Thermal management system and associated method
원문보기
IPC분류정보
국가/구분
United States(US) Patent
등록
국제특허분류(IPC7판)
B23P-025/00
B32B-017/10
출원번호
UP-0247113
(2005-10-11)
등록번호
US-7797808
(2010-10-11)
발명자
/ 주소
Zhang, Jian
Tonapi, Sandeep Shrikant
Mills, Ryan Christopher
Gowda, Arun Virupaksha
출원인 / 주소
General Electric Company
대리인 / 주소
Caruso, Andrew J.
인용정보
피인용 횟수 :
3인용 특허 :
9
초록▼
A method for making a thermal interface structure is provided. The method may include disposing a thermal transport layer on a resin layer to form a stacked structure, and slicing the stacked structure to form a cross-sectional slice having a first exposed portion of the thermal transport layer on a
A method for making a thermal interface structure is provided. The method may include disposing a thermal transport layer on a resin layer to form a stacked structure, and slicing the stacked structure to form a cross-sectional slice having a first exposed portion of the thermal transport layer on a first surface of the slice, and a second exposed portion of the thermal transport layer on the second surface of the slice.
대표청구항▼
The invention claimed is: 1. A method, comprising disposing a thermal transport layer on a resin layer to form a stacked structure; and slicing the stacked structure to form a cross-sectional slice having a first exposed portion of the thermal transport layer on a first surface of the slice, and a
The invention claimed is: 1. A method, comprising disposing a thermal transport layer on a resin layer to form a stacked structure; and slicing the stacked structure to form a cross-sectional slice having a first exposed portion of the thermal transport layer on a first surface of the slice, and a second exposed portion of the thermal transport layer on the second surface of the slice. 2. The method as defined in claim 1, further comprising aligning thermally conductive particles in the thermal transport layer to facilitate and direct heat conduction between the slice first surface and the slice second surface. 3. The method as defined in claim 1, further comprising adding a compliant layer to a surface of the slice. 4. The method as defined in claim 1, wherein the disposing comprises one or more of printing, syringe dispensing, or pick-and-place dispensing. 5. The method as defined in claim 4, wherein printing comprises flexographic printing, screen printing, or stencil printing. 6. The method as defined in claim 1, wherein the resin layer is a film, and disposing comprises coating the thermal transport layer onto the resin layer. 7. The method as defined in claim 1, wherein the thermal transport layer is a film and disposing comprises coating the resin layer onto the thermal transport layer. 8. The method as defined in claim 1, wherein the thermal transport layer, the resin layer, or both the thermal transport layer and the resin layer are formed by extruding a film. 9. The method as defined in claim 1, comprising co-extruding both the thermal transport layer and the resin layer. 10. The method as defined in claim 1, wherein slicing comprises making a cut that is skew relative to a plane defined by at least one of the thermal transport layers. 11. The method as defined in claim 10, wherein slicing comprises making a perpendicular cut to a plane defined by the thermal transport layer or thermal transport layers. 12. The method as defined in claim 1, further comprising securing the slice first surface to a heat-generating unit. 13. The method as defined in claim 1, further comprising securing the slice second surface to a heat-dissipating unit. 14. The method as defined in claim 1, further comprising securing the slice first surface to a heat-generating unit, securing the slice second surface to a heat-dissipating unit, generating thermal energy at the heat-generating unit, and flowing the generated thermal energy from the heat-generating unit through the slice toward the heat-dissipating unit. 15. The method as defined in claim 1, wherein the stacked structure comprises a resin that is B-stageable, and further comprising B-staging the stacked structure. 16. The method as defined in claim 15, further comprising curing the stacked structure. 17. The method as defined in claim 15, wherein the stacked structure is placed in contact with a surface of the heat-generating unit or of the heat-dissipating unit, or with a surface of each of the heat-generating unit and of the heat-dissipating unit prior to B-staging. 18. The method as defined in claim 1, further comprising surface treating at least a portion of the slice surface. 19. The method as defined in claim 18, wherein the surface treating selectively removes a portion of the resin layer such that thermal transport layer portions extend relatively further from the slice surface. 20. A method for producing a device, comprising; disposing a plurality of thermal transport layers on a plurality of resin layers in an alternating pattern to form a stacked structure; curing the resin layer; slicing the stacked structure to form a cross-sectional slice having a first exposed portion of the thermal transport layer on a first surface of the slice, and a second exposed portion of the thermal transport layer on the second surface of the slice; and contacting the slice first surface to a heat-generating unit surface and the slice second surface to a heat-dissipating unit surface. 21. The method as defined in claim 20, further comprising orienting the plurality of thermal transport layers to provide thermal energy conduction in a first direction with less thermal resistance relative to thermal energy conduction in a second direction.
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