on actives. 24. A hard surface cleaning composition comprising (a) about 0.15 wt. % based on actives of a hydrophilic polymer comprising a quaternized ammonium acrylamide acrylic acid copolymer; (b) about 2.5 to about 3 wt. % of an ethoxylated C10 Guerbet alcohol with 7 ethylene oxide groups and an HLB of about 12.5 to about 13; (c) about 1 to about 4 wt. % of at least one mono-, di- or tri-alkylene glycol ether solvent; (d) at least one acid in an amount sufficient to provide said composition with a pH in a range of about 2 to about 3.5; (e) a balance of water; wherein said cleaning composition is provided in absence of any anionic, cationic or amphoteric surfactant.
Cook William J. (New York NY) Wisniewski Karen L. (Bound Brook NJ) Dixit Nagaraj S. (Plainsboro NJ) Rao Nandakumar S. (Hockessin DE), Acidic disinfectant all-purpose liquid cleaning composition.
Majeti,Satyanarayana; Reno,Elizabeth Ann Brown; Kovacs,Stephen Andras, Compositions comprising anionic functionalized polyorganosiloxanes for hydrophobically modifying surfaces and enhancing delivery of active agents to surfaces treated therewith.
Woo Ricky A. (Hamilton OH) Cobb Daniel S. (Loveland OH) Velazquez Jesus (Cincinnati OH) O\Leary Janet L. (Cincinnati OH), Foam liquid hard surface detergent composition.
Masters Ronald A. (Loveland OH) Maile Michael S. (Maineville OH), Glass cleaner compositions having good filming/streaking characteristics and substantive modifier to provide long lastin.
Sherry, Alan Edward; Policicchio, Nicola John; Cella, Cynthia Elaine; Flora, Jeffrey Lawrence; Trinh, Toan; Morelli, Joseph Paul, HARD SURFACE CLEANING COMPOSITIONS, PREMOISTENED WIPES, METHODS OF USE, AND ARTICLES COMPRISING SAID COMPOSITIONS OR WIPES AND INSTRUCTIONS FOR USE RESULTING IN EASIER CLEANING AND MAINTENANCE, IMPRO.
Klinkhammer, Michael E.; Valpey, III, Richard S.; Thalmann, Brandon R.; Jones, Mathew A.; Tsibouklis, John; Stone, Maureen J.; Avery, Richard W., Hard surface cleaners which provide improved fragrance retention properties to hard surfaces.
Maria G. Ochomogo ; Martha J. Adair ; Sheila E. Ali ; Leslie E. Finn ; David Peterson ; Gregory M. Piche ; Gregory Van Buskirk, Method for eliminating malodors.
Haerer Juergen,DEX ; Jeschke Peter,DEX ; Schmid Karl,DEX ; Koren Karin,DEX, Mixtures of nonionic ethers for use as rinse aids and/or cleaning hard surfaces.
Gopalkrishnan Sridhar (Woodhaven MI) Sherman John V. (Allen Park MI) Guiney Kathleen M. (Wyandotte MI) Durocher David T. (Westland MI) Welch Michael C. (Woodhaven MI), Stable, aqueous concentrated liquid detergent compositions containing hydrophilic copolymers.
Urfer Allen D. ; Lazarowitz Virginia ; Bator Patricia E. ; Salka Barry A. ; Aleksejczyk Robert A., Viscosity-adjusted surfactant concentrate compositions.
Zhang, Yifan; Jing, Naiyong, Aqueous composition suitable for cleaning and protection comprising silica nanoparticles, copolymer of acrylamide and acrylic acid, nonionic and anionic surfactant.
Iverson, Robert D.; Randall, Francis J.; Avery, Richard W.; Wietfeldt, John R.; Taneja, Ashish; Ouattara, Tantiboro S., Hard surface cleaner with extended residual cleaning benefit.
※ AI-Helper는 부적절한 답변을 할 수 있습니다.