A technique for forming a film of material (12) from a donor substrate (10). The technique has a step of introducing energetic particles (22) through a surface of a donor substrate (10) to a selected depth (20) underneath the surface, where the particles have a relatively high concentration to defin
A technique for forming a film of material (12) from a donor substrate (10). The technique has a step of introducing energetic particles (22) through a surface of a donor substrate (10) to a selected depth (20) underneath the surface, where the particles have a relatively high concentration to define a donor substrate material (12) above the selected depth. An energy source is directed to a selected region of the donor substrate to initiate a controlled cleaving action of the substrate (10) at the selected depth (20), whereupon the cleaving action provides an expanding cleave front to free the donor material from a remaining portion of the donor substrate.
대표청구항▼
What is claimed is: 1. A process for forming a film of material from a semiconductor substrate using a chemical source, the process comprising steps of: introducing, using beam line ion implantation, particles through a surface of a semiconductor substrate to a selected depth underneath the surface
What is claimed is: 1. A process for forming a film of material from a semiconductor substrate using a chemical source, the process comprising steps of: introducing, using beam line ion implantation, particles through a surface of a semiconductor substrate to a selected depth underneath the surface, the particles being at a concentration at the selected depth to define a semiconductor material to be removed above the selected depth; applying a chemical source to increase stress at the selected depth; and providing additional energy to a selected region of the semiconductor substrate to initiate a controlled cleaving action at the selected depth in the semiconductor substrate using a propagating cleave front to free a portion of the semiconductor material to be removed from the semiconductor substrate. 2. The process of claim 1 wherein the particles are derived from a source selected from the group consisting of hydrogen gas, helium gas, water vapor, methane, and hydrogen compounds. 3. The process of claim 1 wherein the particles are selected from the group consisting of neutral molecules, neutral atoms, charged molecules, charged atoms, and electrons. 4. The process of claim 1 wherein the particles are energetic. 5. The process of claim 4 wherein the energetic particles have sufficient kinetic energy to penetrate through the surface to the selected depth underneath the surface. 6. The process of claim 1 wherein the providing additional energy sustains the controlled cleaving action to remove the semiconductor material from the substrate to provide a film of material. 7. The process of claim 1 wherein the providing additional energy increases a controlled stress in the semiconductor material and sustains the controlled cleaving action to remove the semiconductor material from the semiconductor substrate to provide a film of material. 8. The process of claim 1 wherein the introducing forms damage at the selected depth underneath the surface selected from the group consisting of atomic bond damage, bond substitution, weakening, and breaking bonds of the semiconductor substrate at the selected depth. 9. The process of claim 8 wherein the damage creates stress in the semiconductor substrate. 10. The process of claim 8 wherein the damage reduces an ability of the semiconductor substrate to withstand stress without a possibility of a cleaving of the semiconductor substrate. 11. The process of claim 1 wherein the propagating cleave front comprises a plurality of cleave fronts. 12. The process of claim 1 wherein the introducing causes stress of the semiconductor material at the selected depth by a presence of the particles at the selected depth. 13. The process of claim 1 wherein the chemical source is selected from particles, gases, or liquids. 14. The process of claim 13 wherein the chemical source causes a chemical reaction. 15. The process of claim 13 wherein the chemical source is selected from the group consisting of a flood source, a time-varying source, a spatially varying source, and a continuous source. 16. The process of claim 1 further comprising a step of joining the surface of the semiconductor to a surface of a target substrate to form a stacked assembly. 17. The process of claim 16 wherein the joining step is provided by applying an electrostatic pressure between the semiconductor substrate and the target substrate. 18. The process of claim 17 wherein the joining step is provided by using an adhesive substance between the target substrate and the semiconductor substrate. 19. The process of claim 18 wherein the joining step is provided by a polyimide between the target substrate and the semiconductor substrate. 20. The process of claim 17 wherein the joining step is provided by an activated surface between the target substrate and the semiconductor substrate. 21. The process of claim 17 where in the joining step is provided by an interatomic bond between the target substrate and the semiconductor substrate. 22. The process of claim 17 wherein the joining step is provided by a spin-on-glass between the target substrate and the semiconductor substrate. 23. The process of claim 1 wherein the semiconductor substrate is made of a material selected from the group consisting of silicon, silicon carbide, group III-V material, plastic, ceramic material, monocrystalline silicon, polycrystalline silicon, amorphous silicon, and multi-layered substrate. 24. The process of claim 1 wherein the semiconductor substrate is a silicon substrate comprising an overlying layer of dielectric material, the selected depth being underneath the dielectric material. 25. The process of claim 24 wherein the dielectric material is selected from the group consisting of an oxide material, a nitride material, or an oxide/nitride material. 26. The process of claim 1 wherein the semiconductor substrate includes an overlying layer of conductive material. 27. The process of claim 26 wherein the conductive material is selected from the group consisting of a metal, a plurality of metal layers, aluminum, tungsten, titanium, titanium nitride, polycide, polysilicon, copper, indium tin oxide, silicide, platinum, gold, silver, and amorphous silicon. 28. The process of claim 1 wherein the step of introducing provides a substantially uniform distribution of particles along a plane of the semiconductor material at the selected depth.
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