초록 ▼

Provided is an apparatus for substrate processing. The apparatus may include a radiation source emitting a photonic beam, an optical system to form a beam image, a scanning stage, a temperature monitoring means, an output signal generator that compares the monitored temperature with a preset tempera

Provided is an apparatus for substrate processing. The apparatus may include a radiation source emitting a photonic beam, an optical system to form a beam image, a scanning stage, a temperature monitoring means, an output signal generator that compares the monitored temperature with a preset temperature, and a controller coupled to the radiation source and the stage. The stage may be adapted to scan the substrate so the beam image heats a region of the substrate surface, and the temperature monitoring means may collect and analyzes p-polarized radiation of at least three different spectral regions emitted from one or more places on the heated substrate region. The controller in response to a temperature error signal may be programmed to alter the beam intensity and/or to provide changes in the scanning velocity between the stage and the beam. Other apparatuses and temperature monitoring systems are provided as well.

대표청구항 ▼

What is claimed is: 1. An apparatus for processing a substrate at a desired maximum temperature, comprising: a radiation source adapted to emit a photonic beam of a beam intensity; an optical system adapted to form from the beam an image on a substrate at an incident angle of at least 45°; a s

What is claimed is: 1. An apparatus for processing a substrate at a desired maximum temperature, comprising: a radiation source adapted to emit a photonic beam of a beam intensity; an optical system adapted to form from the beam an image on a substrate at an incident angle of at least 45°; a stage adapted to scan the substrate across the beam image to heat the substrate surface; a temperature monitoring means for analyzing p-polarized radiation of at least three different wavelengths emitted from a substrate location containing the beam image to generate a probable maximum temperature value at the imaged location; an output error signal generator that compares the probable maximum temperature value with a preset desired maximum temperature to generate an output error signal; and a controller operably coupled to the radiation source and the stage, wherein the controller in response to the output error signal is programmed to do at least one of alter the beam intensity and modify the scanning velocity between the stage and the beam to null the output error signal. 2. The apparatus of claim 1, wherein the temperature monitoring means is constructed to collect radiation from a plurality of positions on the heated substrate region. 3. The apparatus of claim 1, wherein the temperature monitoring means includes a collecting lens, a polarizer, one or more fibers each corresponding to a different spatial position within the imaged substrate location, a spectrometer that separates the emitted p-polarized radiation into different wavelengths for each spatial position, and at least one detector for each fiber-wavelength combination. 4. The apparatus of claim 1, wherein the temperature monitoring means includes a collecting lens, a polarizer, one or more fibers each corresponding to a different spatial position within the imaged substrate location, spectral bandpass filters that separate the emitted p-polarized radiation into different wavelengths for each spatial position and at least one detector for each fiber-wavelength combination. 5. The apparatus of claim 3, wherein the temperature monitoring means includes a relay lens and a plurality of fibers in a configuration effective to convey and arrange different samples of radiation emitted from the substrate into each fiber along an entrance slit of the spectrometer. 6. The apparatus of claim 3, wherein each spatial position on the substrate corresponds to an emission of p-polarized radiation of at least three different wavelengths and the probable temperature value for each spatial position is generated from independent temperature estimates calculated from spectral intensities of the at least three different wavelengths of the emissions corresponding to each spatial position. 7. The apparatus of claim 3, wherein the temperature monitoring means measures light intensities of at least three different wavelengths corresponding to each spatial position to estimate the probable temperature value for each corresponding spatial position. 8. The apparatus of claim 1, wherein the probable maximum temperature value is generated from independent temperature estimates calculated from ratios of spectral intensities of the at least three different wavelengths. 9. The apparatus of claim 1, wherein the probable maximum temperature value is generated from a weighted average of independent temperature estimates. 10. The apparatus of claim 1, wherein the probable temperature value is generated from a weighted average of the independent temperature estimates from the signals corresponding to the at least three different wavelengths and the signal ratios corresponding to the at least three different wavelengths for each spatial position. 11. The apparatus of claim 1, wherein the temperature monitoring means includes a field-programmable gate array. 12. The apparatus of claim 1, wherein the output error signal is generated at a rate of at least 100 Hz. 13. The apparatus of claim 1, further comprising a substrate on the stage and comprising a dielectric material having a Brewster's angle, wherein the incident angle corresponds to the Brewster's angle for the substrate material. 14. The apparatus of claim 1, further comprising a retro-reflecting means for redirecting radiation emitted from a heated substrate region back toward the heated substrate region. 15. The apparatus of claim 14, wherein the retro-reflecting means is arranged so some of the redirected radiation is specularly reflected into the temperature monitoring means. 16. The apparatus of claim 14, wherein the retroreflecting means collects radiation emitted from the heated region at similar incidence angles with opposing azimuth angles before redirecting the radiation back toward the heated substrate region. 17. An apparatus for processing a substrate comprising: a radiation source adapted to emit a photonic beam; an optical system to form from the beam an image on a substrate; a stage adapted to scan the substrate across the beam image to heat the substrate surface; a temperature monitoring means for analyzing p-polarized radiation of at least three different wavelengths emitted from at least two positions along an image to determine temperatures at the at least two locations; an output error signal generator that makes temperature difference calculations that take into account at least one of a preset desired maximum temperature and a desired minimum temperature with the temperatures determined at the at least two locations to generate an output error signal; and a controller operably coupled to the radiation source and the stage, wherein the controller, in response to the output error signal is programmed to do at least one of alter the beam intensity and provide a change to the scanning speed between the stage and the beam in a manner so the error output signal is nulled. 18. The apparatus of claim 17, wherein the present desired maximum temperature is less than 1410° C. 19. The apparatus of claim 17, wherein the controller, in response to the output signal is programmed to alter the beam and/or to provide relative movement between the stage and the beam to scan the image across the substrate surface in a manner so all heated portions of the substrate exceeds a lower limit temperature. 20. The apparatus of claim 17, wherein the output error signal generator is programmed to generate an output error signal proportional to the difference between a minimum desired temperature and a lowest of the temperatures determined at the at least two locations.