Methods for uniform metal impregnation into a nanoporous material
IPC분류정보
국가/구분
United States(US) Patent
등록
국제특허분류(IPC7판)
G01N-021/65
G01J-003/44
출원번호
UP-0436507
(2006-05-17)
등록번호
US-7771661
(2010-08-30)
발명자
/ 주소
Chan, Selena
Kwon, Sunghoon
Sundararajan, Narayan
출원인 / 주소
Intel Corporation
대리인 / 주소
Pillsbury Winthrop Shaw Pittman LLP
인용정보
피인용 횟수 :
3인용 특허 :
52
초록▼
The methods, systems 400 and apparatus disclosed herein concern metal 150 impregnated porous substrates 110, 210. Certain embodiments of the invention concern methods for producing metal-coated porous silicon substrates 110, 210 that exhibit greatly improved uniformity and depth of penetration of me
The methods, systems 400 and apparatus disclosed herein concern metal 150 impregnated porous substrates 110, 210. Certain embodiments of the invention concern methods for producing metal-coated porous silicon substrates 110, 210 that exhibit greatly improved uniformity and depth of penetration of metal 150 deposition. The increased uniformity and depth allow improved and more reproducible Raman detection of analytes. In exemplary embodiments of the invention, the methods may comprise oxidation of porous silicon 110, immersion in a metal salt solution 130, drying and thermal decomposition of the metal salt 140 to form a metal deposit 150. In other exemplary embodiments of the invention, the methods may comprise microfluidic impregnation of porous silicon substrates 210 with one or more metal salt solutions 130. Other embodiments of the invention concern apparatus and/or systems 400 for Raman detection of analytes, comprising metal-coated porous silicon substrates 110, 210 prepared by the disclosed methods.
대표청구항▼
What is claimed is: 1. A Raman detection system comprising a metal-coated porous substrate comprising a porous silicon substrate and a metal layer coating the porous substrate, wherein the metal-coated porous substrate is integrated into a microfluidic pathway. 2. The system of claim 1, wherein s
What is claimed is: 1. A Raman detection system comprising a metal-coated porous substrate comprising a porous silicon substrate and a metal layer coating the porous substrate, wherein the metal-coated porous substrate is integrated into a microfluidic pathway. 2. The system of claim 1, wherein said porous silicon substrate comprises a composition comprising porous silicon, porous polysilicon or nanocrystalline porous silicon. 3. The system of claim 1, wherein the metal layer coating is formed by contacting the porous silicon substrate with a metal salt solution, removing excess metal salt solution, drying the solution to form a thin layer of dry metal salt on the porous silicon substrate and thermally decomposing the metal salt to form the metal layer coating. 4. The system of claim 3, wherein the metal salt comprises silver nitrate or silver sulfate. 5. The system of claim 1, further comprising a Raman detector and an excitatory light source. 6. The system of claim 5, further comprising a computer operably coupled to the Raman detector. 7. The system of claim 1, wherein the microfluidic pathway comprises one or more solvent reservoirs. 8. The system of claim 1, wherein the microfluidic pathway comprises at least one waste reservoir. 9. The system of claim 1, further comprising an integrated microchip. 10. The system of claim 1, wherein the metal layer comprises a Raman active metal. 11. The system of claim 10, wherein the at least one Raman active metal is selected from the group consisting of silver, gold, platinum, copper and aluminum. 12. The system of claim 1, wherein the porous substrate has a metal penetration depth greater than 3 microns. 13. The system of claim 1, wherein the porous substrate has a metal penetration depth up to 10 microns. 14. The system of claim 1, wherein the metal layer comprises two or more metals. 15. The system of claim 1, wherein the system comprises a micro-electro-mechanical system. 16. The system of claim 1, wherein a surface of the porous silicon substrate is oxidized prior to coating with the metal layer. 17. The system of claim 1, wherein the porous silicon substrate further comprises an oxidized surface that prevents spontaneous immersion plating. 18. The system of claim 1, wherein the pores are coated with a substantially uniform deposit without substantially plugging the pores. 19. A Raman detection system comprising a metal-coated porous substrate comprising a porous silicon substrate and a metal layer coating the porous substrate, wherein the metal-coated porous substrate is integrated into a micro-electro-mechanical system (MEMS). 20. The Raman system of claim 19, wherein the MEMS comprises a mechanical element, a sensor, an actuator and electronics.
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