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Hard surface cleaner with extended residual cleaning benefit 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • C11D-003/37
  • C11D-001/68
  • C11D-003/43
  • C11D-007/08
출원번호 UP-0889542 (2007-08-14)
등록번호 US-7741265 (2010-07-12)
발명자 / 주소
  • Iverson, Robert D.
  • Randall, Francis J.
  • Avery, Richard W.
  • Wietfeldt, John R.
  • Taneja, Ashish
  • Ouattara, Tantiboro S.
출원인 / 주소
  • S.C. Johnson & Son, Inc.
인용정보 피인용 횟수 : 4  인용 특허 : 61

초록

A cleaning composition for a hard surface is disclosed which provides for initial cleaning of the hard surface and provision of a hydrophilic coating or barrier layer on the surface which provides residual cleaning to the hard surface for an extended number of rinsings. The composition includes a hy

대표청구항

The invention claimed is: 1. A hard surface cleaning composition consisting of (a) about 0.05 to about 1 wt. % based on actives of a hydrophilic polymer comprising (1) an acidic monomer having or capable of forming an anionic charge, (2) a monomer having a permanent cationic charge or is capable of

이 특허에 인용된 특허 (61)

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  18. Ebbeler Robert E. (Cincinnati OH), Cleaner for anti-graffiti system.
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이 특허를 인용한 특허 (4)

  1. Zhang, Yifan; Jing, Naiyong, Aqueous composition suitable for cleaning and protection comprising silica nanoparticles, copolymer of acrylamide and acrylic acid, nonionic and anionic surfactant.
  2. Diet, Patrick; Gillis, Marcel, Cleaning composition.
  3. Blattner, Amanda Ruth; Hodge, Charles Allen; Dahlquist, Erin Jane; Levitt, Mark Dennis, Cleaning composition with surface modification polymer.
  4. Iverson, Robert D.; Randall, Francis J.; Avery, Richard W.; Wietfeldt, John R.; Taneja, Ashish; Ouattara, Tantiboro S., Hard surface cleaner with extended residual cleaning benefit.
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